NL7015756A - - Google Patents
Info
- Publication number
- NL7015756A NL7015756A NL7015756A NL7015756A NL7015756A NL 7015756 A NL7015756 A NL 7015756A NL 7015756 A NL7015756 A NL 7015756A NL 7015756 A NL7015756 A NL 7015756A NL 7015756 A NL7015756 A NL 7015756A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8523569A JPS497993B1 (enExample) | 1969-10-27 | 1969-10-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NL7015756A true NL7015756A (enExample) | 1971-04-29 |
| NL151911B NL151911B (nl) | 1977-01-17 |
Family
ID=13852884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL707015756A NL151911B (nl) | 1969-10-27 | 1970-10-27 | Werkwijze voor het via een reactie in de dampfase epitaxiaal doen groeien van een al dan niet gedoteerde gaas1-*p*-laag op een onderlaag en door toepassing van deze werkwijze verkregen gevormd voortbrengsel. |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS497993B1 (enExample) |
| GB (1) | GB1308790A (enExample) |
| NL (1) | NL151911B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4738272A (en) * | 1984-05-21 | 1988-04-19 | Mcconnell Christopher F | Vessel and system for treating wafers with fluids |
| US4740249A (en) * | 1984-05-21 | 1988-04-26 | Christopher F. McConnell | Method of treating wafers with fluid |
| US4633893A (en) * | 1984-05-21 | 1987-01-06 | Cfm Technologies Limited Partnership | Apparatus for treating semiconductor wafers |
| US4577650A (en) * | 1984-05-21 | 1986-03-25 | Mcconnell Christopher F | Vessel and system for treating wafers with fluids |
| US4856544A (en) * | 1984-05-21 | 1989-08-15 | Cfm Technologies, Inc. | Vessel and system for treating wafers with fluids |
| JPH01123133A (ja) * | 1987-11-09 | 1989-05-16 | Hitachi Ltd | 分光光度計 |
| US6136724A (en) * | 1997-02-18 | 2000-10-24 | Scp Global Technologies | Multiple stage wet processing chamber |
-
1969
- 1969-10-27 JP JP8523569A patent/JPS497993B1/ja active Pending
-
1970
- 1970-10-27 GB GB5106370A patent/GB1308790A/en not_active Expired
- 1970-10-27 NL NL707015756A patent/NL151911B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPS497993B1 (enExample) | 1974-02-23 |
| GB1308790A (en) | 1973-03-07 |
| NL151911B (nl) | 1977-01-17 |