NL7013146A - - Google Patents

Info

Publication number
NL7013146A
NL7013146A NL7013146A NL7013146A NL7013146A NL 7013146 A NL7013146 A NL 7013146A NL 7013146 A NL7013146 A NL 7013146A NL 7013146 A NL7013146 A NL 7013146A NL 7013146 A NL7013146 A NL 7013146A
Authority
NL
Netherlands
Application number
NL7013146A
Other versions
NL172805C (nl
NL172805B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7013146A publication Critical patent/NL7013146A/xx
Publication of NL172805B publication Critical patent/NL172805B/xx
Application granted granted Critical
Publication of NL172805C publication Critical patent/NL172805C/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D59/00—Separation of different isotopes of the same chemical element
    • B01D59/44—Separation by mass spectrography
    • B01D59/48—Separation by mass spectrography using electrostatic and magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/022—Circuit arrangements, e.g. for generating deviation currents or voltages ; Components associated with high voltage supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/025—Detectors specially adapted to particle spectrometers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/961—Ion beam source and generation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
NLAANVRAGE7013146,A 1969-09-05 1970-09-04 Inrichting voor het bombarderen van een doel met ionen. NL172805C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB44171/69A GB1280013A (en) 1969-09-05 1969-09-05 Improvements in or relating to apparatus bombarding a target with ions

Publications (3)

Publication Number Publication Date
NL7013146A true NL7013146A (enrdf_load_stackoverflow) 1971-03-09
NL172805B NL172805B (nl) 1983-05-16
NL172805C NL172805C (nl) 1983-10-17

Family

ID=10432104

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7013146,A NL172805C (nl) 1969-09-05 1970-09-04 Inrichting voor het bombarderen van een doel met ionen.

Country Status (6)

Country Link
US (1) US3689766A (enrdf_load_stackoverflow)
JP (1) JPS521159B1 (enrdf_load_stackoverflow)
DE (2) DE7032987U (enrdf_load_stackoverflow)
FR (1) FR2060966A5 (enrdf_load_stackoverflow)
GB (1) GB1280013A (enrdf_load_stackoverflow)
NL (1) NL172805C (enrdf_load_stackoverflow)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3983397A (en) * 1972-05-08 1976-09-28 Albert Richard D Selectable wavelength X-ray source
US3778626A (en) * 1972-07-28 1973-12-11 Western Electric Co Mechanical scan system for ion implantation
US4021675A (en) * 1973-02-20 1977-05-03 Hughes Aircraft Company System for controlling ion implantation dosage in electronic materials
US3993909A (en) * 1973-03-16 1976-11-23 U.S. Philips Corporation Substrate holder for etching thin films
DE2326279A1 (de) * 1973-05-23 1974-12-19 Siemens Ag Ionenstrahlschnellschaltung zur erzielung definierter festkoerperdotierungen durch ionenimplantation
US4033904A (en) * 1974-03-22 1977-07-05 Varian Associates, Inc. Interchangeable specimen trays and apparatus for a vacuum type testing system
JPS515961A (en) * 1974-07-03 1976-01-19 Dan Kagaku Kk Konseisosasochi
US4017403A (en) * 1974-07-31 1977-04-12 United Kingdom Atomic Energy Authority Ion beam separators
US4013262A (en) * 1974-12-13 1977-03-22 Varian Associates Rotary apparatus for moving workpieces through treatment beam with controlled angle of orientation and ion implanter incorporating such apparatus
US4024399A (en) * 1975-01-06 1977-05-17 Jersey Nuclear-Avco Isotopes, Inc. Method and apparatus for measuring vapor flow in isotope separation
FR2298880A1 (fr) * 1975-01-22 1976-08-20 Commissariat Energie Atomique Procede et dispositif d'implantation ionique
US4000426A (en) * 1975-05-15 1976-12-28 Aita Konstantinovna Zaitseva Apparatus for feeding parts in ion-beam machining
US4011449A (en) * 1975-11-05 1977-03-08 Ibm Corporation Apparatus for measuring the beam current of charged particle beam
DE2557685A1 (de) * 1975-12-20 1977-06-30 Ibm Deutschland Verfahren zur herstellung einer gerasterten photoleiterschicht
CH607836A5 (enrdf_load_stackoverflow) * 1976-12-27 1978-11-15 Balzers Hochvakuum
US4234797A (en) * 1979-05-23 1980-11-18 Nova Associates, Inc. Treating workpieces with beams
US4258266A (en) * 1979-07-30 1981-03-24 Hughes Aircraft Company Ion implantation system
US4514636A (en) * 1979-09-14 1985-04-30 Eaton Corporation Ion treatment apparatus
JPS56126918A (en) * 1980-03-11 1981-10-05 Hitachi Ltd Injecting device for ion
US4361762A (en) * 1980-07-30 1982-11-30 Rca Corporation Apparatus and method for neutralizing the beam in an ion implanter
JPS58164134A (ja) * 1982-03-24 1983-09-29 Hitachi Ltd 半導体装置の製造方法
US4517465A (en) * 1983-03-29 1985-05-14 Veeco/Ai, Inc. Ion implantation control system
US4587433A (en) * 1984-06-27 1986-05-06 Eaton Corporation Dose control apparatus
JPS6324536A (ja) * 1986-01-29 1988-02-01 イ−トン　コ−ポレ−シヨン イオン注入装置および方法
US4980562A (en) * 1986-04-09 1990-12-25 Varian Associates, Inc. Method and apparatus for high efficiency scanning in an ion implanter
US4922106A (en) * 1986-04-09 1990-05-01 Varian Associates, Inc. Ion beam scanning method and apparatus
ATE227884T1 (de) * 1986-04-09 2002-11-15 Varian Semiconductor Equipment Ionenstrahlabtastverfahren und vorrichtung
US4751393A (en) * 1986-05-16 1988-06-14 Varian Associates, Inc. Dose measurement and uniformity monitoring system for ion implantation
US4745281A (en) * 1986-08-25 1988-05-17 Eclipse Ion Technology, Inc. Ion beam fast parallel scanning having dipole magnetic lens with nonuniform field
US4804852A (en) * 1987-01-29 1989-02-14 Eaton Corporation Treating work pieces with electro-magnetically scanned ion beams
US4816693A (en) * 1987-08-21 1989-03-28 National Electrostatics Corp. Apparatus and method for uniform ion dose control
US5309064A (en) * 1993-03-22 1994-05-03 Armini Anthony J Ion source generator auxiliary device
US5981961A (en) * 1996-03-15 1999-11-09 Applied Materials, Inc. Apparatus and method for improved scanning efficiency in an ion implanter
US5852345A (en) * 1996-11-01 1998-12-22 Implant Sciences Corp. Ion source generator auxiliary device for phosphorus and arsenic beams
US5808416A (en) * 1996-11-01 1998-09-15 Implant Sciences Corp. Ion source generator auxiliary device
US6060715A (en) * 1997-10-31 2000-05-09 Applied Materials, Inc. Method and apparatus for ion beam scanning in an ion implanter
US6084241A (en) * 1998-06-01 2000-07-04 Motorola, Inc. Method of manufacturing semiconductor devices and apparatus therefor
US6677599B2 (en) * 2000-03-27 2004-01-13 Applied Materials, Inc. System and method for uniformly implanting a wafer with an ion beam
AU2001270133A1 (en) 2000-06-22 2002-01-02 Proteros, Llc Ion implantation uniformity correction using beam current control
US7547460B2 (en) 2000-09-15 2009-06-16 Varian Semiconductor Equipment Associates, Inc. Ion implanter optimizer scan waveform retention and recovery
CN100338720C (zh) * 2000-11-22 2007-09-19 瓦里安半导体设备联合公司 用于离子注入的混合扫描系统及方法
US6710359B2 (en) 2001-03-23 2004-03-23 Varian Semiconductor Equipment Associates, Inc. Methods and apparatus for scanned beam uniformity adjustment in ion implanters
US20130114773A1 (en) * 2011-11-08 2013-05-09 Alexander R. Vaucher Superconducting neutron source
CN112361892A (zh) * 2020-11-04 2021-02-12 山东战勤特种装备有限公司 一种射击智能对抗自动报靶训练方法及装置
CN112516797B (zh) * 2020-12-01 2022-09-16 中国科学院近代物理研究所 一种用于同位素分离系统的静电聚焦和加速系统及方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL53538C (enrdf_load_stackoverflow) * 1937-02-18
US2348031A (en) * 1941-04-30 1944-05-02 Rca Corp Method of focusing electron microscopes
NL270945A (enrdf_load_stackoverflow) * 1961-03-02
NL276412A (enrdf_load_stackoverflow) * 1961-03-30
US3131300A (en) * 1962-11-16 1964-04-28 Thomas R Jeter Apparatus for reducing energy variations of a van de graaff ion beam
US3326176A (en) * 1964-10-27 1967-06-20 Nat Res Corp Work-registration device including ionic beam probe
US3358239A (en) * 1965-07-27 1967-12-12 Transformatoren & Roentgenwerk Equipment for controlling and monitoring the electron beam of a horizontaltype particle accelerator
US3434894A (en) * 1965-10-06 1969-03-25 Ion Physics Corp Fabricating solid state devices by ion implantation
US3547074A (en) * 1967-04-13 1970-12-15 Block Engineering Apparatus for forming microelements

Also Published As

Publication number Publication date
GB1280013A (en) 1972-07-05
DE2043865A1 (de) 1971-03-11
NL172805C (nl) 1983-10-17
NL172805B (nl) 1983-05-16
DE7032987U (de) 1971-02-18
JPS521159B1 (enrdf_load_stackoverflow) 1977-01-12
FR2060966A5 (enrdf_load_stackoverflow) 1971-06-18
DE2043865C2 (de) 1983-08-04
US3689766A (en) 1972-09-05

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Legal Events

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V1 Lapsed because of non-payment of the annual fee