NL7012671A - - Google Patents
Info
- Publication number
- NL7012671A NL7012671A NL7012671A NL7012671A NL7012671A NL 7012671 A NL7012671 A NL 7012671A NL 7012671 A NL7012671 A NL 7012671A NL 7012671 A NL7012671 A NL 7012671A NL 7012671 A NL7012671 A NL 7012671A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7012671A NL7012671A (en) | 1970-08-27 | 1970-08-27 | |
| DE19712138766 DE2138766A1 (en) | 1970-08-27 | 1971-08-03 | Adjustment arrangement for a particle beam |
| GB3962671A GB1367940A (en) | 1970-08-27 | 1971-08-24 | Beam alignment device for a particle beam |
| CA121,181A CA946985A (en) | 1970-08-27 | 1971-08-24 | Adjusting device for a particle beam |
| FR7130831A FR2106022A5 (en) | 1970-08-27 | 1971-08-25 | |
| US00174887A US3777211A (en) | 1970-08-27 | 1971-08-25 | Adjusting device for a particle beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7012671A NL7012671A (en) | 1970-08-27 | 1970-08-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7012671A true NL7012671A (en) | 1972-02-29 |
Family
ID=19810865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7012671A NL7012671A (en) | 1970-08-27 | 1970-08-27 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3777211A (en) |
| CA (1) | CA946985A (en) |
| DE (1) | DE2138766A1 (en) |
| FR (1) | FR2106022A5 (en) |
| GB (1) | GB1367940A (en) |
| NL (1) | NL7012671A (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4376249A (en) * | 1980-11-06 | 1983-03-08 | International Business Machines Corporation | Variable axis electron beam projection system |
| DE3138896A1 (en) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | ELECTRONIC OPTICAL SYSTEM WITH VARIO SHAPED BEAM FOR THE GENERATION AND MEASUREMENT OF MICROSTRUCTURES |
| US5949076A (en) * | 1996-02-26 | 1999-09-07 | Kabushiki Kaisha Toshiba | Charged beam applying apparatus |
| JP2004534360A (en) * | 2001-06-15 | 2004-11-11 | 株式会社荏原製作所 | Electron beam device and device manufacturing method using the electron beam device |
| EP1401007B1 (en) * | 2002-09-18 | 2005-06-15 | Staib Instrumente GmbH | An electron diffraction system for use in production environment and for high pressure deposition techniques |
| US9159527B2 (en) | 2003-10-16 | 2015-10-13 | Carl Zeiss Microscopy, Llc | Systems and methods for a gas field ionization source |
| US7786452B2 (en) | 2003-10-16 | 2010-08-31 | Alis Corporation | Ion sources, systems and methods |
| US7786451B2 (en) | 2003-10-16 | 2010-08-31 | Alis Corporation | Ion sources, systems and methods |
| US8110814B2 (en) | 2003-10-16 | 2012-02-07 | Alis Corporation | Ion sources, systems and methods |
| US7804068B2 (en) | 2006-11-15 | 2010-09-28 | Alis Corporation | Determining dopant information |
| JP2012504309A (en) * | 2008-09-30 | 2012-02-16 | カール ツァイス エヌティーエス エルエルシー | Alignment of charged particle beam |
| WO2011058833A1 (en) * | 2009-11-10 | 2011-05-19 | 三菱電機株式会社 | Particle beam radiation system and particle beam radiation method |
| JP5364112B2 (en) | 2011-01-25 | 2013-12-11 | 株式会社日立ハイテクノロジーズ | Charged particle beam equipment |
| FR3123597B1 (en) | 2021-06-08 | 2023-04-21 | Psa Automobiles Sa | COMPACT SUB-ASSEMBLY FOR MOTOR VEHICLE ELECTROMOTOR GROUP |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2418349A (en) * | 1945-12-13 | 1947-04-01 | Rca Corp | Method of and means for correcting for distortion in electron lens systems |
| GB687207A (en) * | 1950-02-23 | 1953-02-11 | Vickers Electrical Co Ltd | Improvements relating to electron microscopes |
| US3371206A (en) * | 1964-02-04 | 1968-02-27 | Jeol Ltd | Electron beam apparatus having compensating means for triangular beam distortion |
| DE1299088C2 (en) * | 1966-06-10 | 1974-10-17 | Siemens AG, Berlin und München, 8000 München | DEFLECTION DEVICE FOR THE BODY BEAM IN A BODY BEAM DEVICE, IN PARTICULAR ELECTRON MICROSCOPE |
| US3588586A (en) * | 1968-04-26 | 1971-06-28 | Jeol Ltd | Apparatus for correcting electron beam deflection |
-
1970
- 1970-08-27 NL NL7012671A patent/NL7012671A/xx unknown
-
1971
- 1971-08-03 DE DE19712138766 patent/DE2138766A1/en active Pending
- 1971-08-24 CA CA121,181A patent/CA946985A/en not_active Expired
- 1971-08-24 GB GB3962671A patent/GB1367940A/en not_active Expired
- 1971-08-25 US US00174887A patent/US3777211A/en not_active Expired - Lifetime
- 1971-08-25 FR FR7130831A patent/FR2106022A5/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3777211A (en) | 1973-12-04 |
| DE2138766A1 (en) | 1972-03-02 |
| FR2106022A5 (en) | 1972-04-28 |
| CA946985A (en) | 1974-05-07 |
| GB1367940A (en) | 1974-09-25 |