Classifications

• • H—ELECTRICITY
  • H03—ELECTRONIC CIRCUITRY
  • H03L—AUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
  • H03L7/00—Automatic control of frequency or phase; Synchronisation
  • H03L7/02—Automatic control of frequency or phase; Synchronisation using a frequency discriminator comprising a passive frequency-determining element
  • H03L7/04—Automatic control of frequency or phase; Synchronisation using a frequency discriminator comprising a passive frequency-determining element wherein the frequency-determining element comprises distributed inductance and capacitance
• • H—ELECTRICITY
  • H03—ELECTRONIC CIRCUITRY
  • H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
  • H03B9/00—Generation of oscillations using transit-time effects
  • H03B9/12—Generation of oscillations using transit-time effects using solid state devices, e.g. Gunn-effect devices
  • H03B9/14—Generation of oscillations using transit-time effects using solid state devices, e.g. Gunn-effect devices and elements comprising distributed inductance and capacitance
  • H03B9/141—Generation of oscillations using transit-time effects using solid state devices, e.g. Gunn-effect devices and elements comprising distributed inductance and capacitance and comprising a voltage sensitive element, e.g. varactor
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
  • H10D99/00—Subject matter not provided for in other groups of this subclass
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P50/00—Etching of wafers, substrates or parts of devices
  • H10P50/69—Etching of wafers, substrates or parts of devices using masks for semiconductor materials
  • H10P50/691—Etching of wafers, substrates or parts of devices using masks for semiconductor materials for Group V materials or Group III-V materials
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
• • H—ELECTRICITY
  • H03—ELECTRONIC CIRCUITRY
  • H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
  • H03B2200/00—Indexing scheme relating to details of oscillators covered by H03B
  • H03B2200/006—Functional aspects of oscillators
  • H03B2200/0068—Frequency or FM detection

Applications Claiming Priority (1)

Publications (1)

Family

ID=13495900

Family Applications (1)

Country Status (6)

Families Citing this family (9)

• 1968
  • 1968-10-04 JP JP43072666A patent/JPS501369B1/ja active Pending
• 1969
  • 1969-09-29 US US861671A patent/US3705364A/en not_active Expired - Lifetime
  • 1969-10-01 DE DE19691949645 patent/DE1949645A1/de active Pending
  • 1969-10-02 GB GB48439/69A patent/GB1278088A/en not_active Expired
  • 1969-10-03 NL NL6914975A patent/NL6914975A/xx unknown
  • 1969-10-03 FR FR696933957A patent/FR2019963B1/fr not_active Expired

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