NL6900160A - - Google Patents
Info
- Publication number
- NL6900160A NL6900160A NL6900160A NL6900160A NL6900160A NL 6900160 A NL6900160 A NL 6900160A NL 6900160 A NL6900160 A NL 6900160A NL 6900160 A NL6900160 A NL 6900160A NL 6900160 A NL6900160 A NL 6900160A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US69613268A | 1968-01-08 | 1968-01-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6900160A true NL6900160A (US20110009641A1-20110113-C00256.png) | 1969-07-10 |
Family
ID=24795843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6900160A NL6900160A (US20110009641A1-20110113-C00256.png) | 1968-01-08 | 1969-01-03 |
Country Status (9)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2088402A1 (US20110009641A1-20110113-C00256.png) * | 1970-05-07 | 1972-01-07 | Gaf Corp |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004004865B4 (de) | 2004-01-30 | 2008-01-10 | Qimonda Ag | Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie |
| GB2436329B (en) * | 2006-03-24 | 2011-07-27 | Curwen Chilford Prints Ltd | Screenless photolithography |
-
1968
- 1968-11-19 GB GB54743/68A patent/GB1217757A/en not_active Expired
- 1968-11-19 IL IL31103A patent/IL31103A/xx unknown
- 1968-12-16 FR FR1595145D patent/FR1595145A/fr not_active Expired
- 1968-12-18 BE BE725691D patent/BE725691A/xx unknown
- 1968-12-23 CH CH1920868A patent/CH519736A/de not_active IP Right Cessation
-
1969
- 1969-01-03 NL NL6900160A patent/NL6900160A/xx unknown
- 1969-01-03 AT AT4469A patent/AT290570B/de not_active IP Right Cessation
- 1969-01-07 ES ES362230A patent/ES362230A1/es not_active Expired
- 1969-01-07 DE DE19691900599 patent/DE1900599A1/de active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2088402A1 (US20110009641A1-20110113-C00256.png) * | 1970-05-07 | 1972-01-07 | Gaf Corp |
Also Published As
| Publication number | Publication date |
|---|---|
| BE725691A (US20110009641A1-20110113-C00256.png) | 1969-05-29 |
| AT290570B (de) | 1971-06-11 |
| FR1595145A (US20110009641A1-20110113-C00256.png) | 1970-06-08 |
| IL31103A0 (en) | 1969-01-29 |
| GB1217757A (en) | 1970-12-31 |
| DE1900599A1 (de) | 1969-07-31 |
| CH519736A (de) | 1972-02-29 |
| ES362230A1 (es) | 1970-11-01 |
| IL31103A (en) | 1972-05-30 |
