NL6608970A - - Google Patents
Info
- Publication number
- NL6608970A NL6608970A NL6608970A NL6608970A NL6608970A NL 6608970 A NL6608970 A NL 6608970A NL 6608970 A NL6608970 A NL 6608970A NL 6608970 A NL6608970 A NL 6608970A NL 6608970 A NL6608970 A NL 6608970A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/02301—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment in-situ cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/02312—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a gas or vapour
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
- H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/903—Catalyst aided deposition
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES97992A DE1286872B (de) | 1965-07-05 | 1965-07-05 | Verfahren zum Herstellen von homogenen Oxidschichten auf Halbleiterkristallen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6608970A true NL6608970A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1967-01-06 |
Family
ID=7521145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6608970A NL6608970A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1965-07-05 | 1966-06-28 |
Country Status (7)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5137147B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1971-08-20 | 1976-10-14 | ||
| US3984587A (en) * | 1973-07-23 | 1976-10-05 | Rca Corporation | Chemical vapor deposition of luminescent films |
| JPS5559729A (en) * | 1978-10-27 | 1980-05-06 | Fujitsu Ltd | Forming method of semiconductor surface insulating film |
| US4214919A (en) * | 1978-12-28 | 1980-07-29 | Burroughs Corporation | Technique of growing thin silicon oxide films utilizing argon in the contact gas |
| US4207138A (en) * | 1979-01-17 | 1980-06-10 | Rca Corporation | Mercury vapor leaching from microelectronic substrates |
| JPS56161646A (en) * | 1980-05-19 | 1981-12-12 | Fujitsu Ltd | Manufacture of semiconductor device |
| US4376796A (en) * | 1981-10-27 | 1983-03-15 | Thermco Products Corporation | Processing silicon wafers employing processing gas atmospheres of similar molecular weight |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2543710A (en) * | 1948-01-15 | 1951-02-27 | Westinghouse Electric Corp | Process for producing insulating iron oxide coatings |
| US2930722A (en) * | 1959-02-03 | 1960-03-29 | Bell Telephone Labor Inc | Method of treating silicon |
| US3331716A (en) * | 1962-06-04 | 1967-07-18 | Philips Corp | Method of manufacturing a semiconductor device by vapor-deposition |
| US3258359A (en) * | 1963-04-08 | 1966-06-28 | Siliconix Inc | Semiconductor etch and oxidation process |
-
1965
- 1965-07-05 DE DES97992A patent/DE1286872B/de active Pending
-
1966
- 1966-06-28 NL NL6608970A patent/NL6608970A/xx unknown
- 1966-06-30 US US562003A patent/US3518115A/en not_active Expired - Lifetime
- 1966-07-04 CH CH966566A patent/CH486121A/de not_active IP Right Cessation
- 1966-07-04 AT AT637366A patent/AT261003B/de active
- 1966-07-04 GB GB29852/66A patent/GB1106596A/en not_active Expired
- 1966-07-04 SE SE9110/66A patent/SE309968B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB1106596A (en) | 1968-03-20 |
| CH486121A (de) | 1970-02-15 |
| DE1286872B (de) | 1969-01-09 |
| SE309968B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1969-04-14 |
| US3518115A (en) | 1970-06-30 |
| AT261003B (de) | 1968-04-10 |