NL6607507A - - Google Patents
Info
- Publication number
- NL6607507A NL6607507A NL6607507A NL6607507A NL6607507A NL 6607507 A NL6607507 A NL 6607507A NL 6607507 A NL6607507 A NL 6607507A NL 6607507 A NL6607507 A NL 6607507A NL 6607507 A NL6607507 A NL 6607507A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB23394/65A GB1115245A (en) | 1965-06-01 | 1965-06-01 | Method for recording and reproducing information by surface deformation of a polymeric composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6607507A true NL6607507A (de) | 1966-08-25 |
Family
ID=10194902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6607507A NL6607507A (de) | 1965-06-01 | 1966-05-31 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3615476A (de) |
| AT (1) | AT275316B (de) |
| BE (1) | BE681795A (de) |
| CH (1) | CH465404A (de) |
| DE (1) | DE1522383A1 (de) |
| GB (1) | GB1115245A (de) |
| NL (1) | NL6607507A (de) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3977875A (en) * | 1970-03-13 | 1976-08-31 | Ciba-Geigy Ag | Method for modifying vesicular images |
| US3928039A (en) * | 1970-03-13 | 1975-12-23 | Ciba Geigy Ag | Method for modifying vesicular images |
| DE2105488A1 (de) * | 1971-02-05 | 1972-08-10 | Agfa-Gevaert Ag, 5090 Leverkusen | Verfahren zur Herstellung photographischer Bilder |
| US3841874A (en) * | 1971-03-15 | 1974-10-15 | Xidex Corp | Method for improving the photographic characteristics of vesicular photographic materials |
| US3961101A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Process for improved development of electron-beam-sensitive resist films |
| GB1512796A (en) * | 1974-12-13 | 1978-06-01 | Ibm | Image forming process |
| US5024918A (en) * | 1976-12-23 | 1991-06-18 | Texas Instruments Incorporated | Heat activated dry development of photoresist by means of active oxygen atmosphere |
| CA1324015C (en) * | 1988-10-06 | 1993-11-09 | Yasuo Yamagishi | Method of and apparatus for forming volume type phase hologram |
-
1965
- 1965-06-01 GB GB23394/65A patent/GB1115245A/en not_active Expired
-
1966
- 1966-05-25 DE DE19661522383 patent/DE1522383A1/de active Pending
- 1966-05-31 US US553716A patent/US3615476A/en not_active Expired - Lifetime
- 1966-05-31 BE BE681795D patent/BE681795A/xx unknown
- 1966-05-31 NL NL6607507A patent/NL6607507A/xx unknown
- 1966-06-01 CH CH790766A patent/CH465404A/de unknown
- 1966-06-01 AT AT517266A patent/AT275316B/de active
Also Published As
| Publication number | Publication date |
|---|---|
| DE1522383A1 (de) | 1969-07-17 |
| US3615476A (en) | 1971-10-26 |
| BE681795A (de) | 1966-10-31 |
| AT275316B (de) | 1969-10-27 |
| CH465404A (de) | 1968-11-15 |
| GB1115245A (en) | 1968-05-29 |