NL6516580A - - Google Patents
Info
- Publication number
- NL6516580A NL6516580A NL6516580A NL6516580A NL6516580A NL 6516580 A NL6516580 A NL 6516580A NL 6516580 A NL6516580 A NL 6516580A NL 6516580 A NL6516580 A NL 6516580A NL 6516580 A NL6516580 A NL 6516580A
- Authority
- NL
- Netherlands
- Prior art keywords
- compounds
- vinyl
- dye
- coated
- sensitive
- Prior art date
Links
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 4
- 239000002253 acid Substances 0.000 abstract 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 abstract 2
- 239000003112 inhibitor Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 239000000049 pigment Substances 0.000 abstract 2
- 229920003023 plastic Polymers 0.000 abstract 2
- 239000004033 plastic Substances 0.000 abstract 2
- -1 vinyl compound Chemical class 0.000 abstract 2
- 229920002472 Starch Polymers 0.000 abstract 1
- 244000028419 Styrax benzoin Species 0.000 abstract 1
- 235000000126 Styrax benzoin Nutrition 0.000 abstract 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical class [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- 235000008411 Sumatra benzointree Nutrition 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 150000001408 amides Chemical class 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 abstract 1
- 229960002130 benzoin Drugs 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 150000001735 carboxylic acids Chemical class 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 150000001993 dienes Chemical class 0.000 abstract 1
- 235000019382 gum benzoic Nutrition 0.000 abstract 1
- 150000002366 halogen compounds Chemical class 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 239000001023 inorganic pigment Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 230000007935 neutral effect Effects 0.000 abstract 1
- 150000004027 organic amino compounds Chemical class 0.000 abstract 1
- 150000002896 organic halogen compounds Chemical class 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 235000019698 starch Nutrition 0.000 abstract 1
- 239000008107 starch Substances 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
- 239000000080 wetting agent Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK0054908 | 1964-12-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL6516580A true NL6516580A (de) | 1966-07-01 |
Family
ID=7227288
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL6516580A NL6516580A (de) | 1964-12-30 | 1965-12-20 |
Country Status (7)
Country | Link |
---|---|
US (1) | US3512975A (de) |
AT (1) | AT272831B (de) |
BE (1) | BE674366A (de) |
CH (1) | CH458061A (de) |
FR (1) | FR1467290A (de) |
GB (1) | GB1094368A (de) |
NL (1) | NL6516580A (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3883351A (en) * | 1972-02-09 | 1975-05-13 | Horizons Inc | Method of making a photoresist |
US3899338A (en) * | 1972-02-09 | 1975-08-12 | Horizons Inc | Photosensitive material suitable for use as a photoresist |
US3954468A (en) * | 1974-08-27 | 1976-05-04 | Horizons Incorporated | Radiation process for producing colored photopolymer systems |
US4033773A (en) * | 1974-08-27 | 1977-07-05 | Horizons Incorporated, A Division Of Horizons Research Incorporated | Radiation produced colored photopolymer systems |
DE102008052586A1 (de) * | 2008-10-21 | 2010-04-22 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Zusammensetzung zur Herstellung optischer Elemente mit Gradientenstruktur |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL132290C (de) * | 1959-09-11 | |||
NL256340A (de) * | 1959-09-28 | |||
NL259795A (de) * | 1960-01-08 | |||
US3042518A (en) * | 1960-01-08 | 1962-07-03 | Horizons Inc | Light sensitive photographic compositions |
US3202507A (en) * | 1961-11-22 | 1965-08-24 | Horizons Inc | Photographic method using a light sensitive visible image-bearing masking layer which includes an anti-halation layer |
US3359105A (en) * | 1965-03-10 | 1967-12-19 | Horizons Inc | Speed-increasing agents for an nu-vinyl amine and organic halogen dye former system |
-
1965
- 1965-12-20 NL NL6516580A patent/NL6516580A/xx unknown
- 1965-12-27 US US516709A patent/US3512975A/en not_active Expired - Lifetime
- 1965-12-27 AT AT1167665A patent/AT272831B/de active
- 1965-12-27 BE BE674366A patent/BE674366A/xx unknown
- 1965-12-28 FR FR43988A patent/FR1467290A/fr not_active Expired
- 1965-12-28 CH CH1794065A patent/CH458061A/de unknown
- 1965-12-29 GB GB55094/65A patent/GB1094368A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
AT272831B (de) | 1969-07-25 |
CH458061A (de) | 1968-06-15 |
DE1447748A1 (de) | 1969-05-08 |
BE674366A (de) | 1966-06-27 |
US3512975A (en) | 1970-05-19 |
GB1094368A (en) | 1967-12-13 |
FR1467290A (fr) | 1967-01-27 |
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