NL6411358A - - Google Patents

Info

Publication number
NL6411358A
NL6411358A NL6411358A NL6411358A NL6411358A NL 6411358 A NL6411358 A NL 6411358A NL 6411358 A NL6411358 A NL 6411358A NL 6411358 A NL6411358 A NL 6411358A NL 6411358 A NL6411358 A NL 6411358A
Authority
NL
Netherlands
Application number
NL6411358A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6411358A publication Critical patent/NL6411358A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/002—Inhomogeneous material in general
    • H01B3/004—Inhomogeneous material in general with conductive additives or conductive layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/08—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances quartz; glass; glass wool; slag wool; vitreous enamels
    • H01B3/088—Shaping of glass or deposition of glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/233—Manufacture of photoelectric screens or charge-storage screens

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
NL6411358A 1963-10-01 1964-09-30 NL6411358A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US312929A US3276902A (en) 1963-10-01 1963-10-01 Method of vapor deposition employing an electron beam

Publications (1)

Publication Number Publication Date
NL6411358A true NL6411358A (xx) 1965-04-02

Family

ID=23213635

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6411358A NL6411358A (xx) 1963-10-01 1964-09-30

Country Status (4)

Country Link
US (1) US3276902A (xx)
DE (1) DE1287220B (xx)
GB (1) GB1057239A (xx)
NL (1) NL6411358A (xx)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5064989B1 (en) * 1957-06-27 1996-10-29 Jerome H Lemelson Surface shaping and finishing apparatus and method
US5552675A (en) * 1959-04-08 1996-09-03 Lemelson; Jerome H. High temperature reaction apparatus
US3420978A (en) * 1965-06-30 1969-01-07 Nasa Pretreatment method for antiwettable materials
US3397672A (en) * 1965-11-10 1968-08-20 United States Steel Corp Control system for vapor-deposition coating apparatus
DE1521251B2 (de) * 1966-05-03 1970-03-26 Farbenfabriken Bayer Aktiengesellschaft, 5090 Leverkusen Vorrichtung und Verfahren zum gleichmäßigen Verdampfen und Auftragen von hochschmelzenden Materialien, insbesondere Quarz
US3615275A (en) * 1967-12-12 1971-10-26 Texas Instruments Inc Homogeneously fine-grained vapor-deposited material in bulk form
DE1696110B1 (de) * 1968-01-23 1971-07-01 Jenaer Glaswerk Schott & Gen Verfahren zur herstellung von glasigen schichten auf substat materialien durch vakuumaufdampfen mittels elektronenstrahlen
FR2087114A5 (xx) * 1970-05-05 1971-12-31 Cit Alcatel
JPS5947287B2 (ja) * 1975-03-31 1984-11-17 シャープ株式会社 ツイストネマテイツク液晶表示素子の製造方法
US4664935A (en) * 1985-09-24 1987-05-12 Machine Technology, Inc. Thin film deposition apparatus and method
US4731293A (en) * 1986-06-20 1988-03-15 American Telephone And Telegraph Company, At&T Bell Laboratories Fabrication of devices using phosphorus glasses

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE764927C (de) * 1939-02-22 1951-08-06 Bosch Gmbh Robert Verfahren zur Verdampfung im Vakuum
US2409606A (en) * 1942-09-29 1946-10-15 Rca Corp Alkali halide screen and method of manufacture
US2700626A (en) * 1949-12-09 1955-01-25 Bell Telephone Labor Inc Secondary electron emissive electrodes
US2803569A (en) * 1953-12-03 1957-08-20 Jacobs Harold Formation of junctions in semiconductors
US2866902A (en) * 1955-07-05 1958-12-30 High Voltage Engineering Corp Method of and apparatus for irradiating matter with high energy electrons
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof

Also Published As

Publication number Publication date
DE1287220B (de) 1969-01-16
GB1057239A (en) 1967-02-01
US3276902A (en) 1966-10-04

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