NL298175A - - Google Patents
Info
- Publication number
- NL298175A NL298175A NL298175DA NL298175A NL 298175 A NL298175 A NL 298175A NL 298175D A NL298175D A NL 298175DA NL 298175 A NL298175 A NL 298175A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/10—Duoplasmatrons ; Duopigatrons
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/077—Electron guns using discharge in gases or vapours as electron sources
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DES82505A DE1208420B (de) | 1962-11-20 | 1962-11-20 | Vorrichtung zur Erzeugung eines Strahlenbuendels von Ionen oder Elektronen bei der wenigstens zwei gleichartige Ionen- bzw. Elektronenquellen hintereinander angeordnet sind |
Publications (1)
Publication Number | Publication Date |
---|---|
NL298175A true NL298175A (ja) |
Family
ID=7510392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL298175D NL298175A (ja) | 1962-11-20 |
Country Status (5)
Country | Link |
---|---|
US (1) | US3315125A (ja) |
CH (1) | CH412124A (ja) |
DE (1) | DE1208420B (ja) |
GB (1) | GB1060309A (ja) |
NL (1) | NL298175A (ja) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3453489A (en) * | 1966-04-27 | 1969-07-01 | Xerox Corp | Multiple anode electrode assembly |
US3449628A (en) * | 1966-04-27 | 1969-06-10 | Xerox Corp | Plasma arc electrodes with anode heat shield |
US3408283A (en) * | 1966-09-15 | 1968-10-29 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode positioned in the low pressure region |
US3458743A (en) * | 1966-12-19 | 1969-07-29 | Radiation Dynamics | Positive ion source for use with a duoplasmatron |
US3409529A (en) * | 1967-07-07 | 1968-11-05 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability |
US3513351A (en) * | 1968-06-26 | 1970-05-19 | Atomic Energy Commission | Duoplasmatron-type ion source including a gas reservoir |
US3845300A (en) * | 1973-04-18 | 1974-10-29 | Atomic Energy Commission | Apparatus and method for magnetoplasmadynamic isotope separation |
DE2923724C2 (de) * | 1979-06-12 | 1983-11-03 | W.C. Heraeus Gmbh, 6450 Hanau | Kühlbare Deuteriumlampe |
CH632176A5 (fr) * | 1979-12-06 | 1982-09-30 | Charmilles Sa Ateliers | Procede et dispositif pour usiner par etincelage erosif. |
GB2169131B (en) * | 1984-12-22 | 1988-11-09 | English Electric Valve Co Ltd | Gas discharge devices |
EP0203573B1 (en) * | 1985-05-28 | 1993-08-11 | Rikagaku Kenkyusho | Electron beam-excited ion beam source |
US4841197A (en) * | 1986-05-28 | 1989-06-20 | Nihon Shinku Gijutsu Kabushiki Kaisha | Double-chamber ion source |
GB8803837D0 (en) * | 1988-02-18 | 1988-03-16 | Vg Instr Group | Mass spectrometer |
DE10336273A1 (de) * | 2003-08-07 | 2005-03-10 | Fraunhofer Ges Forschung | Vorrichtung zur Erzeugung von EUV- und weicher Röntgenstrahlung |
US20100024385A1 (en) * | 2006-09-19 | 2010-02-04 | University Of Southampton | Pulsed plasma thruster and method of operation thereof |
WO2014201285A1 (en) * | 2013-06-12 | 2014-12-18 | General Plasma, Inc. | Linear duoplasmatron |
US10176977B2 (en) * | 2014-12-12 | 2019-01-08 | Agilent Technologies, Inc. | Ion source for soft electron ionization and related systems and methods |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE764127C (de) * | 1939-07-09 | 1954-05-17 | Aeg | Mittelbar geheizte Gluehkathode zur Erzeugung eines Elektronenstrahles grosser Stromstaerke |
US2975277A (en) * | 1955-05-10 | 1961-03-14 | Vakutronik Veb | Ion source |
DE1059581B (de) * | 1956-03-28 | 1959-06-18 | Siemens Ag | Plasmaquelle fuer geladene Teilchen |
US3033984A (en) * | 1959-02-17 | 1962-05-08 | United States Steel Corp | Apparatus for increasing the energy of x-rays |
US3137801A (en) * | 1960-09-22 | 1964-06-16 | High Voltage Engineering Corp | Duoplasmatron-type ion source including a non-magnetic anode and magnetic extractor electrode |
-
0
- NL NL298175D patent/NL298175A/xx unknown
-
1962
- 1962-11-20 DE DES82505A patent/DE1208420B/de active Pending
-
1963
- 1963-06-14 US US287817A patent/US3315125A/en not_active Expired - Lifetime
- 1963-08-16 CH CH1017663A patent/CH412124A/de unknown
- 1963-11-20 GB GB45884/63A patent/GB1060309A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1060309A (en) | 1967-03-01 |
DE1208420B (de) | 1966-01-05 |
CH412124A (de) | 1966-04-30 |
US3315125A (en) | 1967-04-18 |