NL294370A - - Google Patents
Info
- Publication number
 - NL294370A NL294370A NL294370DA NL294370A NL 294370 A NL294370 A NL 294370A NL 294370D A NL294370D A NL 294370DA NL 294370 A NL294370 A NL 294370A
 - Authority
 - NL
 - Netherlands
 
Links
Classifications
- 
        
- H—ELECTRICITY
 - H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
 - H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
 - H10D30/00—Field-effect transistors [FET]
 - H10D30/60—Insulated-gate field-effect transistors [IGFET]
 - H10D30/67—Thin-film transistors [TFT]
 - H10D30/674—Thin-film transistors [TFT] characterised by the active materials
 - H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
 
 - 
        
- H—ELECTRICITY
 - H01—ELECTRIC ELEMENTS
 - H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
 - H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
 
 - 
        
- H—ELECTRICITY
 - H01—ELECTRIC ELEMENTS
 - H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
 - H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
 - H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
 - H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
 - H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
 - H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
 - H01L21/0274—Photolithographic processes
 
 - 
        
- H—ELECTRICITY
 - H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
 - H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
 - H10D99/00—Subject matter not provided for in other groups of this subclass
 
 - 
        
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
 - Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10S148/00—Metal treatment
 - Y10S148/106—Masks, special
 
 - 
        
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
 - Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10S148/00—Metal treatment
 - Y10S148/162—Testing steps
 
 - 
        
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
 - Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
 - Y10S438/00—Semiconductor device manufacturing: process
 - Y10S438/942—Masking
 - Y10S438/948—Radiation resist
 - Y10S438/949—Energy beam treating radiation resist on semiconductor
 
 
Landscapes
- Engineering & Computer Science (AREA)
 - Physics & Mathematics (AREA)
 - Condensed Matter Physics & Semiconductors (AREA)
 - General Physics & Mathematics (AREA)
 - Manufacturing & Machinery (AREA)
 - Computer Hardware Design (AREA)
 - Microelectronics & Electronic Packaging (AREA)
 - Power Engineering (AREA)
 - Thin Film Transistor (AREA)
 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| NL294370 | 1963-06-20 | 
Publications (1)
| Publication Number | Publication Date | 
|---|---|
| NL294370A true NL294370A (pm) | 
Family
ID=19754801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| NL294370D NL294370A (pm) | 1963-06-20 | 
Country Status (4)
| Country | Link | 
|---|---|
| US (1) | US3442647A (pm) | 
| DE (1) | DE1489162C3 (pm) | 
| GB (1) | GB1071576A (pm) | 
| NL (1) | NL294370A (pm) | 
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| DE760223C (de) * | 1940-08-14 | 1953-06-15 | Siemens & Halske A G | Elektronenmikroskop, dessen Vakuum mit einer elektrisch beheizten Diffusionspumpe aufrechterhalten wird | 
| DE1614635A1 (de) * | 1967-10-23 | 1970-03-26 | Siemens Ag | Verfahren zum Herstellen von Fotolackmasken fuer Halbleiterzwecke | 
| NL154061B (nl) * | 1967-11-04 | 1977-07-15 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting en halfgeleiderinrichting vervaardigd met behulp van de werkwijze. | 
| US3522649A (en) * | 1969-04-25 | 1970-08-04 | Werk Fur Bauelemente Der Nachr | Method of producing isolated field effect transistors employing pyrolytic graphite | 
| US3619732A (en) * | 1969-05-16 | 1971-11-09 | Energy Conversion Devices Inc | Coplanar semiconductor switch structure | 
| EP0071244B1 (en) * | 1981-07-27 | 1988-11-23 | Kabushiki Kaisha Toshiba | Thin-film transistor and method of manufacture therefor | 
| US4404731A (en) * | 1981-10-01 | 1983-09-20 | Xerox Corporation | Method of forming a thin film transistor | 
| US4678542A (en) * | 1986-07-25 | 1987-07-07 | Energy Conversion Devices, Inc. | Self-alignment process for thin film diode array fabrication | 
| GB8721193D0 (en) * | 1987-09-09 | 1987-10-14 | Wright S W | Semiconductor devices | 
| DE59409959D1 (de) * | 1994-01-05 | 2001-12-20 | Heraeus Electro Nite Int | Elektrisch leitende verbindung | 
| US7427776B2 (en) * | 2004-10-07 | 2008-09-23 | Hewlett-Packard Development Company, L.P. | Thin-film transistor and methods | 
| JP5506213B2 (ja) * | 2009-03-06 | 2014-05-28 | キヤノン株式会社 | 半導体素子の形成方法 | 
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US1967057A (en) * | 1932-10-25 | 1934-07-17 | Irvine Andrew | Art of printing sensitized surfaces | 
| US2914404A (en) * | 1953-07-31 | 1959-11-24 | Blaupunkt Werke Gmbh | Method of producing two-dimensional circuits or circuit elements on supporting bases | 
| NL122283C (pm) * | 1958-07-25 | |||
| NL113853C (pm) * | 1959-07-22 | |||
| US2981877A (en) * | 1959-07-30 | 1961-04-25 | Fairchild Semiconductor | Semiconductor device-and-lead structure | 
| NL255517A (pm) * | 1959-09-04 | |||
| US3222173A (en) * | 1961-05-15 | 1965-12-07 | Vitramon Inc | Method of making an electrical unit | 
| US3313626A (en) * | 1962-08-01 | 1967-04-11 | Russeli H Whitney | Process of making a lithographic printing plate | 
- 
        0
        
- NL NL294370D patent/NL294370A/xx unknown
 
 - 
        1964
        
- 1964-06-01 US US371386A patent/US3442647A/en not_active Expired - Lifetime
 - 1964-06-16 DE DE1489162A patent/DE1489162C3/de not_active Expired
 - 1964-06-17 GB GB25071/64A patent/GB1071576A/en not_active Expired
 
 
Also Published As
| Publication number | Publication date | 
|---|---|
| DE1489162B2 (de) | 1975-01-23 | 
| US3442647A (en) | 1969-05-06 | 
| DE1489162C3 (de) | 1975-08-28 | 
| DE1489162A1 (de) | 1969-06-12 | 
| GB1071576A (en) | 1967-06-07 |