NL275555A - - Google Patents
Info
- Publication number
- NL275555A NL275555A NL275555DA NL275555A NL 275555 A NL275555 A NL 275555A NL 275555D A NL275555D A NL 275555DA NL 275555 A NL275555 A NL 275555A
- Authority
- NL
- Netherlands
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B39/00—Nozzles, funnels or guides for introducing articles or materials into containers or wrappers
- B65B39/06—Nozzles, funnels or guides for introducing articles or materials into containers or wrappers adapted to support containers or wrappers
- B65B39/08—Nozzles, funnels or guides for introducing articles or materials into containers or wrappers adapted to support containers or wrappers by means of clamps
- B65B39/10—Nozzles, funnels or guides for introducing articles or materials into containers or wrappers adapted to support containers or wrappers by means of clamps operating automatically
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DES73645A DE1206261B (en) | 1961-04-25 | 1961-04-25 | Device for separating the purest semiconductor material from a flowing mixture of a gaseous compound, preferably a halide, the semiconductor material and a gaseous reactant |
Publications (1)
Publication Number | Publication Date |
---|---|
NL275555A true NL275555A (en) |
Family
ID=7504069
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL275555D NL275555A (en) | 1961-04-25 |
Country Status (5)
Country | Link |
---|---|
BE (1) | BE616861A (en) |
CH (1) | CH422728A (en) |
DE (1) | DE1206261B (en) |
GB (1) | GB960035A (en) |
NL (1) | NL275555A (en) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1061593B (en) * | 1956-06-25 | 1959-07-16 | Siemens Ag | Device for obtaining the purest semiconductor material for electrotechnical purposes |
-
0
- NL NL275555D patent/NL275555A/xx unknown
-
1961
- 1961-04-25 DE DES73645A patent/DE1206261B/en active Pending
-
1962
- 1962-01-30 CH CH113362A patent/CH422728A/en unknown
- 1962-03-29 GB GB1213562A patent/GB960035A/en not_active Expired
- 1962-04-25 BE BE616861A patent/BE616861A/en unknown
Also Published As
Publication number | Publication date |
---|---|
CH422728A (en) | 1966-10-31 |
DE1206261B (en) | 1965-12-02 |
GB960035A (en) | 1964-06-10 |
BE616861A (en) | 1962-10-25 |