NL273285A - - Google Patents

Info

Publication number
NL273285A
NL273285A NL273285DA NL273285A NL 273285 A NL273285 A NL 273285A NL 273285D A NL273285D A NL 273285DA NL 273285 A NL273285 A NL 273285A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL273285A publication Critical patent/NL273285A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/34Imagewise removal by selective transfer, e.g. peeling away
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/62Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/02Exposure apparatus for contact printing
    • G03B27/14Details
    • G03B27/30Details adapted to be combined with processing apparatus
    • G03B27/306Heat development
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL273285D 1961-01-09 NL273285A (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81377A US3060026A (en) 1961-01-09 1961-01-09 Photopolymerization process of image reproduction

Publications (1)

Publication Number Publication Date
NL273285A true NL273285A (no)

Family

ID=22163761

Family Applications (1)

Application Number Title Priority Date Filing Date
NL273285D NL273285A (no) 1961-01-09

Country Status (5)

Country Link
US (1) US3060026A (no)
BE (1) BE612418A (no)
DE (1) DE1225048B (no)
GB (1) GB1001831A (no)
NL (1) NL273285A (no)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3198633A (en) * 1961-12-01 1965-08-03 Du Pont Photopolymerizable elements and transfer processes
NL286171A (no) * 1961-12-01
US3264103A (en) * 1962-06-27 1966-08-02 Du Pont Photopolymerizable relief printing plates developed by dry thermal transfer
BE639063A (no) * 1962-10-24
US3941596A (en) * 1962-10-24 1976-03-02 E. I. Du Pont De Nemours And Company Thermographic processes using polymer layer capable of existing in metastable state
US3245796A (en) * 1962-10-25 1966-04-12 Du Pont Photopolymerizable elements and processes
US3306744A (en) * 1962-12-17 1967-02-28 Polaroid Corp Copying process using dithioxamides, heavy metal salts and photopolymerizable monomers and photocross linkable polymers
US3307943A (en) * 1963-05-14 1967-03-07 Du Pont Image reproduction elements and processes
US3353955A (en) * 1964-06-16 1967-11-21 Du Pont Stratum transfer process based on adhesive properties of photopolymerizable layer
US3408191A (en) * 1964-10-28 1968-10-29 Du Pont Process of double exposing a photo-polymerizable stratum laminated between two supports, said double exposure determining the support which retains the positive image
GB1124756A (en) * 1964-11-28 1968-08-21 Kodak Ltd Photographic reproduction
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US3452676A (en) * 1967-03-16 1969-07-01 Columbia Ribbon Carbon Mfg Heat-sensitive planographic printing plates and processes
US3607264A (en) * 1967-11-22 1971-09-21 Du Pont Image reproduction process involving photohardening and delamination
US3615435A (en) * 1968-02-14 1971-10-26 Du Pont Photohardenable image reproduction element with integral pigmented layer and process for use
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3645730A (en) * 1968-10-11 1972-02-29 Grace W R & Co Reproduction of images using light sensitive curable liquid polymers
US3649268A (en) * 1969-02-05 1972-03-14 Du Pont Process for forming images by photohardening and applying a colorant
US3891441A (en) * 1969-08-01 1975-06-24 Fuji Photo Film Co Ltd Light-sensitive stencil printing material with porous support and cover sheets
BE757386A (fr) * 1969-10-13 1971-04-13 Du Pont Procede de transfert double pour images photodurcissables
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
US4323636A (en) * 1971-04-01 1982-04-06 E. I. Du Pont De Nemours And Company Photosensitive block copolymer composition and elements
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
US4002478A (en) * 1973-03-15 1977-01-11 Kansai Paint Company, Ltd. Method for forming relief pattern
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
US3901705A (en) * 1973-09-06 1975-08-26 Du Pont Method of using variable depth photopolymerization imaging systems
US3885964A (en) * 1974-05-31 1975-05-27 Du Pont Photoimaging process using nitroso dimer
US3997344A (en) * 1974-07-05 1976-12-14 American Can Company Dry positive photopolymer imaging process involving heating and application of toner
JPS6032173B2 (ja) * 1974-12-28 1985-07-26 富士写真フイルム株式会社 画像形成法
GB1581435A (en) * 1976-05-07 1980-12-17 Letraset International Ltd Production of dry transfer materials
US4423135A (en) * 1981-01-28 1983-12-27 E. I. Du Pont De Nemours & Co. Preparation of photosensitive block copolymer elements
US4615665A (en) * 1983-05-06 1986-10-07 Dentsply International Inc. Method for making dental prosthetic device with oxygen barrier layer and visible light irradiation to cure polymer
US4508807A (en) * 1983-07-11 1985-04-02 Mead Corporation Photosensitive material employing encapsulated radiation sensitive composition and a transparentizable image-receiving layer
US4535050A (en) * 1983-07-18 1985-08-13 The Mead Corporation Peeling development of photosensitive materials employing microencapsulated radiation sensitive compositions
US4903991A (en) * 1983-07-18 1990-02-27 The Mead Corporation Document security system
DE3606266A1 (de) * 1986-02-27 1987-09-03 Basf Ag Lichtempfindliches aufzeichnungselement
DE3618373A1 (de) * 1986-05-31 1987-12-03 Basf Ag Lichtempfindliches aufzeichnungselement
US5055375A (en) * 1987-09-17 1991-10-08 Toyo Ink Manufacturing Co., Ltd. Method of image formation using heated rollers
DE69205226T2 (de) * 1991-07-12 1996-05-15 Agfa Gevaert Nv Verfahren zur Herstellung von Bildern mittels einer photopolymerisierbaren Zusammensetzung.
EP0653684A1 (en) * 1993-11-16 1995-05-17 Agfa-Gevaert N.V. Imaging element comprising a photopolymerizable composition and methods for producing lithographic plates therewith
DE69325380T2 (de) * 1993-12-20 2000-02-24 Agfa-Gevaert N.V., Mortsel Trocken-Bildaufzeichnungsverfahren
WO1996010214A1 (en) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Negative working overlay colour proofing system
WO1996010215A1 (en) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Negative working surprint colour proofing system
WO1996010216A1 (en) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Negative or positive working surprint colour proofing system
US20060027113A1 (en) 2004-08-03 2006-02-09 Hackler Mark A Method and apparatus for thermal development with supporting surface for a development medium
US20060154180A1 (en) 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
US7358026B2 (en) * 2005-09-15 2008-04-15 E. I. Du Pont De Nemours And Company Method for thermal development of a photosensitive element using a development medium having a support
WO2012166953A1 (en) * 2011-05-31 2012-12-06 Nanoptics, Incorporated Method and apparatus for lithographic manufacture of multi-component polymeric fiber plates
US8895228B2 (en) 2011-11-02 2014-11-25 E I Du Pont De Nemours And Company Method for thermal treatment of relief surface for a relief printing form
US8985020B2 (en) 2011-11-02 2015-03-24 E I Du Pont De Nemours And Company Method and apparatus for thermal treatment of printing surface in relief printing

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2073033A (en) * 1935-02-21 1937-03-09 Szasz Geza Photographic duplicating process
NL87862C (no) * 1951-08-20
US2704712A (en) * 1952-09-18 1955-03-22 Eastman Kodak Co Photographic copying process
US2948611A (en) * 1957-10-30 1960-08-09 Du Pont Photopolymerizable compositions, elements, and processes

Also Published As

Publication number Publication date
DE1225048B (de) 1966-09-15
US3060026A (en) 1962-10-23
BE612418A (no)
GB1001831A (en) 1965-08-18

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