NL255428A - - Google Patents
Info
- Publication number
- NL255428A NL255428A NL255428DA NL255428A NL 255428 A NL255428 A NL 255428A NL 255428D A NL255428D A NL 255428DA NL 255428 A NL255428 A NL 255428A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0223—Iminoquinonediazides; Para-quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK38592A DE1104824B (de) | 1959-09-01 | 1959-09-01 | Kopiermaterial fuer die photomechanische Herstellung von Druckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL255428A true NL255428A (cg-RX-API-DMAC10.html) |
Family
ID=7221432
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL121233D NL121233C (cg-RX-API-DMAC10.html) | 1959-09-01 | ||
| NL255428D NL255428A (cg-RX-API-DMAC10.html) | 1959-09-01 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL121233D NL121233C (cg-RX-API-DMAC10.html) | 1959-09-01 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3180732A (cg-RX-API-DMAC10.html) |
| BE (1) | BE594514A (cg-RX-API-DMAC10.html) |
| CH (1) | CH393920A (cg-RX-API-DMAC10.html) |
| DE (1) | DE1104824B (cg-RX-API-DMAC10.html) |
| GB (1) | GB942404A (cg-RX-API-DMAC10.html) |
| NL (2) | NL255428A (cg-RX-API-DMAC10.html) |
| SE (1) | SE318191B (cg-RX-API-DMAC10.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2447225C2 (de) * | 1974-10-03 | 1983-12-22 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zum Ablösen von positiven Photolack |
-
0
- NL NL121233D patent/NL121233C/xx active
- BE BE594514D patent/BE594514A/xx unknown
- NL NL255428D patent/NL255428A/xx unknown
-
1959
- 1959-09-01 DE DEK38592A patent/DE1104824B/de active Pending
-
1960
- 1960-08-26 GB GB29556/60A patent/GB942404A/en not_active Expired
- 1960-08-29 SE SE8213/60A patent/SE318191B/xx unknown
- 1960-08-30 CH CH978460A patent/CH393920A/de unknown
-
1963
- 1963-07-24 US US297237A patent/US3180732A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| NL121233C (cg-RX-API-DMAC10.html) | |
| US3180732A (en) | 1965-04-27 |
| GB942404A (en) | 1963-11-20 |
| DE1104824B (de) | 1961-04-13 |
| CH393920A (de) | 1965-06-15 |
| SE318191B (cg-RX-API-DMAC10.html) | 1969-12-01 |
| BE594514A (cg-RX-API-DMAC10.html) |