CH393920A - Kopiermaterial für die photomechanische Reproduktion - Google Patents

Kopiermaterial für die photomechanische Reproduktion

Info

Publication number
CH393920A
CH393920A CH978460A CH978460A CH393920A CH 393920 A CH393920 A CH 393920A CH 978460 A CH978460 A CH 978460A CH 978460 A CH978460 A CH 978460A CH 393920 A CH393920 A CH 393920A
Authority
CH
Switzerland
Prior art keywords
copy material
photomechanical reproduction
photomechanical
reproduction
copy
Prior art date
Application number
CH978460A
Other languages
English (en)
Inventor
Oskar Dr Sues
Johannes Dr Munder
Hartmut Dr Steppan
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of CH393920A publication Critical patent/CH393920A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0223—Iminoquinonediazides; Para-quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CH978460A 1959-09-01 1960-08-30 Kopiermaterial für die photomechanische Reproduktion CH393920A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK38592A DE1104824B (de) 1959-09-01 1959-09-01 Kopiermaterial fuer die photomechanische Herstellung von Druckformen

Publications (1)

Publication Number Publication Date
CH393920A true CH393920A (de) 1965-06-15

Family

ID=7221432

Family Applications (1)

Application Number Title Priority Date Filing Date
CH978460A CH393920A (de) 1959-09-01 1960-08-30 Kopiermaterial für die photomechanische Reproduktion

Country Status (7)

Country Link
US (1) US3180732A (de)
BE (1) BE594514A (de)
CH (1) CH393920A (de)
DE (1) DE1104824B (de)
GB (1) GB942404A (de)
NL (2) NL255428A (de)
SE (1) SE318191B (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2447225C2 (de) * 1974-10-03 1983-12-22 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Ablösen von positiven Photolack

Also Published As

Publication number Publication date
NL121233C (de)
US3180732A (en) 1965-04-27
GB942404A (en) 1963-11-20
NL255428A (de)
BE594514A (de)
SE318191B (de) 1969-12-01
DE1104824B (de) 1961-04-13

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