NL230139A - - Google Patents
Info
- Publication number
- NL230139A NL230139A NL230139DA NL230139A NL 230139 A NL230139 A NL 230139A NL 230139D A NL230139D A NL 230139DA NL 230139 A NL230139 A NL 230139A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/18—Benzimidazoles; Hydrogenated benzimidazoles with aryl radicals directly attached in position 2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK32622A DE1047622B (de) | 1957-08-03 | 1957-08-03 | Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL230139A true NL230139A (US08124317-20120228-C00026.png) |
Family
ID=7219501
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL230139D NL230139A (US08124317-20120228-C00026.png) | 1957-08-03 | ||
| NL104507D NL104507C (US08124317-20120228-C00026.png) | 1957-08-03 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL104507D NL104507C (US08124317-20120228-C00026.png) | 1957-08-03 |
Country Status (7)
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3868254A (en) * | 1972-11-29 | 1975-02-25 | Gaf Corp | Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants |
| US4024122A (en) * | 1973-02-12 | 1977-05-17 | Rca Corporation | Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone) |
| US4093461A (en) * | 1975-07-18 | 1978-06-06 | Gaf Corporation | Positive working thermally stable photoresist composition, article and method of using |
| US4853315A (en) * | 1988-01-15 | 1989-08-01 | International Business Machines Corporation | O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists |
| US5273856A (en) * | 1990-10-31 | 1993-12-28 | International Business Machines Corporation | Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation |
| JP2976597B2 (ja) * | 1991-04-17 | 1999-11-10 | 住友化学工業株式会社 | キノンジアジドスルホン酸エステルの製造方法 |
| KR20080028424A (ko) * | 2005-07-11 | 2008-03-31 | 이데미쓰 고산 가부시키가이샤 | 질소 함유 헤테로환 유도체 및 그것을 사용한 유기전기발광 소자 |
| US8187727B2 (en) | 2005-07-22 | 2012-05-29 | Lg Chem, Ltd. | Imidazole derivatives, preparation method thereof and organic electronic device using the same |
| WO2017122528A1 (ja) * | 2016-01-13 | 2017-07-20 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法及び酸拡散制御剤 |
| JP7215970B2 (ja) * | 2019-06-28 | 2023-01-31 | 富士フイルム株式会社 | 光電変換素子、撮像素子、光センサ、光電変換素子用材料、化合物 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB567659A (en) * | 1943-06-17 | 1945-02-26 | Nat Marking Machine Company Lt | Improvements in or relating to laundry marking with fluorescent material |
| NL78797C (US08124317-20120228-C00026.png) * | 1949-07-23 | |||
| BE497206A (US08124317-20120228-C00026.png) * | 1949-07-30 | |||
| CH307356A (de) * | 1951-08-08 | 1955-05-31 | Kalle & Co Ag | Lichtempfindliches Material für die photomechanische Reproduktion. |
| US2754209A (en) * | 1952-06-10 | 1956-07-10 | Azoplate Corp | Light-sensitive para quinone diazides for making printing plates |
-
0
- NL NL230139D patent/NL230139A/xx unknown
- BE BE569884D patent/BE569884A/xx unknown
- NL NL104507D patent/NL104507C/xx active
-
1957
- 1957-08-03 DE DEK32622A patent/DE1047622B/de active Pending
-
1958
- 1958-07-25 CH CH6223558A patent/CH371689A/de unknown
- 1958-07-28 US US751114A patent/US3050389A/en not_active Expired - Lifetime
- 1958-07-30 FR FR1209341D patent/FR1209341A/fr not_active Expired
- 1958-07-31 GB GB24718/58A patent/GB837368A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL104507C (US08124317-20120228-C00026.png) | |
| FR1209341A (fr) | 1960-03-01 |
| GB837368A (en) | 1960-06-15 |
| CH371689A (de) | 1963-08-31 |
| US3050389A (en) | 1962-08-21 |
| DE1047622B (de) | 1958-12-24 |
| BE569884A (US08124317-20120228-C00026.png) |
