NL207001A - - Google Patents
Info
- Publication number
- NL207001A NL207001A NL207001DA NL207001A NL 207001 A NL207001 A NL 207001A NL 207001D A NL207001D A NL 207001DA NL 207001 A NL207001 A NL 207001A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
- C08G59/1461—Unsaturated monoacids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Emergency Medicine (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1342055A GB794572A (en) | 1955-05-09 | 1955-05-09 | Improvements in photopolymerizable compositions and printing plates containing them |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL207001A true NL207001A (fr) |
Family
ID=10022637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL207001D NL207001A (fr) | 1955-05-09 |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE1104339B (fr) |
| GB (1) | GB794572A (fr) |
| NL (1) | NL207001A (fr) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3387976A (en) * | 1964-07-22 | 1968-06-11 | Harris Intertype Corp | Photopolymer and lithographic plates |
| BE682303A (fr) * | 1965-06-09 | 1966-11-14 | ||
| US4486526A (en) * | 1969-05-29 | 1984-12-04 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials |
| US4330611A (en) * | 1969-05-29 | 1982-05-18 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials |
| US3661576A (en) * | 1970-02-09 | 1972-05-09 | Brady Co W H | Photopolymerizable compositions and articles |
| JPS5515697B1 (fr) * | 1971-07-02 | 1980-04-25 | ||
| EP0030213A1 (fr) * | 1979-11-29 | 1981-06-10 | Ciba-Geigy Ag | Couche photo-réticulable sur des surfaces d'impression et procédé de fabrication de plaques d'impression offset |
| EP0204292B1 (fr) * | 1985-06-05 | 1991-05-29 | Siemens Aktiengesellschaft | Procédé pour la fabrication de circuits imprimés utilisant un système photopolymérisable |
| EP0309783A3 (fr) * | 1987-09-28 | 1989-08-30 | Siemens Nixdorf Informationssysteme Aktiengesellschaft | Résines réticulables par rayonnement pour applications dans l'électronique |
-
0
- NL NL207001D patent/NL207001A/xx unknown
-
1955
- 1955-05-09 GB GB1342055A patent/GB794572A/en not_active Expired
-
1956
- 1956-05-08 DE DEG19576A patent/DE1104339B/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB794572A (en) | 1958-05-07 |
| DE1104339B (de) | 1961-04-06 |