GB794572A - Improvements in photopolymerizable compositions and printing plates containing them - Google Patents

Improvements in photopolymerizable compositions and printing plates containing them

Info

Publication number
GB794572A
GB794572A GB1342055A GB1342055A GB794572A GB 794572 A GB794572 A GB 794572A GB 1342055 A GB1342055 A GB 1342055A GB 1342055 A GB1342055 A GB 1342055A GB 794572 A GB794572 A GB 794572A
Authority
GB
United Kingdom
Prior art keywords
mixture
toluene
ketone
parts
epoxy resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1342055A
Inventor
Armand De Waile
John Henry Croker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NRG Manufacturing Ltd
Original Assignee
NRG Manufacturing Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL207001D priority Critical patent/NL207001A/xx
Application filed by NRG Manufacturing Ltd filed Critical NRG Manufacturing Ltd
Priority to GB1342055A priority patent/GB794572A/en
Priority to DEG19576A priority patent/DE1104339B/en
Publication of GB794572A publication Critical patent/GB794572A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C08G59/1461Unsaturated monoacids
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Emergency Medicine (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Epoxy Resins (AREA)

Abstract

Photopolymerizable compositions for use in the production of printing plates employed in offset lithography consist of an epoxy resin, obtained by reaction of epichlorhydrin with polyhydric phenols or alcohols, esterified with an unsaturated aliphatic monocarboxylic acid or a cycloaliphatic, aromatic or heterocyclic monocarboxylic acids having unsaturated side chains and a photopolymerizable catalyst. Unsaturated acids specified are cinnamic, sorbic, cyclohexanylacrylic, furyl acrylic; the corresponding acid chlorides or anhydrides may also be used; known esterification methods are employed. Suitable catalysts for the photopolymerization are quinones, e.g. tolyquinone, 2 : 6 dichlorquinone, 2 : 5-diphenyl-p-quinone, 1 : 2 and 1 : 4 naphthaquinone anthraquinones; Michler's ketone, 4,41-tetraethyldiamine; diphenyl ketone, 4 : 41-tetramethyl diamino diphenyl carbinol, 4 : 41-tetramethyl diamino benzophenone imide; cross linking may be effected by addition of dicinnamylidene vinyl ketone. Stability of the compounds is improved by adding inhibitors, e.g. hydroquinone. The materials may be applied to the plate in solution in mixtures of toluene and methyl ethyl ketone. (1) 20 Parts epoxy resin were mixed with toluene and heated under reflux and cooled. 50 Parts cinnamoyl chloride were added and the mixture refluxed at 100-110 DEG C. The mixture was diluted with toluene and the epoxy ester precipitated by addition of ethyl alcohol. A 1 per cent solution of a mixture of 200 parts of the ester and 5 parts dicinnamylidene vinyl ketone in a 95 per cent toluene-5 per cent butanol mixture was applied to an aluminium base plate and dried. The plate was exposed to ultra-violet radiation and then developed with a composition comprising an epoxy resin dissolved in a mixture of xylene and cyclohexanol, dibutyl phthalate carbon black and gum arabic.
GB1342055A 1955-05-09 1955-05-09 Improvements in photopolymerizable compositions and printing plates containing them Expired GB794572A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
NL207001D NL207001A (en) 1955-05-09
GB1342055A GB794572A (en) 1955-05-09 1955-05-09 Improvements in photopolymerizable compositions and printing plates containing them
DEG19576A DE1104339B (en) 1955-05-09 1956-05-08 Copy layer made of epoxy resins for planographic printing plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1342055A GB794572A (en) 1955-05-09 1955-05-09 Improvements in photopolymerizable compositions and printing plates containing them

Publications (1)

Publication Number Publication Date
GB794572A true GB794572A (en) 1958-05-07

Family

ID=10022637

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1342055A Expired GB794572A (en) 1955-05-09 1955-05-09 Improvements in photopolymerizable compositions and printing plates containing them

Country Status (3)

Country Link
DE (1) DE1104339B (en)
GB (1) GB794572A (en)
NL (1) NL207001A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3387976A (en) * 1964-07-22 1968-06-11 Harris Intertype Corp Photopolymer and lithographic plates
US3647470A (en) * 1965-06-09 1972-03-07 Agency Ind Science Techn Photosensitive compositions containing furylacrylyl-containing polymer
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
US3816140A (en) * 1971-07-02 1974-06-11 Fuji Photo Film Co Ltd Light-sensitive composition containing ketone-formaldehyde resin
US4330611A (en) * 1969-05-29 1982-05-18 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials
US4486526A (en) * 1969-05-29 1984-12-04 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0030213A1 (en) * 1979-11-29 1981-06-10 Ciba-Geigy Ag Photo-cross-linkable layer on printing surfaces and process for the manufacture of offset printing plates
DE3679453D1 (en) * 1985-06-05 1991-07-04 Siemens Ag METHOD FOR PRODUCING PRINTED CIRCUITS USING A RADIATION NETWORKING PHOTOPOLYMER SYSTEM.
EP0309783A3 (en) * 1987-09-28 1989-08-30 Siemens Nixdorf Informationssysteme Aktiengesellschaft Radiation crosslinkable resins for applications in the electronic

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3387976A (en) * 1964-07-22 1968-06-11 Harris Intertype Corp Photopolymer and lithographic plates
US3647470A (en) * 1965-06-09 1972-03-07 Agency Ind Science Techn Photosensitive compositions containing furylacrylyl-containing polymer
US4330611A (en) * 1969-05-29 1982-05-18 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials
US4486526A (en) * 1969-05-29 1984-12-04 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
US3816140A (en) * 1971-07-02 1974-06-11 Fuji Photo Film Co Ltd Light-sensitive composition containing ketone-formaldehyde resin

Also Published As

Publication number Publication date
DE1104339B (en) 1961-04-06
NL207001A (en)

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