NL2022769A - Spatial modulation of a light beam - Google Patents
Spatial modulation of a light beam Download PDFInfo
- Publication number
- NL2022769A NL2022769A NL2022769A NL2022769A NL2022769A NL 2022769 A NL2022769 A NL 2022769A NL 2022769 A NL2022769 A NL 2022769A NL 2022769 A NL2022769 A NL 2022769A NL 2022769 A NL2022769 A NL 2022769A
- Authority
- NL
- Netherlands
- Prior art keywords
- target
- light
- light beam
- modified
- components
- Prior art date
Links
- 230000005855 radiation Effects 0.000 claims description 46
- 238000000059 patterning Methods 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 27
- 238000005286 illumination Methods 0.000 claims description 9
- 238000001459 lithography Methods 0.000 claims description 4
- 239000013077 target material Substances 0.000 abstract description 58
- 230000003287 optical effect Effects 0.000 description 81
- 238000000034 method Methods 0.000 description 34
- 230000003993 interaction Effects 0.000 description 26
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 20
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 19
- 239000000446 fuel Substances 0.000 description 17
- 230000015572 biosynthetic process Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- 230000006870 function Effects 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- 239000007788 liquid Substances 0.000 description 12
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 11
- 229910052718 tin Inorganic materials 0.000 description 11
- 229910002092 carbon dioxide Inorganic materials 0.000 description 10
- 239000001569 carbon dioxide Substances 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 9
- 230000002123 temporal effect Effects 0.000 description 9
- 230000036278 prepulse Effects 0.000 description 8
- 238000009826 distribution Methods 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 6
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 229910052744 lithium Inorganic materials 0.000 description 5
- 238000000206 photolithography Methods 0.000 description 5
- 239000013076 target substance Substances 0.000 description 5
- 229910052724 xenon Inorganic materials 0.000 description 5
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 5
- 229910000807 Ga alloy Inorganic materials 0.000 description 4
- 230000003044 adaptive effect Effects 0.000 description 4
- 230000001427 coherent effect Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000003068 static effect Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910001868 water Inorganic materials 0.000 description 3
- 229910000846 In alloy Inorganic materials 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- -1 for example Substances 0.000 description 2
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 150000003606 tin compounds Chemical class 0.000 description 2
- ZSUXOVNWDZTCFN-UHFFFAOYSA-L tin(ii) bromide Chemical compound Br[Sn]Br ZSUXOVNWDZTCFN-UHFFFAOYSA-L 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910021623 Tin(IV) bromide Inorganic materials 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- LTSUHJWLSNQKIP-UHFFFAOYSA-J tin(iv) bromide Chemical compound Br[Sn](Br)(Br)Br LTSUHJWLSNQKIP-UHFFFAOYSA-J 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0085—Modulating the output, i.e. the laser beam is modulated outside the laser cavity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
- H01S3/2391—Parallel arrangements emitting at different wavelengths
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Plasma Technology (AREA)
Claims (3)
- CONCLUSIE1. Een lithografieinrichting omvattende:een belichtinginrichting ingericht voor het leveren van een stralingsbundel;
- 5 een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel;een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op
- 10 een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
FIG. 1B
3/10
233..G4/10
o <3Li_5/10
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862651928P | 2018-04-03 | 2018-04-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2022769A true NL2022769A (en) | 2019-10-09 |
Family
ID=65904410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2022769A NL2022769A (en) | 2018-04-03 | 2019-03-20 | Spatial modulation of a light beam |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7356439B2 (nl) |
| CN (1) | CN111955058A (nl) |
| NL (1) | NL2022769A (nl) |
| TW (1) | TWI820102B (nl) |
| WO (1) | WO2019192841A1 (nl) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11262591B2 (en) * | 2018-11-09 | 2022-03-01 | Kla Corporation | System and method for pumping laser sustained plasma with an illumination source having modified pupil power distribution |
| US11297289B2 (en) * | 2019-12-26 | 2022-04-05 | Himax Technologies Limited | Structured light projector |
| IL296535A (en) * | 2020-04-09 | 2022-11-01 | Asml Netherlands Bv | Laser seed system for radiation source |
| CN117296455A (zh) * | 2021-05-10 | 2023-12-26 | 通快激光系统半导体制造有限公司 | Euv激发光源和euv光源 |
| EP4125165B1 (de) * | 2021-07-28 | 2023-11-01 | TRUMPF Lasersystems for Semiconductor Manufacturing GmbH | Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene |
| DE102022119609A1 (de) | 2022-08-04 | 2024-02-15 | Trumpf Laser Gmbh | Lasersystem und Verfahren zur Bereitstellung eines zur Wechselwirkung mit einem Targetmaterial vorgesehenen gepulsten Laserstrahls |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3698677B2 (ja) * | 2002-03-15 | 2005-09-21 | 川崎重工業株式会社 | レーザパルス制御方法と装置およびｘ線発生方法と装置 |
| JP2007503723A (ja) * | 2003-08-22 | 2007-02-22 | プレックス・エルエルシー | 光学アドレス式極紫外線モジュレータ及びこのモジュレータを含むリソグラフィー装置 |
| WO2005026843A2 (en) * | 2003-09-12 | 2005-03-24 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure installation |
| CN101470269A (zh) * | 2007-12-26 | 2009-07-01 | 中国科学院微电子研究所 | 激光远距离传输中央光斑的超分辨压缩振幅光调制器 |
| CN102472981B (zh) * | 2009-08-14 | 2015-07-08 | Asml荷兰有限公司 | Euv辐射系统和光刻设备 |
| JP5758662B2 (ja) * | 2011-03-23 | 2015-08-05 | 国立大学法人大阪大学 | 極端紫外光生成装置及び極端紫外光生成方法 |
| US8993976B2 (en) * | 2011-08-19 | 2015-03-31 | Asml Netherlands B.V. | Energy sensors for light beam alignment |
| JP6498680B2 (ja) * | 2014-01-27 | 2019-04-10 | エーエスエムエル ネザーランズ ビー．ブイ． | 放射源 |
| US9357625B2 (en) * | 2014-07-07 | 2016-05-31 | Asml Netherlands B.V. | Extreme ultraviolet light source |
| WO2016012192A1 (en) * | 2014-07-21 | 2016-01-28 | Asml Netherlands B.V. | Radiation source |
| WO2017194393A1 (en) * | 2016-05-11 | 2017-11-16 | Asml Netherlands B.V. | Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method |
-
2019
- 2019-03-20 JP JP2020545675A patent/JP7356439B2/ja active Active
- 2019-03-20 NL NL2022769A patent/NL2022769A/en unknown
- 2019-03-20 CN CN201980024259.0A patent/CN111955058A/zh active Pending
- 2019-03-20 WO PCT/EP2019/056898 patent/WO2019192841A1/en active Application Filing
- 2019-03-27 TW TW108110586A patent/TWI820102B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019192841A1 (en) | 2019-10-10 |
| CN111955058A (zh) | 2020-11-17 |
| TWI820102B (zh) | 2023-11-01 |
| KR20200138728A (ko) | 2020-12-10 |
| JP7356439B2 (ja) | 2023-10-04 |
| TW201945792A (zh) | 2019-12-01 |
| JP2021517662A (ja) | 2021-07-26 |
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