NL2021608A - Control system for a lithographic apparatus - Google Patents
Control system for a lithographic apparatus Download PDFInfo
- Publication number
- NL2021608A NL2021608A NL2021608A NL2021608A NL2021608A NL 2021608 A NL2021608 A NL 2021608A NL 2021608 A NL2021608 A NL 2021608A NL 2021608 A NL2021608 A NL 2021608A NL 2021608 A NL2021608 A NL 2021608A
- Authority
- NL
- Netherlands
- Prior art keywords
- mirror
- radiation
- radiation beam
- wavefront
- mirrors
- Prior art date
Links
- 230000005855 radiation Effects 0.000 claims abstract description 238
- 239000000758 substrate Substances 0.000 claims description 22
- 238000000059 patterning Methods 0.000 claims description 9
- 238000001459 lithography Methods 0.000 claims 1
- 230000008859 change Effects 0.000 abstract description 77
- 230000004075 alteration Effects 0.000 description 34
- 239000000446 fuel Substances 0.000 description 30
- 230000003287 optical effect Effects 0.000 description 23
- 230000036278 prepulse Effects 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 14
- 201000009310 astigmatism Diseases 0.000 description 11
- 238000005286 illumination Methods 0.000 description 10
- 238000012876 topography Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 206010010071 Coma Diseases 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 235000004035 Cryptotaenia japonica Nutrition 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 102000007641 Trefoil Factors Human genes 0.000 description 2
- 235000015724 Trifolium pratense Nutrition 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lasers (AREA)
- Microscoopes, Condenser (AREA)
- X-Ray Techniques (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17192125 | 2017-09-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2021608A true NL2021608A (en) | 2019-03-26 |
Family
ID=59923324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2021608A NL2021608A (en) | 2017-09-20 | 2018-09-12 | Control system for a lithographic apparatus |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2020534674A (ja) |
| KR (1) | KR20200057003A (ja) |
| CN (1) | CN111095041B (ja) |
| NL (1) | NL2021608A (ja) |
| WO (1) | WO2019057583A1 (ja) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3820783A1 (de) * | 1988-06-20 | 1990-01-04 | Fraunhofer Ges Forschung | Optische anordnung zur korrektur einer astigmatischen abbildung |
| JP3341269B2 (ja) * | 1993-12-22 | 2002-11-05 | 株式会社ニコン | 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法 |
| US7372633B2 (en) * | 2006-07-18 | 2008-05-13 | Asml Netherlands B.V. | Lithographic apparatus, aberration correction device and device manufacturing method |
| KR101795610B1 (ko) * | 2009-12-23 | 2017-11-08 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 디바이스 제조 방법 |
| NL2009844A (en) * | 2011-12-22 | 2013-06-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| DE102012202057B4 (de) * | 2012-02-10 | 2021-07-08 | Carl Zeiss Smt Gmbh | Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement |
| DE102014012456A1 (de) * | 2014-08-21 | 2016-02-25 | Steinmeyer Mechatronik GmbH | Optische Strahlführungseinheit und Materialbearbeitungsvorrichtung mit einer optischen Strahlführungseinheit |
| CN105511231B (zh) * | 2014-10-16 | 2019-03-29 | 中芯国际集成电路制造(上海)有限公司 | Euv光源和曝光装置 |
-
2018
- 2018-09-12 JP JP2020512442A patent/JP2020534674A/ja active Pending
- 2018-09-12 CN CN201880060643.1A patent/CN111095041B/zh active Active
- 2018-09-12 NL NL2021608A patent/NL2021608A/en unknown
- 2018-09-12 WO PCT/EP2018/074604 patent/WO2019057583A1/en active Application Filing
- 2018-09-12 KR KR1020207008045A patent/KR20200057003A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| CN111095041A (zh) | 2020-05-01 |
| CN111095041B (zh) | 2022-06-28 |
| JP2020534674A (ja) | 2020-11-26 |
| KR20200057003A (ko) | 2020-05-25 |
| WO2019057583A1 (en) | 2019-03-28 |
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