NL2016069A - Radiation Sensor - Google Patents

Radiation Sensor Download PDF

Info

Publication number
NL2016069A
NL2016069A NL2016069A NL2016069A NL2016069A NL 2016069 A NL2016069 A NL 2016069A NL 2016069 A NL2016069 A NL 2016069A NL 2016069 A NL2016069 A NL 2016069A NL 2016069 A NL2016069 A NL 2016069A
Authority
NL
Netherlands
Prior art keywords
electrode
radiation
chamber
radiation beam
electrodes
Prior art date
Application number
NL2016069A
Other languages
English (en)
Inventor
Charles De Vries Gosse
Nienhuys Han-Kwang
Yevgenyevich Banine Vadim
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2016069A publication Critical patent/NL2016069A/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/185—Measuring radiation intensity with ionisation chamber arrangements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Claims (1)

1. Een lithografieinrichting omvattende: een beiichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met hei kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsviak van de projectieinrichting.
NL2016069A 2015-02-10 2016-01-08 Radiation Sensor NL2016069A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP15154468 2015-02-10

Publications (1)

Publication Number Publication Date
NL2016069A true NL2016069A (en) 2016-09-29

Family

ID=52598578

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2016069A NL2016069A (en) 2015-02-10 2016-01-08 Radiation Sensor

Country Status (3)

Country Link
NL (1) NL2016069A (nl)
TW (1) TW201640141A (nl)
WO (1) WO2016128152A1 (nl)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102669702B1 (ko) * 2019-10-11 2024-05-24 사이머 엘엘씨 방전 레이저용 도전성 부재

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4590401A (en) * 1983-02-25 1986-05-20 Westinghouse Electric Corp. Ion chamber with a flat sensitivity response characteristic
GB2356928B (en) * 1999-11-16 2002-09-11 Medical Res Council X-ray beam position monitors
DE10244303B4 (de) * 2002-09-23 2004-12-30 Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Arbeit, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt Verfahren und Monitordetektor zur Bestimmung der Intensität von gepulster VUV- oder EUV-Strahlung sowie Verwendung eines derartigen Monitordetektors
US20130112888A1 (en) * 2011-11-07 2013-05-09 Alex K. Deyhim Ion chamber/beam position monitor

Also Published As

Publication number Publication date
TW201640141A (zh) 2016-11-16
WO2016128152A1 (en) 2016-08-18

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