NL2009591A - Lithographic apparatus and device manufacturing method. - Google Patents
Lithographic apparatus and device manufacturing method. Download PDFInfo
- Publication number
- NL2009591A NL2009591A NL2009591A NL2009591A NL2009591A NL 2009591 A NL2009591 A NL 2009591A NL 2009591 A NL2009591 A NL 2009591A NL 2009591 A NL2009591 A NL 2009591A NL 2009591 A NL2009591 A NL 2009591A
- Authority
- NL
- Netherlands
- Prior art keywords
- substrate
- gas
- projection system
- beams
- module
- Prior art date
Links
Landscapes
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161562835P | 2011-11-22 | 2011-11-22 | |
US201161562835 | 2011-11-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2009591A true NL2009591A (en) | 2013-05-23 |
Family
ID=47016707
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2009591A NL2009591A (en) | 2011-11-22 | 2012-10-09 | Lithographic apparatus and device manufacturing method. |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5809364B2 (ja) |
KR (1) | KR101616762B1 (ja) |
NL (1) | NL2009591A (ja) |
WO (1) | WO2013075878A1 (ja) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100542414B1 (ko) * | 1996-03-27 | 2006-05-10 | 가부시키가이샤 니콘 | 노광장치및공조장치 |
DE60117107T2 (de) * | 2000-07-14 | 2006-10-05 | Asml Netherlands B.V. | Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikel, dabei erzeugter Artikel und Gaszusammensetzung |
JP2002158154A (ja) * | 2000-11-16 | 2002-05-31 | Canon Inc | 露光装置 |
JP2005183624A (ja) * | 2003-12-18 | 2005-07-07 | Nikon Corp | 鏡筒及び露光装置並びにデバイスの製造方法 |
US7057702B2 (en) * | 2004-06-23 | 2006-06-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7522258B2 (en) * | 2005-06-29 | 2009-04-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination |
US8531648B2 (en) | 2008-09-22 | 2013-09-10 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
-
2012
- 2012-10-09 WO PCT/EP2012/069922 patent/WO2013075878A1/en active Application Filing
- 2012-10-09 KR KR1020147015207A patent/KR101616762B1/ko not_active IP Right Cessation
- 2012-10-09 NL NL2009591A patent/NL2009591A/en not_active Application Discontinuation
- 2012-10-09 JP JP2014540371A patent/JP5809364B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR20140099474A (ko) | 2014-08-12 |
JP2015503222A (ja) | 2015-01-29 |
KR101616762B1 (ko) | 2016-04-29 |
JP5809364B2 (ja) | 2015-11-10 |
WO2013075878A1 (en) | 2013-05-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WDAP | Patent application withdrawn |
Effective date: 20130902 |