NL2009591A - Lithographic apparatus and device manufacturing method. - Google Patents

Lithographic apparatus and device manufacturing method. Download PDF

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Publication number
NL2009591A
NL2009591A NL2009591A NL2009591A NL2009591A NL 2009591 A NL2009591 A NL 2009591A NL 2009591 A NL2009591 A NL 2009591A NL 2009591 A NL2009591 A NL 2009591A NL 2009591 A NL2009591 A NL 2009591A
Authority
NL
Netherlands
Prior art keywords
substrate
gas
projection system
beams
module
Prior art date
Application number
NL2009591A
Other languages
English (en)
Dutch (nl)
Inventor
Jeroen Gosen
Antonius Net
Leonarda Heuvel
Frank Boxtel
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2009591A publication Critical patent/NL2009591A/en

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  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2009591A 2011-11-22 2012-10-09 Lithographic apparatus and device manufacturing method. NL2009591A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161562835P 2011-11-22 2011-11-22
US201161562835 2011-11-22

Publications (1)

Publication Number Publication Date
NL2009591A true NL2009591A (en) 2013-05-23

Family

ID=47016707

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2009591A NL2009591A (en) 2011-11-22 2012-10-09 Lithographic apparatus and device manufacturing method.

Country Status (4)

Country Link
JP (1) JP5809364B2 (ja)
KR (1) KR101616762B1 (ja)
NL (1) NL2009591A (ja)
WO (1) WO2013075878A1 (ja)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100542414B1 (ko) * 1996-03-27 2006-05-10 가부시키가이샤 니콘 노광장치및공조장치
DE60117107T2 (de) * 2000-07-14 2006-10-05 Asml Netherlands B.V. Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikel, dabei erzeugter Artikel und Gaszusammensetzung
JP2002158154A (ja) * 2000-11-16 2002-05-31 Canon Inc 露光装置
JP2005183624A (ja) * 2003-12-18 2005-07-07 Nikon Corp 鏡筒及び露光装置並びにデバイスの製造方法
US7057702B2 (en) * 2004-06-23 2006-06-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7522258B2 (en) * 2005-06-29 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination
US8531648B2 (en) 2008-09-22 2013-09-10 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method

Also Published As

Publication number Publication date
KR20140099474A (ko) 2014-08-12
JP2015503222A (ja) 2015-01-29
KR101616762B1 (ko) 2016-04-29
JP5809364B2 (ja) 2015-11-10
WO2013075878A1 (en) 2013-05-30

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Legal Events

Date Code Title Description
WDAP Patent application withdrawn

Effective date: 20130902