NL2004924A - Electrical connection system, lithographic projection apparatus, device manufacturing method and method for manufacturing an electrical connection system. - Google Patents
Electrical connection system, lithographic projection apparatus, device manufacturing method and method for manufacturing an electrical connection system. Download PDFInfo
- Publication number
- NL2004924A NL2004924A NL2004924A NL2004924A NL2004924A NL 2004924 A NL2004924 A NL 2004924A NL 2004924 A NL2004924 A NL 2004924A NL 2004924 A NL2004924 A NL 2004924A NL 2004924 A NL2004924 A NL 2004924A
- Authority
- NL
- Netherlands
- Prior art keywords
- electrical connection
- connection system
- electrical
- conductor
- connector
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/50—Fixed connections
- H01R12/59—Fixed connections for flexible printed circuits, flat or ribbon cables or like structures
- H01R12/61—Fixed connections for flexible printed circuits, flat or ribbon cables or like structures connecting to flexible printed circuits, flat or ribbon cables or like structures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
- G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/50—Fixed connections
- H01R12/59—Fixed connections for flexible printed circuits, flat or ribbon cables or like structures
- H01R12/592—Fixed connections for flexible printed circuits, flat or ribbon cables or like structures connections to contact elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49174—Assembling terminal to elongated conductor
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Computer Networks & Wireless Communication (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Connector Housings Or Holding Contact Members (AREA)
- Coupling Device And Connection With Printed Circuit (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22069509P | 2009-06-26 | 2009-06-26 | |
US22069509 | 2009-06-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2004924A true NL2004924A (en) | 2010-12-27 |
Family
ID=44148966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2004924A NL2004924A (en) | 2009-06-26 | 2010-06-21 | Electrical connection system, lithographic projection apparatus, device manufacturing method and method for manufacturing an electrical connection system. |
Country Status (3)
Country | Link |
---|---|
US (1) | US20110149264A1 (ja) |
JP (1) | JP2011009217A (ja) |
NL (1) | NL2004924A (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013217146A1 (de) * | 2013-08-28 | 2015-03-05 | Carl Zeiss Smt Gmbh | Optisches Bauelement |
DE102016217285A1 (de) * | 2016-09-12 | 2018-03-15 | Carl Zeiss Smt Gmbh | Vorrichtung zur übertragung von elektrischen signalen sowie lithographieanlage |
DE102019200388A1 (de) * | 2019-01-15 | 2019-03-07 | Carl Zeiss Smt Gmbh | Schutzvorrichtung für Leitungen in einer Projektionsbelichtungsanlage für die Halbleiterlithographie |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5526208A (en) * | 1994-08-17 | 1996-06-11 | Quantum Corporation | Flex circuit vibration sensor |
US6575772B1 (en) * | 2002-04-09 | 2003-06-10 | The Ludlow Company Lp | Shielded cable terminal with contact pins mounted to printed circuit board |
US7541283B2 (en) * | 2002-08-30 | 2009-06-02 | Tokyo Electron Limited | Plasma processing method and plasma processing apparatus |
US8115107B2 (en) * | 2007-08-22 | 2012-02-14 | Treadyne, Inc. | System and method for mounting shielded cables to printed circuit board assemblies |
US7901247B2 (en) * | 2009-06-10 | 2011-03-08 | Kemlon Products & Development Co., Ltd. | Electrical connectors and sensors for use in high temperature, high pressure oil and gas wells |
-
2010
- 2010-06-21 NL NL2004924A patent/NL2004924A/en not_active Application Discontinuation
- 2010-06-22 JP JP2010141731A patent/JP2011009217A/ja not_active Withdrawn
- 2010-06-25 US US12/823,569 patent/US20110149264A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20110149264A1 (en) | 2011-06-23 |
JP2011009217A (ja) | 2011-01-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9165814B2 (en) | Electrical connector, electrical connection system and lithographic apparatus | |
US8680721B2 (en) | Coil, positioning device, actuator, and lithographic apparatus | |
US7245357B2 (en) | Lithographic apparatus and device manufacturing method | |
JP6014647B2 (ja) | 電気コネクタ及び電気接続システム | |
JP2006128676A (ja) | リソグラフィ装置およびデバイス製造方法 | |
US20110149264A1 (en) | Electrical Connection System, Lithographic Projection Apparatus, Device Manufacturing Method and Method for Manufacturing an Electrical Connection System | |
US20110134399A1 (en) | Lithographic Projection Apparatus | |
EP2839506B1 (en) | Electrostatic clamp | |
US9360771B2 (en) | Electrostatic clamp, lithographic apparatus, and device manufacturing method | |
US9748682B2 (en) | Actuation system and lithographic apparatus | |
NL2005551A (en) | Electrical connector, electrical connection system and lithographic apparatus. | |
NL2006693A (en) | Actuation system and lithographic apparatus. | |
JP2005209791A (ja) | 真空内電気稼動装置 | |
KR20040066021A (ko) | 검출 조립체 및 이러한 검출 조립체가 제공된 리소그래피투영장치 | |
WO2018046280A1 (en) | Lithographic apparatus and support structures background | |
NL2007631A (en) | Electrostatic clamp, lithographic apparatus, and device manufacturing method. | |
NL2009291A (en) | Electrostatic clamp. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WDAP | Patent application withdrawn |
Effective date: 20110323 |