NL190785C - Photosensitive coating composition and method for preparing a photosensitive polymer. - Google Patents

Photosensitive coating composition and method for preparing a photosensitive polymer.

Info

Publication number
NL190785C
NL190785C NL8702942A NL8702942A NL190785C NL 190785 C NL190785 C NL 190785C NL 8702942 A NL8702942 A NL 8702942A NL 8702942 A NL8702942 A NL 8702942A NL 190785 C NL190785 C NL 190785C
Authority
NL
Netherlands
Prior art keywords
photosensitive
preparing
coating composition
polymer
photosensitive polymer
Prior art date
Application number
NL8702942A
Other languages
Dutch (nl)
Other versions
NL8702942A (en
NL190785B (en
Original Assignee
Armstrong World Ind Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Armstrong World Ind Inc filed Critical Armstrong World Ind Inc
Publication of NL8702942A publication Critical patent/NL8702942A/en
Publication of NL190785B publication Critical patent/NL190785B/en
Application granted granted Critical
Publication of NL190785C publication Critical patent/NL190785C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/348—Hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
NL8702942A 1986-12-08 1987-12-07 Photosensitive coating composition and method for preparing a photosensitive polymer. NL190785C (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US93960486A 1986-12-08 1986-12-08
US93960486 1986-12-08
US4546487A 1987-05-04 1987-05-04
US4546487 1987-05-04

Publications (3)

Publication Number Publication Date
NL8702942A NL8702942A (en) 1988-07-01
NL190785B NL190785B (en) 1994-03-16
NL190785C true NL190785C (en) 1994-08-16

Family

ID=26722797

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8702942A NL190785C (en) 1986-12-08 1987-12-07 Photosensitive coating composition and method for preparing a photosensitive polymer.

Country Status (13)

Country Link
KR (1) KR910001523B1 (en)
CN (1) CN1031227C (en)
BR (1) BR8706609A (en)
CA (1) CA1332093C (en)
CH (1) CH680622A5 (en)
DE (1) DE3741385C2 (en)
FR (1) FR2607820B1 (en)
GB (1) GB2199335B (en)
HK (1) HK60692A (en)
IT (1) IT1233418B (en)
MX (1) MX168832B (en)
NL (1) NL190785C (en)
SG (1) SG61192G (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910021456A (en) * 1990-02-20 1991-12-20 우메모토 요시마사 Water-soluble photocurable polyurethane poly (meth) acrylates, adhesives containing them and methods of making laminated articles
CA2040097A1 (en) * 1990-04-12 1991-10-13 Wako Yokoyama Urethane polymers for printing plate compositions
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
BR0014422A (en) * 1999-09-30 2002-06-11 Basf Ag Aqueous dispersion of u.v. and heat, and, use of polyurethane dispersion
TW201220974A (en) * 2010-05-21 2012-05-16 Nano Terra Inc Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same
CN104193944A (en) * 2014-08-21 2014-12-10 苏州瑞红电子化学品有限公司 Controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and photoresist composition thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153778A (en) * 1978-03-30 1979-05-08 Union Carbide Corporation Acrylyl capped urethane oligomers
NL8401785A (en) * 1984-06-04 1986-01-02 Polyvinyl Chemie Holland PROCESS FOR PREPARING AN AQUEOUS DISPERSION OF URETHAN ACRYLATE ENTCOPOLYMERS AND STABLE AQUEOUS DISPERSION THUS OBTAINED.
AU597257B2 (en) * 1985-05-17 1990-05-31 M And T Chemicals Inc. Aqueous alkaline developable, uv curable urethane acrylate compounds and compositions useful for forming solder mask coatings

Also Published As

Publication number Publication date
GB8728631D0 (en) 1988-01-13
SG61192G (en) 1992-09-04
IT8722899A0 (en) 1987-12-04
KR910001523B1 (en) 1991-03-15
CN87107321A (en) 1988-06-22
FR2607820B1 (en) 1994-06-10
CH680622A5 (en) 1992-09-30
NL8702942A (en) 1988-07-01
CN1031227C (en) 1996-03-06
BR8706609A (en) 1988-07-19
KR880014415A (en) 1988-12-23
DE3741385A1 (en) 1988-06-09
MX168832B (en) 1993-06-10
HK60692A (en) 1992-08-21
GB2199335A (en) 1988-07-06
NL190785B (en) 1994-03-16
FR2607820A1 (en) 1988-06-10
IT1233418B (en) 1992-03-31
DE3741385C2 (en) 1996-06-05
GB2199335B (en) 1991-01-09
CA1332093C (en) 1994-09-20

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee

Effective date: 20000701