NL178173C - DEVICE FOR APPLYING A THIN LAYER TO THE SURFACE OF AN OBJECT. - Google Patents

DEVICE FOR APPLYING A THIN LAYER TO THE SURFACE OF AN OBJECT.

Info

Publication number
NL178173C
NL178173C NLAANVRAGE7114556,A NL7114556A NL178173C NL 178173 C NL178173 C NL 178173C NL 7114556 A NL7114556 A NL 7114556A NL 178173 C NL178173 C NL 178173C
Authority
NL
Netherlands
Prior art keywords
applying
thin layer
thin
layer
Prior art date
Application number
NLAANVRAGE7114556,A
Other languages
Dutch (nl)
Other versions
NL178173B (en
NL7114556A (en
Inventor
Jean Spitz
Jean-Claude Viquie
Original Assignee
Commissariat Energie Atomique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique filed Critical Commissariat Energie Atomique
Publication of NL7114556A publication Critical patent/NL7114556A/xx
Publication of NL178173B publication Critical patent/NL178173B/en
Application granted granted Critical
Publication of NL178173C publication Critical patent/NL178173C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0615—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced at the free surface of the liquid or other fluent material in a container and subjected to the vibrations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemically Coating (AREA)
  • Special Spraying Apparatus (AREA)
  • Nozzles (AREA)
  • Chemical Vapour Deposition (AREA)
NLAANVRAGE7114556,A 1970-10-23 1971-10-22 DEVICE FOR APPLYING A THIN LAYER TO THE SURFACE OF AN OBJECT. NL178173C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7038371A FR2110622A5 (en) 1970-10-23 1970-10-23

Publications (3)

Publication Number Publication Date
NL7114556A NL7114556A (en) 1972-04-25
NL178173B NL178173B (en) 1985-09-02
NL178173C true NL178173C (en) 1989-10-16

Family

ID=9063211

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7114556,A NL178173C (en) 1970-10-23 1971-10-22 DEVICE FOR APPLYING A THIN LAYER TO THE SURFACE OF AN OBJECT.

Country Status (9)

Country Link
US (1) US3840391A (en)
JP (1) JPS5515545B1 (en)
CA (1) CA952770A (en)
CH (1) CH546830A (en)
DE (1) DE2151809C3 (en)
FR (1) FR2110622A5 (en)
GB (1) GB1362803A (en)
IT (1) IT942738B (en)
NL (1) NL178173C (en)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7700808A (en) * 1977-01-27 1978-07-31 Philips Nv PROCESS FOR MANUFACTURE OF IRON OXIDE PHOTO MASKS AND IRON OXIDE MASKS OBTAINED BY THIS PROCESS.
US4167045A (en) * 1977-08-26 1979-09-11 Interface Biomedical Laboratories Corp. Cardiac and vascular prostheses
US4526808A (en) * 1979-07-05 1985-07-02 E. I. Du Pont De Nemours And Company Method for applying liquid to a yarn
US4290384A (en) * 1979-10-18 1981-09-22 The Perkin-Elmer Corporation Coating apparatus
US4309456A (en) * 1980-09-23 1982-01-05 Rca Corporation Method and apparatus for coating recorded discs with a lubricant
US4431684A (en) * 1981-06-02 1984-02-14 E. I. Du Pont De Nemours & Co. Ultrasonic vibrator for applying finish to yarn
FR2531880A1 (en) * 1982-08-18 1984-02-24 Commissariat Energie Atomique METHOD FOR MANUFACTURING THIN LAYERS
AU3994785A (en) * 1984-02-13 1985-08-27 Schmitt, J.J. 111 Method and apparatus for the gas jet deposition of conductingand dielectric thin solid films and products produced there by
EP0203931B1 (en) * 1984-10-29 1989-03-29 AT&T Corp. Method of producing devices using nonplanar lithography
US4689247A (en) * 1986-05-15 1987-08-25 Ametek, Inc. Process and apparatus for forming thin films
US4950499A (en) * 1987-01-27 1990-08-21 The Foxboro Company Method of making a compliant fluid-impermeable element
JPH0280303A (en) * 1987-06-04 1990-03-20 Tonen Corp Process and apparatus for forming thin superconducting film
JP2702131B2 (en) * 1987-06-12 1998-01-21 キヤノン株式会社 Image reading apparatus and image information reading apparatus having the same
JP2584774B2 (en) * 1987-06-12 1997-02-26 キヤノン株式会社 Contact type photoelectric conversion device
US5034372A (en) * 1987-12-07 1991-07-23 Mitsubishi Denki Kabushiki Kaisha Plasma based method for production of superconductive oxide layers
EP0420596B1 (en) * 1989-09-26 1996-06-19 Canon Kabushiki Kaisha Gas feeding device and deposition film forming apparatus employing the same
FR2669246A1 (en) * 1990-11-16 1992-05-22 Centre Nat Rech Scient SOL-GEL PROCESS FOR THE DEPOSITION OF THIN FILMS BY ULTRASONIC SPRAYING.
DE4138722C2 (en) * 1991-11-21 1994-05-26 Dresden Ev Inst Festkoerper Process for evaporating a substance for a subsequent processing process
US5403617A (en) * 1993-09-15 1995-04-04 Mobium Enterprises Corporation Hybrid pulsed valve for thin film coating and method
US5736195A (en) * 1993-09-15 1998-04-07 Mobium Enterprises Corporation Method of coating a thin film on a substrate
GB9412676D0 (en) * 1994-06-23 1994-08-10 Jem Smoke Machine Co Improvements in or relating to a method of creating an effect
US5534314A (en) * 1994-08-31 1996-07-09 University Of Virginia Patent Foundation Directed vapor deposition of electron beam evaporant
US5571332A (en) * 1995-02-10 1996-11-05 Jet Process Corporation Electron jet vapor deposition system
US6027673A (en) * 1995-11-21 2000-02-22 The Aerospace Corporation Method of making indium oxide microspheres for antistatic coatings
JPH09184080A (en) 1995-12-27 1997-07-15 Vacuum Metallurgical Co Ltd Formation of thin film by ultrafine grain and device therefor
FR2758744B1 (en) 1997-01-30 1999-02-19 Commissariat Energie Atomique LIQUID SUPPLY SYSTEM FOR APPARATUS IN WHICH A CONSTANT LEVEL IS MAINTAINED
US20030070920A1 (en) * 1997-05-01 2003-04-17 Ashish Shah Electrode for use in a capacitor
US20030068509A1 (en) * 1997-05-01 2003-04-10 Ashish Shah Ruthenium-containing oxide ultrasonically coated substrate for use in a capacitor and method of manufacture
US20010024700A1 (en) * 1997-05-01 2001-09-27 Asbish Shah Ruthenium-containing ultrasonically coated substrate for use in a capacitor and method of manufacture
US5894403A (en) * 1997-05-01 1999-04-13 Wilson Greatbatch Ltd. Ultrasonically coated substrate for use in a capacitor
US20010026850A1 (en) * 1997-05-01 2001-10-04 Ashish Shah Method for providing a coated substrate for use in a capacitor by a one step ultrasonic deposition process
US5920455A (en) * 1997-05-01 1999-07-06 Wilson Greatbatch Ltd. One step ultrasonically coated substrate for use in a capacitor
WO2002032588A1 (en) * 2000-10-17 2002-04-25 Neophotonics Corporation Coating formation by reactive deposition
US6045864A (en) * 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
US6012647A (en) * 1997-12-01 2000-01-11 3M Innovative Properties Company Apparatus and method of atomizing and vaporizing
US6685762B1 (en) * 1998-08-26 2004-02-03 Superior Micropowders Llc Aerosol method and apparatus for making particulate products
AT409462B (en) * 1998-10-08 2002-08-26 Thallner Erich Device to coat substrates
US6174651B1 (en) 1999-01-14 2001-01-16 Steag Rtp Systems, Inc. Method for depositing atomized materials onto a substrate utilizing light exposure for heating
US6569249B1 (en) 2000-04-18 2003-05-27 Clemson University Process for forming layers on substrates
US7308185B2 (en) * 2004-12-13 2007-12-11 Asml Holding N.V. Ultra-thin high-precision glass optic
JP4871177B2 (en) * 2006-03-28 2012-02-08 コリア インスティチュート オブ エナジー リサーチ Carbon nanotube synthesis method and apparatus using ultrasonic vibration method
PL211804B1 (en) * 2007-03-05 2012-06-29 Inst Optyki Stosowanej Ultrasonic nebulizer
US8287938B1 (en) * 2008-05-20 2012-10-16 Ingo Scheer Method to produce a coating and to fine-tune the coating morphology
FI20095651A0 (en) * 2009-06-10 2009-06-10 Beneq Oy Method and apparatus for coating a glass substrate
DE102010055042B4 (en) * 2010-12-17 2013-06-06 Eads Deutschland Gmbh Method and apparatus for forming an electrolyte film on an electrode surface
US20150053786A1 (en) * 2013-08-21 2015-02-26 Trimble Navigation Limited Intelligent precision irrigation system
CH712376A1 (en) * 2016-04-19 2017-10-31 Camag Derivatization device and method.
JP2020188170A (en) * 2019-05-15 2020-11-19 トヨタ自動車株式会社 Mist generation device and deposition device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2512743A (en) * 1946-04-01 1950-06-27 Rca Corp Jet sprayer actuated by supersonic waves
FR1450684A (en) * 1965-07-07 1966-06-24 Commissariat Energie Atomique Method and device for generating aerosols from a liquid

Also Published As

Publication number Publication date
GB1362803A (en) 1974-08-07
NL178173B (en) 1985-09-02
DE2151809A1 (en) 1972-04-27
DE2151809C3 (en) 1974-11-14
CH546830A (en) 1974-03-15
IT942738B (en) 1973-04-02
CA952770A (en) 1974-08-13
US3840391A (en) 1974-10-08
FR2110622A5 (en) 1972-06-02
DE2151809B2 (en) 1974-03-28
JPS5515545B1 (en) 1980-04-24
NL7114556A (en) 1972-04-25

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Legal Events

Date Code Title Description
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
R1B Notice of opposition during period of laying open
NP1G Patent granted (not automatically) [patent specification modified]
V4 Discontinued because of reaching the maximum lifetime of a patent