NL166135B - POSITIVELY OPERATING LIGHT-SENSITIVE PLATE FOR THE MANUFACTURE OF A PRESSURE PLATE. - Google Patents

POSITIVELY OPERATING LIGHT-SENSITIVE PLATE FOR THE MANUFACTURE OF A PRESSURE PLATE.

Info

Publication number
NL166135B
NL166135B NL6919546A NL6919546A NL166135B NL 166135 B NL166135 B NL 166135B NL 6919546 A NL6919546 A NL 6919546A NL 6919546 A NL6919546 A NL 6919546A NL 166135 B NL166135 B NL 166135B
Authority
NL
Netherlands
Prior art keywords
plate
manufacture
operating light
positively operating
pressure plate
Prior art date
Application number
NL6919546A
Other languages
Dutch (nl)
Other versions
NL166135C (en
NL6919546A (en
Original Assignee
Howson Algraphy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to GB37485/67A priority Critical patent/GB1243963A/en
Priority to AT1206369A priority patent/AT294139B/en
Priority to CH1944269A priority patent/CH533322A/en
Application filed by Howson Algraphy Ltd filed Critical Howson Algraphy Ltd
Priority to NL6919546A priority patent/NL166135C/en
Priority to BE744002D priority patent/BE744002A/en
Priority to FR7000950A priority patent/FR2076347A5/fr
Publication of NL6919546A publication Critical patent/NL6919546A/xx
Priority to US00167438A priority patent/US3802885A/en
Priority claimed from US00167438A external-priority patent/US3802885A/en
Publication of NL166135B publication Critical patent/NL166135B/en
Application granted granted Critical
Publication of NL166135C publication Critical patent/NL166135C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL6919546A 1967-08-15 1969-12-30 POSITIVELY OPERATING LIGHT-SENSITIVE PLATE FOR THE MANUFACTURE OF A PRESSURE PLATE. NL166135C (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB37485/67A GB1243963A (en) 1967-08-15 1967-08-15 Improvements in or relating to light sensitive lithographic plates
AT1206369A AT294139B (en) 1967-08-15 1969-12-29 Positive working photosensitive planographic printing plate
NL6919546A NL166135C (en) 1967-08-15 1969-12-30 POSITIVELY OPERATING LIGHT-SENSITIVE PLATE FOR THE MANUFACTURE OF A PRESSURE PLATE.
CH1944269A CH533322A (en) 1967-08-15 1969-12-30 Positive working photosensitive planographic printing plate and process for making same
BE744002D BE744002A (en) 1967-08-15 1970-01-02 LITHOGRAPHIC PRINTING PLATES,
FR7000950A FR2076347A5 (en) 1967-08-15 1970-01-12
US00167438A US3802885A (en) 1967-08-15 1971-07-29 Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
GB37485/67A GB1243963A (en) 1967-08-15 1967-08-15 Improvements in or relating to light sensitive lithographic plates
AT1206369A AT294139B (en) 1967-08-15 1969-12-29 Positive working photosensitive planographic printing plate
NL6919546A NL166135C (en) 1967-08-15 1969-12-30 POSITIVELY OPERATING LIGHT-SENSITIVE PLATE FOR THE MANUFACTURE OF A PRESSURE PLATE.
CH1944269A CH533322A (en) 1967-08-15 1969-12-30 Positive working photosensitive planographic printing plate and process for making same
BE744002 1970-01-02
FR7000950A FR2076347A5 (en) 1967-08-15 1970-01-12
US00167438A US3802885A (en) 1967-08-15 1971-07-29 Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base

Publications (3)

Publication Number Publication Date
NL6919546A NL6919546A (en) 1971-07-02
NL166135B true NL166135B (en) 1981-01-15
NL166135C NL166135C (en) 1981-06-15

Family

ID=27560463

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6919546A NL166135C (en) 1967-08-15 1969-12-30 POSITIVELY OPERATING LIGHT-SENSITIVE PLATE FOR THE MANUFACTURE OF A PRESSURE PLATE.

Country Status (6)

Country Link
AT (1) AT294139B (en)
BE (1) BE744002A (en)
CH (1) CH533322A (en)
FR (1) FR2076347A5 (en)
GB (1) GB1243963A (en)
NL (1) NL166135C (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
US5212043A (en) * 1988-02-17 1993-05-18 Tosho Corporation Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent
CA2097791A1 (en) * 1992-08-28 1994-03-01 Sunit S. Dixit High aspect ratio, flexible thick film positive photoresist
EP1388759A1 (en) * 2002-08-06 2004-02-11 Shin-Etsu Chemical Co., Ltd. Positive photoresist composition

Also Published As

Publication number Publication date
NL166135C (en) 1981-06-15
GB1243963A (en) 1971-08-25
NL6919546A (en) 1971-07-02
AT294139B (en) 1971-11-10
FR2076347A5 (en) 1971-10-15
BE744002A (en) 1970-06-15
CH533322A (en) 1973-01-31

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee