|
US3635709A
(en)
*
|
1966-12-15 |
1972-01-18 |
Polychrome Corp |
Light-sensitive lithographic plate
|
|
US3857896A
(en)
*
|
1967-09-13 |
1974-12-31 |
R Desjarlais |
Substituted diresorcyl sulfide and sulfoxide compounds
|
|
US3647443A
(en)
*
|
1969-09-12 |
1972-03-07 |
Eastman Kodak Co |
Light-sensitive quinone diazide polymers and polymer compositions
|
|
US4024122A
(en)
*
|
1973-02-12 |
1977-05-17 |
Rca Corporation |
Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone)
|
|
US4259430A
(en)
*
|
1974-05-01 |
1981-03-31 |
International Business Machines Corporation |
Photoresist O-quinone diazide containing composition and resist mask formation process
|
|
DE2742631A1
(de)
*
|
1977-09-22 |
1979-04-05 |
Hoechst Ag |
Lichtempfindliche kopiermasse
|
|
DE2828037A1
(de)
*
|
1978-06-26 |
1980-01-10 |
Hoechst Ag |
Lichtempfindliches gemisch
|
|
JPS561044A
(en)
*
|
1979-06-16 |
1981-01-08 |
Konishiroku Photo Ind Co Ltd |
Photosensitive composition
|
|
DE3043967A1
(de)
|
1980-11-21 |
1982-06-24 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
|
|
DE3124936A1
(de)
*
|
1981-06-25 |
1983-01-20 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
|
|
DE3127754A1
(de)
*
|
1981-07-14 |
1983-02-03 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
|
|
IT1169682B
(it)
*
|
1983-11-08 |
1987-06-03 |
I M G Ind Materiali Grafici Sp |
Composizione per fotoriproduzioni
|
|
US4596763A
(en)
*
|
1984-10-01 |
1986-06-24 |
American Hoechst Corporation |
Positive photoresist processing with mid U-V range exposure
|
|
JPS62123444A
(ja)
|
1985-08-07 |
1987-06-04 |
Japan Synthetic Rubber Co Ltd |
ポジ型感放射線性樹脂組成物
|
|
US4737437A
(en)
*
|
1986-03-27 |
1988-04-12 |
East Shore Chemical Co. |
Light sensitive diazo compound, composition and method of making the composition
|
|
DE3635303A1
(de)
|
1986-10-17 |
1988-04-28 |
Hoechst Ag |
Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten
|
|
JP2568827B2
(ja)
*
|
1986-10-29 |
1997-01-08 |
富士写真フイルム株式会社 |
ポジ型フオトレジスト組成物
|
|
US5081001A
(en)
*
|
1987-05-22 |
1992-01-14 |
Hoechst Celanese Corporation |
Blocked monomer and polymers therefrom for use as photoresists
|
|
US4797345A
(en)
*
|
1987-07-01 |
1989-01-10 |
Olin Hunt Specialty Products, Inc. |
Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures
|
|
DE3729034A1
(de)
*
|
1987-08-31 |
1989-03-09 |
Hoechst Ag |
Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial
|
|
JPH07119374B2
(ja)
*
|
1987-11-06 |
1995-12-20 |
関西ペイント株式会社 |
ポジ型感光性カチオン電着塗料組成物
|
|
JP2552891B2
(ja)
*
|
1988-01-26 |
1996-11-13 |
富士写真フイルム株式会社 |
ポジ型フオトレジスト組成物
|
|
US5290656A
(en)
*
|
1988-05-07 |
1994-03-01 |
Sumitomo Chemical Company, Limited |
Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound
|
|
JP2552900B2
(ja)
*
|
1988-06-07 |
1996-11-13 |
富士写真フイルム株式会社 |
ポジ型フオトレジスト組成物
|
|
JPH063544B2
(ja)
*
|
1988-07-07 |
1994-01-12 |
住友化学工業株式会社 |
ポジ型感放射線性レジスト組成物
|
|
US5861229A
(en)
*
|
1988-07-07 |
1999-01-19 |
Sumitomo Chemical Company, Limited |
Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
|
|
US5456996A
(en)
*
|
1988-07-07 |
1995-10-10 |
Sumitomo Chemical Company, Limited |
Radiation-sensitive positive resist composition
|
|
JP2715480B2
(ja)
*
|
1988-10-13 |
1998-02-18 |
住友化学工業株式会社 |
ポジ型レジスト用組成物
|
|
EP0384892A1
(de)
*
|
1989-02-23 |
1990-08-29 |
Ciba-Geigy Ag |
Photoresist-Zusammensetzungen
|
|
US5200293A
(en)
*
|
1989-02-23 |
1993-04-06 |
Ciba-Geigy Corporation |
Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
|
|
JPH087433B2
(ja)
*
|
1989-04-19 |
1996-01-29 |
日本ゼオン株式会社 |
ポジ型レジスト組成物
|
|
CA2023791A1
(en)
*
|
1989-08-24 |
1991-02-25 |
Ayako Ida |
Radiation-sensitive positive resist composition
|
|
US5256521A
(en)
*
|
1989-09-19 |
1993-10-26 |
Ocg Microelectronic Materials, Inc. |
Process of developing a positive pattern in an O-quinone diazide photoresist containing a tris-(hydroxyphenyl) lower alkane compound sensitivity enhancer
|
|
US5215856A
(en)
*
|
1989-09-19 |
1993-06-01 |
Ocg Microelectronic Materials, Inc. |
Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhancers for o-quinonediazide containing radiation-sensitive compositions and elements
|
|
JP2571136B2
(ja)
*
|
1989-11-17 |
1997-01-16 |
日本ゼオン株式会社 |
ポジ型レジスト組成物
|
|
JPH061377B2
(ja)
*
|
1989-12-28 |
1994-01-05 |
日本ゼオン株式会社 |
ポジ型レジスト組成物
|
|
DE4134526A1
(de)
*
|
1990-10-18 |
1992-05-14 |
Toyo Gosei Kogyo Kk |
Positive photoresist-zusammensetzung und mustererzeugungsverfahren unter verwendung dieser zusammensetzung
|
|
US5300396A
(en)
*
|
1990-11-28 |
1994-04-05 |
Hoechst Celanese Corporation |
Process of making naphthoquinone diazide esters using lactone solvents
|
|
US5260162A
(en)
*
|
1990-12-17 |
1993-11-09 |
Khanna Dinesh N |
Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers
|
|
KR100209107B1
(ko)
*
|
1991-01-11 |
1999-07-15 |
고사이 아끼오 |
포지티브 레지스트 조성물
|
|
DE4137325A1
(de)
*
|
1991-11-13 |
1993-05-19 |
Hoechst Ag |
Lichtempfindliches gemisch auf der basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches material
|
|
US5362599A
(en)
*
|
1991-11-14 |
1994-11-08 |
International Business Machines Corporations |
Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
|
|
JP3391471B2
(ja)
*
|
1992-02-25 |
2003-03-31 |
住友化学工業株式会社 |
ポジ型レジスト組成物
|
|
WO1993018438A1
(en)
*
|
1992-03-06 |
1993-09-16 |
Hoechst Celanese Corporation |
Positive photoresist composition
|
|
JP2944296B2
(ja)
|
1992-04-06 |
1999-08-30 |
富士写真フイルム株式会社 |
感光性平版印刷版の製造方法
|
|
US5384228A
(en)
*
|
1992-04-14 |
1995-01-24 |
Tokyo Ohka Kogyo Co., Ltd. |
Alkali-developable positive-working photosensitive resin composition
|
|
US5401605A
(en)
*
|
1992-08-12 |
1995-03-28 |
Tokyo Ohka Kogyo Co., Ltd. |
Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound
|
|
GB9326150D0
(en)
*
|
1993-12-22 |
1994-02-23 |
Alcan Int Ltd |
Electrochemical roughening method
|
|
JP3503839B2
(ja)
|
1994-05-25 |
2004-03-08 |
富士写真フイルム株式会社 |
ポジ型感光性組成物
|
|
JP3278306B2
(ja)
|
1994-10-31 |
2002-04-30 |
富士写真フイルム株式会社 |
ポジ型フォトレジスト組成物
|
|
JP3290316B2
(ja)
|
1994-11-18 |
2002-06-10 |
富士写真フイルム株式会社 |
感光性平版印刷版
|
|
US5514515A
(en)
*
|
1995-05-24 |
1996-05-07 |
Shipley Company, L.L.C. |
Photoactive compounds having a heterocyclic group used in photoresist compositions
|
|
US5618932A
(en)
*
|
1995-05-24 |
1997-04-08 |
Shipley Company, L.L.C. |
Photoactive compounds and compositions
|
|
US7285422B1
(en)
|
1997-01-23 |
2007-10-23 |
Sequenom, Inc. |
Systems and methods for preparing and analyzing low volume analyte array elements
|
|
EP1258369B1
(en)
|
1997-10-17 |
2005-03-30 |
Fuji Photo Film Co., Ltd. |
A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser
|
|
JP4219435B2
(ja)
*
|
1997-12-15 |
2009-02-04 |
東京応化工業株式会社 |
ポリフェノールジエステル化物の製造方法およびポジ型感光性組成物
|
|
JP4179579B2
(ja)
*
|
2000-05-08 |
2008-11-12 |
東洋合成工業株式会社 |
１，２−ナフトキノンジアジド系感光剤の製造方法
|
|
US6511790B2
(en)
|
2000-08-25 |
2003-01-28 |
Fuji Photo Film Co., Ltd. |
Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
|
|
AU2002245047A1
(en)
|
2000-10-30 |
2002-07-24 |
Sequenom, Inc. |
Method and apparatus for delivery of submicroliter volumes onto a substrate
|
|
DE60137398D1
(de)
|
2000-11-30 |
2009-03-05 |
Fujifilm Corp |
Lithographische Druckplattenvorläufer
|
|
US6936399B2
(en)
|
2001-10-22 |
2005-08-30 |
Fuji Photo Film Co., Ltd. |
Hydrophilic member, hydrophilic graft polymer, and support of planographic printing plate
|
|
FR2843558B1
(fr)
|
2002-08-13 |
2004-10-29 |
Jean Marie Nouel |
Procede de copie d'une plaque pour impression en offset humide
|
|
US20040067435A1
(en)
|
2002-09-17 |
2004-04-08 |
Fuji Photo Film Co., Ltd. |
Image forming material
|
|
EP2354854B2
(en)
|
2002-09-20 |
2016-04-06 |
FUJIFILM Corporation |
Method of making lithographic printing plate
|
|
US7090958B2
(en)
*
|
2003-04-11 |
2006-08-15 |
Ppg Industries Ohio, Inc. |
Positive photoresist compositions having enhanced processing time
|
|
JP2006058430A
(ja)
|
2004-08-18 |
2006-03-02 |
Fuji Photo Film Co Ltd |
平版印刷版原版
|
|
JP4404792B2
(ja)
|
2005-03-22 |
2010-01-27 |
富士フイルム株式会社 |
平版印刷版原版
|
|
JP2007070694A
(ja)
*
|
2005-09-07 |
2007-03-22 |
Konica Minolta Medical & Graphic Inc |
帯状アルミニウム板の陽極酸化処理方法、平版印刷版材料用支持体及び陽極酸化処理装置
|
|
WO2009039122A2
(en)
|
2007-09-17 |
2009-03-26 |
Sequenom, Inc. |
Integrated robotic sample transfer device
|
|
JP2009083106A
(ja)
|
2007-09-27 |
2009-04-23 |
Fujifilm Corp |
平版印刷版用版面保護剤及び平版印刷版の製版方法
|
|
JP4994175B2
(ja)
|
2007-09-28 |
2012-08-08 |
富士フイルム株式会社 |
平版印刷版原版、及びそれに用いる共重合体の製造方法
|
|
JP4790682B2
(ja)
|
2007-09-28 |
2011-10-12 |
富士フイルム株式会社 |
平版印刷版原版
|
|
EP2218519A4
(en)
|
2007-11-14 |
2012-03-21 |
Fujifilm Corp |
METHOD FOR DRYING A COATING FILM AND METHOD FOR PRODUCING A PRECURSOR FOR A LITHOGRAPHIC PRINTING PLATE
|
|
JP2009236355A
(ja)
|
2008-03-26 |
2009-10-15 |
Fujifilm Corp |
乾燥方法及び装置
|
|
WO2010007915A1
(ja)
*
|
2008-07-16 |
2010-01-21 |
日産化学工業株式会社 |
ポジ型レジスト組成物及びマイクロレンズの製造方法
|
|
JP5183380B2
(ja)
|
2008-09-09 |
2013-04-17 |
富士フイルム株式会社 |
赤外線レーザ用感光性平版印刷版原版
|
|
JP2010237435A
(ja)
|
2009-03-31 |
2010-10-21 |
Fujifilm Corp |
平版印刷版原版
|
|
KR101146622B1
(ko)
*
|
2009-08-31 |
2012-05-16 |
금호석유화학 주식회사 |
감광성 화합물 및 이를 포함하는 감광성 조성물
|
|
US8883401B2
(en)
|
2009-09-24 |
2014-11-11 |
Fujifilm Corporation |
Lithographic printing original plate
|
|
US8608878B2
(en)
*
|
2010-09-08 |
2013-12-17 |
Ensign-Bickford Aerospace & Defense Company |
Slow burning heat generating structure
|
|
JP5490168B2
(ja)
|
2012-03-23 |
2014-05-14 |
富士フイルム株式会社 |
平版印刷版原版及び平版印刷版の作製方法
|
|
JP5512730B2
(ja)
|
2012-03-30 |
2014-06-04 |
富士フイルム株式会社 |
平版印刷版の作製方法
|
