NL128994C - - Google Patents

Info

Publication number
NL128994C
NL128994C NL128994DA NL128994C NL 128994 C NL128994 C NL 128994C NL 128994D A NL128994D A NL 128994DA NL 128994 C NL128994 C NL 128994C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL128994C publication Critical patent/NL128994C/xx
Priority claimed from DES64847A external-priority patent/DE1113521B/de

Links

Classifications

    • H10P95/00
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • H10W20/40

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
NL128994D 1959-09-10 NL128994C (en:Method)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DES64847A DE1113521B (de) 1959-09-10 1959-09-10 Verfahren und Vorrichtung zum Erzeugen zweier dicht nebeneinander-liegender Elektroden an Halbleiterkoerpern
DES84300A DE1222168B (de) 1959-09-10 1963-03-22 Verfahren zum Erzeugen mindestens zweier dicht nebeneinanderliegender Elektroden aufHalbleiterkoerpern

Publications (1)

Publication Number Publication Date
NL128994C true NL128994C (en:Method)

Family

ID=25995837

Family Applications (2)

Application Number Title Priority Date Filing Date
NL128994D NL128994C (en:Method) 1959-09-10
NL255702D NL255702A (en:Method) 1959-09-10

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL255702D NL255702A (en:Method) 1959-09-10

Country Status (4)

Country Link
CH (1) CH395343A (en:Method)
DE (1) DE1222168B (en:Method)
GB (1) GB907999A (en:Method)
NL (2) NL255702A (en:Method)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61177366A (ja) * 1985-01-31 1986-08-09 Sharp Corp 超微粒子分散基板の製造装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1113521B (de) * 1959-09-10 1961-09-07 Siemens Ag Verfahren und Vorrichtung zum Erzeugen zweier dicht nebeneinander-liegender Elektroden an Halbleiterkoerpern

Also Published As

Publication number Publication date
GB907999A (en) 1962-10-10
CH395343A (de) 1965-07-15
DE1222168B (de) 1966-08-04
NL255702A (en:Method)

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