NL124459C - - Google Patents
Info
- Publication number
- NL124459C NL124459C NL124459DA NL124459C NL 124459 C NL124459 C NL 124459C NL 124459D A NL124459D A NL 124459DA NL 124459 C NL124459 C NL 124459C
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS438860 | 1960-07-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL124459C true NL124459C (en:Method) |
Family
ID=5386503
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL266760D NL266760A (en:Method) | 1960-07-08 | ||
| NL124459D NL124459C (en:Method) | 1960-07-08 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL266760D NL266760A (en:Method) | 1960-07-08 |
Country Status (4)
| Country | Link |
|---|---|
| DE (1) | DE1142262B (en:Method) |
| FR (1) | FR1294562A (en:Method) |
| GB (1) | GB939275A (en:Method) |
| NL (2) | NL124459C (en:Method) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3314873A (en) * | 1962-11-28 | 1967-04-18 | Western Electric Co | Method and apparatus for cathode sputtering using a cylindrical cathode |
| GB1039691A (en) * | 1964-03-17 | 1966-08-17 | Gen Precision Inc | Vacuum coating and ion bombardment apparatus |
| US3344055A (en) * | 1964-04-29 | 1967-09-26 | Texas Instruments Inc | Apparatus for polymerizing and forming thin continuous films using a glow discharge |
| US3318790A (en) * | 1964-04-29 | 1967-05-09 | Texas Instruments Inc | Production of thin organic polymer by screened glow discharge |
| US3351543A (en) * | 1964-05-28 | 1967-11-07 | Gen Electric | Process of coating diamond with an adherent metal coating using cathode sputtering |
| US3325393A (en) * | 1964-05-28 | 1967-06-13 | Gen Electric | Electrical discharge cleaning and coating process |
| US3526584A (en) * | 1964-09-25 | 1970-09-01 | Western Electric Co | Method of providing a field free region above a substrate during sputter-depositing thereon |
| US3507774A (en) * | 1967-06-02 | 1970-04-21 | Nat Res Corp | Low energy sputtering apparatus for operation below one micron pressure |
| US3361659A (en) * | 1967-08-14 | 1968-01-02 | Ibm | Process of depositing thin films by cathode sputtering using a controlled grid |
| US3530055A (en) * | 1968-08-26 | 1970-09-22 | Ibm | Formation of layers of solids on substrates |
| US4132612A (en) * | 1974-12-23 | 1979-01-02 | Telic Corporation | Glow discharge method and apparatus |
| US4288306A (en) * | 1978-07-08 | 1981-09-08 | Wolfgang Kieferle | Process for forming a metal or alloy layer and device for executing same |
-
0
- NL NL266760D patent/NL266760A/xx unknown
- NL NL124459D patent/NL124459C/xx active
-
1961
- 1961-07-06 GB GB2439661A patent/GB939275A/en not_active Expired
- 1961-07-07 DE DEC24617A patent/DE1142262B/de active Pending
- 1961-07-08 FR FR867429A patent/FR1294562A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL266760A (en:Method) | |
| GB939275A (en) | 1963-10-09 |
| DE1142262B (de) | 1963-01-10 |
| FR1294562A (fr) | 1962-05-26 |