NL1042976A - Lithographic method and apparatus - Google Patents

Lithographic method and apparatus Download PDF

Info

Publication number
NL1042976A
NL1042976A NL1042976A NL1042976A NL1042976A NL 1042976 A NL1042976 A NL 1042976A NL 1042976 A NL1042976 A NL 1042976A NL 1042976 A NL1042976 A NL 1042976A NL 1042976 A NL1042976 A NL 1042976A
Authority
NL
Netherlands
Prior art keywords
sensor
apodization
aperture
measurement
radiation beam
Prior art date
Application number
NL1042976A
Other languages
English (en)
Dutch (nl)
Inventor
Hubertus Petrus Koller Paulus
Spijkman Mark-Jan
Jacobus Matheus Baselmans Johannes
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1042976A publication Critical patent/NL1042976A/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL1042976A 2017-09-07 2018-09-03 Lithographic method and apparatus NL1042976A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP17189827 2017-09-07

Publications (1)

Publication Number Publication Date
NL1042976A true NL1042976A (en) 2019-03-11

Family

ID=59811198

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1042976A NL1042976A (en) 2017-09-07 2018-09-03 Lithographic method and apparatus

Country Status (4)

Country Link
KR (1) KR102535147B1 (ko)
CN (1) CN111051992A (ko)
NL (1) NL1042976A (ko)
WO (1) WO2019048295A1 (ko)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5561290A (en) * 1995-06-09 1996-10-01 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Optical detector calibrator system
US5659168A (en) * 1995-11-13 1997-08-19 Eastman Kodak Company Radiometric calibration system
WO1997037379A1 (en) * 1996-04-03 1997-10-09 Advanced Micro Devices, Inc. In-situ sensor for the measurement of deposition on etching chamber walls
US7224430B2 (en) * 2004-10-29 2007-05-29 Asml Netherlands B.V. Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
JP4701030B2 (ja) * 2005-07-22 2011-06-15 キヤノン株式会社 露光装置、露光パラメータを設定する設定方法、露光方法、デバイス製造方法及びプログラム
NL2003806A (en) * 2008-12-15 2010-06-16 Asml Netherlands Bv Method for a lithographic apparatus.
NL2010467A (en) * 2012-04-16 2013-10-17 Asml Netherlands Bv Lithographic method and apparatus.
US9091650B2 (en) * 2012-11-27 2015-07-28 Kla-Tencor Corporation Apodization for pupil imaging scatterometry
CN205845913U (zh) * 2016-07-26 2016-12-28 南通富士通微电子股份有限公司 一种用于晶圆边缘的曝光结构

Also Published As

Publication number Publication date
CN111051992A (zh) 2020-04-21
KR102535147B1 (ko) 2023-05-23
KR20200030117A (ko) 2020-03-19
WO2019048295A1 (en) 2019-03-14

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