CN111051992A - 光刻方法和设备 - Google Patents

光刻方法和设备 Download PDF

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Publication number
CN111051992A
CN111051992A CN201880057965.0A CN201880057965A CN111051992A CN 111051992 A CN111051992 A CN 111051992A CN 201880057965 A CN201880057965 A CN 201880057965A CN 111051992 A CN111051992 A CN 111051992A
Authority
CN
China
Prior art keywords
sensor
aperture
radiation
apodization
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201880057965.0A
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English (en)
Chinese (zh)
Inventor
P·H·P·科勒
M-J·斯皮杰克曼
J·J·M·巴塞曼斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of CN111051992A publication Critical patent/CN111051992A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201880057965.0A 2017-09-07 2018-08-29 光刻方法和设备 Pending CN111051992A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP17189827 2017-09-07
EP17189827.3 2017-09-07
PCT/EP2018/073173 WO2019048295A1 (en) 2017-09-07 2018-08-29 LITHOGRAPHIC METHOD AND APPARATUS

Publications (1)

Publication Number Publication Date
CN111051992A true CN111051992A (zh) 2020-04-21

Family

ID=59811198

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880057965.0A Pending CN111051992A (zh) 2017-09-07 2018-08-29 光刻方法和设备

Country Status (4)

Country Link
KR (1) KR102535147B1 (ko)
CN (1) CN111051992A (ko)
NL (1) NL1042976A (ko)
WO (1) WO2019048295A1 (ko)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5659168A (en) * 1995-11-13 1997-08-19 Eastman Kodak Company Radiometric calibration system
US20060091324A1 (en) * 2004-10-29 2006-05-04 Asml Netherlands B.V. Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby
CN1900828A (zh) * 2005-07-22 2007-01-24 佳能株式会社 曝光装置及方法
US20130271636A1 (en) * 2012-04-16 2013-10-17 Asml Netherlands B.V. Lithographic Method and Apparatus
CN205845913U (zh) * 2016-07-26 2016-12-28 南通富士通微电子股份有限公司 一种用于晶圆边缘的曝光结构

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5561290A (en) * 1995-06-09 1996-10-01 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Optical detector calibrator system
WO1997037379A1 (en) * 1996-04-03 1997-10-09 Advanced Micro Devices, Inc. In-situ sensor for the measurement of deposition on etching chamber walls
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
NL2003806A (en) * 2008-12-15 2010-06-16 Asml Netherlands Bv Method for a lithographic apparatus.
US9091650B2 (en) * 2012-11-27 2015-07-28 Kla-Tencor Corporation Apodization for pupil imaging scatterometry

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5659168A (en) * 1995-11-13 1997-08-19 Eastman Kodak Company Radiometric calibration system
US20060091324A1 (en) * 2004-10-29 2006-05-04 Asml Netherlands B.V. Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby
CN1900828A (zh) * 2005-07-22 2007-01-24 佳能株式会社 曝光装置及方法
US20130271636A1 (en) * 2012-04-16 2013-10-17 Asml Netherlands B.V. Lithographic Method and Apparatus
CN205845913U (zh) * 2016-07-26 2016-12-28 南通富士通微电子股份有限公司 一种用于晶圆边缘的曝光结构

Also Published As

Publication number Publication date
KR102535147B1 (ko) 2023-05-23
KR20200030117A (ko) 2020-03-19
WO2019048295A1 (en) 2019-03-14
NL1042976A (en) 2019-03-11

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