NL1028723A1 - Differentiele interferometers welke gewenste bundelpatronen verschaffen. - Google Patents

Differentiele interferometers welke gewenste bundelpatronen verschaffen.

Info

Publication number
NL1028723A1
NL1028723A1 NL1028723A NL1028723A NL1028723A1 NL 1028723 A1 NL1028723 A1 NL 1028723A1 NL 1028723 A NL1028723 A NL 1028723A NL 1028723 A NL1028723 A NL 1028723A NL 1028723 A1 NL1028723 A1 NL 1028723A1
Authority
NL
Netherlands
Prior art keywords
provide desired
beam patterns
desired beam
differential interferometers
interferometers
Prior art date
Application number
NL1028723A
Other languages
English (en)
Other versions
NL1028723C2 (nl
Inventor
Kevin Richard Fine
Greg Charles Felix
John Joseph Bockman
Douglas Peter Woolverton
Original Assignee
Agilent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agilent Technologies Inc filed Critical Agilent Technologies Inc
Publication of NL1028723A1 publication Critical patent/NL1028723A1/nl
Application granted granted Critical
Publication of NL1028723C2 publication Critical patent/NL1028723C2/nl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J9/0215—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods by shearing interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02049—Interferometers characterised by particular mechanical design details
    • G01B9/02051—Integrated design, e.g. on-chip or monolithic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J2009/0261—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods polarised

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
NL1028723A 2004-07-28 2005-04-08 Differentiele interferometers welke gewenste bundelpatronen verschaffen. NL1028723C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/900,529 US7212290B2 (en) 2004-07-28 2004-07-28 Differential interferometers creating desired beam patterns
US90052904 2004-07-28

Publications (2)

Publication Number Publication Date
NL1028723A1 true NL1028723A1 (nl) 2006-01-31
NL1028723C2 NL1028723C2 (nl) 2007-03-27

Family

ID=35903973

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1028723A NL1028723C2 (nl) 2004-07-28 2005-04-08 Differentiele interferometers welke gewenste bundelpatronen verschaffen.

Country Status (5)

Country Link
US (1) US7212290B2 (nl)
JP (1) JP2006038869A (nl)
CN (1) CN1727837A (nl)
DE (1) DE102005017306A1 (nl)
NL (1) NL1028723C2 (nl)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE602006002916D1 (de) * 2005-04-27 2008-11-13 Mitutoyo Corp Interferometer und Kalibrierverfahren dafür
US20070267057A1 (en) * 2006-05-17 2007-11-22 Haluzak Charles C Optical device and method of forming the same
TWI326354B (en) * 2007-05-18 2010-06-21 Univ Nat Taipei Technology Method and apparatus for simultaneously acquiring interferograms and method for solving the phase
US7652771B2 (en) * 2007-10-31 2010-01-26 Agilent Technologies, Inc. Interferometer with Double Polarizing Beam Splitter
TWM476258U (en) * 2009-12-24 2014-04-11 Univ Nat Yunlin Science & Technology Multi-beam interferometric displacement measurement system utilized in the large measuring range
CN102236232B (zh) * 2010-04-29 2012-11-28 中国科学院上海光学精密机械研究所 波面差动干涉空间光解调器
TWI427270B (zh) * 2010-06-02 2014-02-21 Univ Nat Yunlin Sci & Tech 應用一維電耦合裝置之多光束位移量測干涉儀系統
WO2012134292A1 (en) * 2011-03-30 2012-10-04 Mapper Lithography Ip B.V. Alignment of an interferometer module for an exposure tool
WO2013121366A1 (en) 2012-02-15 2013-08-22 Primesense Ltd. Scanning depth engine
NL2011504C2 (en) * 2012-09-27 2015-01-05 Mapper Lithography Ip Bv Multi-axis differential interferometer.
WO2014203139A1 (en) * 2013-06-17 2014-12-24 Primesense Ltd. Modular optics for scanning engine
DE102014214839A1 (de) * 2014-07-29 2016-02-04 Dr. Johannes Heidenhain Gmbh Interferometer
CN115542564B (zh) * 2022-11-03 2023-03-24 北京中科国光量子科技有限公司 一种偏振无关空间光自零差干涉仪

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2127483A1 (de) * 1971-06-03 1972-12-14 Leitz Ernst Gmbh Verfahren zur interferentiellen Messung von Langen, Winkeln, Gangunter schieden oder Geschwindigkeiten
US4930894A (en) 1984-04-27 1990-06-05 Hewlett-Packard Company Minimum deadpath interferometer and dilatometer
US4693605A (en) 1985-12-19 1987-09-15 Zygo Corporation Differential plane mirror interferometer
US5187543A (en) * 1990-01-19 1993-02-16 Zygo Corporation Differential displacement measuring interferometer
US5682446A (en) * 1995-10-13 1997-10-28 E-Tek Dynamics, Inc. Polarization mode dispersion-free circulator
US6236507B1 (en) * 1998-04-17 2001-05-22 Zygo Corporation Apparatus to transform two nonparallel propagating optical beam components into two orthogonally polarized beam components
JP2001272513A (ja) * 2000-03-24 2001-10-05 Seiko Epson Corp 光学部品およびこれを用いたプロジェクタ
US6542247B2 (en) 2001-06-06 2003-04-01 Agilent Technologies, Inc. Multi-axis interferometer with integrated optical structure and method for manufacturing rhomboid assemblies
JP4262087B2 (ja) * 2001-07-06 2009-05-13 ザイゴ コーポレーション 多軸干渉計
US7307787B2 (en) * 2002-12-20 2007-12-11 Fuji Xerox Co., Ltd. Beam splitting prism, method of manufacturing beam splitting prism, and all-optical switching device

Also Published As

Publication number Publication date
CN1727837A (zh) 2006-02-01
JP2006038869A (ja) 2006-02-09
NL1028723C2 (nl) 2007-03-27
US20060039005A1 (en) 2006-02-23
DE102005017306A1 (de) 2006-03-23
US7212290B2 (en) 2007-05-01

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20070124

PD2B A search report has been drawn up
VD1 Lapsed due to non-payment of the annual fee

Effective date: 20091101