NL1015661A1 - Reflecterend optisch projectiesysteem met reductiebeeldvorming. - Google Patents

Reflecterend optisch projectiesysteem met reductiebeeldvorming.

Info

Publication number
NL1015661A1
NL1015661A1 NL1015661A NL1015661A NL1015661A1 NL 1015661 A1 NL1015661 A1 NL 1015661A1 NL 1015661 A NL1015661 A NL 1015661A NL 1015661 A NL1015661 A NL 1015661A NL 1015661 A1 NL1015661 A1 NL 1015661A1
Authority
NL
Netherlands
Prior art keywords
optical system
projection optical
reflective projection
reduction imaging
imaging
Prior art date
Application number
NL1015661A
Other languages
English (en)
Other versions
NL1015661C2 (nl
Inventor
Kiyota Mashima
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of NL1015661A1 publication Critical patent/NL1015661A1/nl
Application granted granted Critical
Publication of NL1015661C2 publication Critical patent/NL1015661C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL1015661A 1999-07-09 2000-07-10 Reflecterend optisch projectiesysteem met reductiebeeldvorming. NL1015661C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP19632299 1999-07-09
JP19632299 1999-07-09

Publications (2)

Publication Number Publication Date
NL1015661A1 true NL1015661A1 (nl) 2001-01-10
NL1015661C2 NL1015661C2 (nl) 2003-02-06

Family

ID=16355904

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1015661A NL1015661C2 (nl) 1999-07-09 2000-07-10 Reflecterend optisch projectiesysteem met reductiebeeldvorming.

Country Status (2)

Country Link
US (1) US6361176B1 (nl)
NL (1) NL1015661C2 (nl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW573234B (en) * 2000-11-07 2004-01-21 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit device manufacturing method
JP2002329655A (ja) * 2001-05-01 2002-11-15 Canon Inc 反射型縮小投影光学系、露光装置及びデバイス製造方法
JP2004252363A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
DE602005003665T2 (de) 2004-05-17 2008-11-20 Carl Zeiss Smt Ag Katadioptrisches projektionsobjektiv mit zwischenbildern
DE102008033342A1 (de) 2008-07-16 2010-01-21 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
DE102008000800A1 (de) 2008-03-20 2009-09-24 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
CN102819196B (zh) * 2008-03-20 2016-03-09 卡尔蔡司Smt有限责任公司 用于微光刻的投射物镜
JP5525550B2 (ja) 2009-03-06 2014-06-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の照明光学系及び光学系

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5071240A (en) * 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
US5815310A (en) * 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
US5686728A (en) 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements
US6033079A (en) 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography

Also Published As

Publication number Publication date
US6361176B1 (en) 2002-03-26
NL1015661C2 (nl) 2003-02-06

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20021001

PD2B A search report has been drawn up
VD1 Lapsed due to non-payment of the annual fee

Effective date: 20070201