NL1004217A1 - Magnetronverstuifbron en het gebruik ervan. - Google Patents

Magnetronverstuifbron en het gebruik ervan.

Info

Publication number
NL1004217A1
NL1004217A1 NL1004217A NL1004217A NL1004217A1 NL 1004217 A1 NL1004217 A1 NL 1004217A1 NL 1004217 A NL1004217 A NL 1004217A NL 1004217 A NL1004217 A NL 1004217A NL 1004217 A1 NL1004217 A1 NL 1004217A1
Authority
NL
Netherlands
Prior art keywords
atomizing source
microwave atomizing
microwave
source
atomizing
Prior art date
Application number
NL1004217A
Other languages
English (en)
Other versions
NL1004217C2 (nl
Inventor
Pius Gruenenfelder
Hans Hirscher
Walter Haag
Walter Albertin
Original Assignee
Balzers Hochvakuum
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Hochvakuum filed Critical Balzers Hochvakuum
Publication of NL1004217A1 publication Critical patent/NL1004217A1/nl
Application granted granted Critical
Publication of NL1004217C2 publication Critical patent/NL1004217C2/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
NL1004217A 1995-10-06 1996-10-07 Magnetronverstuifbron en het gebruik ervan. NL1004217C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH02820/95A CH691643A5 (de) 1995-10-06 1995-10-06 Magnetronzerstäubungsquelle und deren Verwendung.
CH282095 1995-10-06

Publications (2)

Publication Number Publication Date
NL1004217A1 true NL1004217A1 (nl) 1997-04-08
NL1004217C2 NL1004217C2 (nl) 2001-07-19

Family

ID=4242327

Family Applications (2)

Application Number Title Priority Date Filing Date
NL1004217A NL1004217C2 (nl) 1995-10-06 1996-10-07 Magnetronverstuifbron en het gebruik ervan.
NL1018547A NL1018547C2 (nl) 1995-10-06 2001-07-16 Magnetronverstuivingsinrichting en werkwijze voor het vervaardigen van optische opslagschijven.

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL1018547A NL1018547C2 (nl) 1995-10-06 2001-07-16 Magnetronverstuivingsinrichting en werkwijze voor het vervaardigen van optische opslagschijven.

Country Status (5)

Country Link
US (2) US5997697A (nl)
JP (1) JPH09111450A (nl)
CH (1) CH691643A5 (nl)
DE (1) DE19639240C2 (nl)
NL (2) NL1004217C2 (nl)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH691643A5 (de) * 1995-10-06 2001-08-31 Unaxis Balzers Ag Magnetronzerstäubungsquelle und deren Verwendung.
US6679977B2 (en) * 1997-12-17 2004-01-20 Unakis Trading Ag Method of producing flat panels
DE10004824B4 (de) 2000-02-04 2009-06-25 Oc Oerlikon Balzers Ag Verfahren zur Herstellung von Substraten, Magnetronquelle, Sputterbeschichtungskammer und Verwendung des Verfahrens
US6887356B2 (en) * 2000-11-27 2005-05-03 Cabot Corporation Hollow cathode target and methods of making same
KR101046520B1 (ko) 2007-09-07 2011-07-04 어플라이드 머티어리얼스, 인코포레이티드 내부 챔버 상의 부산물 막 증착을 제어하기 위한 ｐｅｃｖｄ 시스템에서의 소스 가스 흐름 경로 제어
US20090188790A1 (en) * 2008-01-18 2009-07-30 4D-S Pty. Ltd. Concentric hollow cathode magnetron sputter source
TWI643969B (zh) * 2013-12-27 2018-12-11 日商半導體能源研究所股份有限公司 氧化物半導體的製造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE558797C (de) 1932-09-12 Paul Franke Diopter fuer Rahmen- oder Newtonsucher an photographischen Apparaten
US3878085A (en) * 1973-07-05 1975-04-15 Sloan Technology Corp Cathode sputtering apparatus
US4457825A (en) * 1980-05-16 1984-07-03 Varian Associates, Inc. Sputter target for use in a sputter coating source
NL8202092A (nl) * 1982-05-21 1983-12-16 Philips Nv Magnetronkathodesputtersysteem.
CH659484A5 (de) * 1984-04-19 1987-01-30 Balzers Hochvakuum Anordnung zur beschichtung von substraten mittels kathodenzerstaeubung.
US4842703A (en) * 1988-02-23 1989-06-27 Eaton Corporation Magnetron cathode and method for sputter coating
US4957605A (en) * 1989-04-17 1990-09-18 Materials Research Corporation Method and apparatus for sputter coating stepped wafers
JPH0814021B2 (ja) * 1989-07-20 1996-02-14 松下電器産業株式会社 スパッタ装置
JPH0379760A (ja) * 1989-08-22 1991-04-04 Fuji Photo Film Co Ltd スパッタリング装置
DE4018914C1 (nl) * 1990-06-13 1991-06-06 Leybold Ag, 6450 Hanau, De
US5080772A (en) * 1990-08-24 1992-01-14 Materials Research Corporation Method of improving ion flux distribution uniformity on a substrate
US5135634A (en) * 1991-02-14 1992-08-04 Sputtered Films, Inc. Apparatus for depositing a thin layer of sputtered atoms on a member
DE4128340C2 (de) * 1991-08-27 1999-09-23 Leybold Ag Zerstäubungskathodenanordnung nach dem Magnetron-Prinzip für die Beschichtung einer kreisringförmigen Beschichtungsfläche
DE9217937U1 (de) * 1992-01-29 1993-04-01 Leybold AG, 6450 Hanau Vorrichtung zur Kathodenzerstäubung
EP0558787A1 (de) * 1992-03-06 1993-09-08 Honeywell B.V. Verfahren zum Herstellen von Membranen
ATE130465T1 (de) * 1994-04-07 1995-12-15 Balzers Hochvakuum Magnetronzerstäubungsquelle und deren verwendung.
JP2671835B2 (ja) * 1994-10-20 1997-11-05 日本電気株式会社 スパッタ装置とその装置を用いた半導体装置の製造方法
CH691643A5 (de) * 1995-10-06 2001-08-31 Unaxis Balzers Ag Magnetronzerstäubungsquelle und deren Verwendung.
US5688391A (en) * 1996-03-26 1997-11-18 Microfab Technologies, Inc. Method for electro-deposition passivation of ink channels in ink jet printhead
US5824197A (en) * 1996-06-05 1998-10-20 Applied Materials, Inc. Shield for a physical vapor deposition chamber

Also Published As

Publication number Publication date
NL1004217C2 (nl) 2001-07-19
NL1018547A1 (nl) 2001-09-21
US6540883B1 (en) 2003-04-01
DE19639240C2 (de) 2000-03-02
NL1018547C2 (nl) 2002-04-12
DE19639240A1 (de) 1997-04-10
US5997697A (en) 1999-12-07
CH691643A5 (de) 2001-08-31
JPH09111450A (ja) 1997-04-28

Similar Documents

Publication Publication Date Title
DE69635673D1 (de) Blutsammelsystem und kupplung
KR970018817U (ko) 전자렌지
DE69410358T2 (de) Planar-Magnetron-Zerstäubungs-Apparat
DE69711939T2 (de) Absorbierendes produkt mit verschlüssen
TR199800117A3 (tr) Isaksazol- ve krotonasitamid türevleri ve bunlarin kullanimi.
DE69827519D1 (de) Formulareingabe mit vergleich des feld-datentypes
NL1004217A1 (nl) Magnetronverstuifbron en het gebruik ervan.
DE69434264D1 (de) Zerstäuber
EE9900019A (et) Asolotriasiinid ja -pürimidiinid
FI971086A0 (fi) Kinaasia sitova proteiini ja sen käyttö
PT819690E (pt) 6-tienil e 4-tienil pirimidinas herbicidas
DE59810241D1 (de) Verstärkerstufe mit konstanter Eingangsimpendanz
KR970018879U (ko) 전자렌지
KR970007112A (ko) 전자렌지
KR970024627U (ko) 탁상식 및 붙박이식 공용 전자렌지
KR970006497U (ko) 트랜스 분리형 전자렌지
KR970018815U (ko) 전자렌지
KR970002455U (ko) 전자렌지
KR970002472U (ko) 전자렌지
KR960035115U (ko) 전자렌지
KR970044088U (ko) 전자렌지
KR970024641U (ko) 전자렌지
KR970018800U (ko) 전자레인지
KR960032102U (ko) 전자레인지
BR9502090A (pt) Pulverizador basculante

Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20010314

PD2B A search report has been drawn up
VD1 Lapsed due to non-payment of the annual fee

Effective date: 20080501

V1 Lapsed because of non-payment of the annual fee

Effective date: 20100501