NL1002246A1 - Door een laser bestraald electronenkanon. - Google Patents

Door een laser bestraald electronenkanon.

Info

Publication number
NL1002246A1
NL1002246A1 NL1002246A NL1002246A NL1002246A1 NL 1002246 A1 NL1002246 A1 NL 1002246A1 NL 1002246 A NL1002246 A NL 1002246A NL 1002246 A NL1002246 A NL 1002246A NL 1002246 A1 NL1002246 A1 NL 1002246A1
Authority
NL
Netherlands
Prior art keywords
gun
irradiated
laser
electron
electron gun
Prior art date
Application number
NL1002246A
Other languages
English (en)
Other versions
NL1002246C2 (nl
Inventor
Takayoshi Kimoto
Original Assignee
Nat Res Inst Metals
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nat Res Inst Metals filed Critical Nat Res Inst Metals
Publication of NL1002246A1 publication Critical patent/NL1002246A1/nl
Application granted granted Critical
Publication of NL1002246C2 publication Critical patent/NL1002246C2/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/34—Photo-emissive cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06333—Photo emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
NL1002246A 1995-02-06 1996-02-05 Door een laser bestraald electronenkanon. NL1002246C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7018258A JPH08212952A (ja) 1995-02-06 1995-02-06 レーザー照射型電子銃
JP1825895 1995-02-06

Publications (2)

Publication Number Publication Date
NL1002246A1 true NL1002246A1 (nl) 1996-08-06
NL1002246C2 NL1002246C2 (nl) 1998-07-13

Family

ID=11966663

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1002246A NL1002246C2 (nl) 1995-02-06 1996-02-05 Door een laser bestraald electronenkanon.

Country Status (3)

Country Link
JP (1) JPH08212952A (nl)
DE (1) DE19604272A1 (nl)
NL (1) NL1002246C2 (nl)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10113064B4 (de) * 2001-03-15 2004-05-19 Lzh Laserzentrum Hannover E.V. Verfahren und Einrichtung zur Erzeugung von UV-Strahlung, insbesondere von EUV-Strahlung
DE10245052A1 (de) * 2002-09-26 2004-04-08 Leo Elektronenmikroskopie Gmbh Elektronenstrahlquelle und elektronenoptischer Apparat mit einer solchen
DE10255767A1 (de) * 2002-11-28 2004-06-17 Von Ardenne Anlagentechnik Gmbh Verfahren zum Erzeugen eines Elektronenstrahls und Elektronenstrahlerzeuger
US9159527B2 (en) 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US7554096B2 (en) 2003-10-16 2009-06-30 Alis Corporation Ion sources, systems and methods
US7557360B2 (en) 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7557361B2 (en) 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7786451B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7786452B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7557358B2 (en) 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7554097B2 (en) 2003-10-16 2009-06-30 Alis Corporation Ion sources, systems and methods
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US7557359B2 (en) 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
EP1735811B1 (en) 2004-04-02 2015-09-09 California Institute Of Technology Method and system for ultrafast photoelectron microscope
JP5071699B2 (ja) * 2004-11-04 2012-11-14 独立行政法人物質・材料研究機構 フォトカソード型電子線源の陰極先端部への高量子効率物質の局所被覆装置
US7804068B2 (en) 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
WO2009151458A1 (en) * 2008-06-13 2009-12-17 Carl Zeiss Smt, Inc. Ion sources, systems and methods
JP5525104B2 (ja) 2011-02-25 2014-06-18 株式会社Ｐａｒａｍ 電子銃および電子ビーム装置
FR2987165B1 (fr) * 2012-02-16 2014-02-28 Centre Nat Rech Scient Dispositif et procede d'emission d'electrons et dispositif comportant un tel systeme d'emission d'electrons
JP5709922B2 (ja) * 2013-03-29 2015-04-30 株式会社Ｐａｒａｍ 電子銃および電子ビーム装置
DE102013108603B4 (de) * 2013-08-08 2015-05-13 Von Ardenne Gmbh Strahlungsquelle, Vorrichtung und Verfahren zur schnellen Wärmebehandlung von Beschichtungen
CN104766776B (zh) * 2014-01-07 2016-09-28 中国科学院物理研究所 多功能超快透射电子显微镜电子枪
EP3561850A1 (en) * 2018-04-27 2019-10-30 Friedrich-Alexander-Universität Erlangen-Nürnberg Electron emitting apparatus and method for emitting electrons

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557656B2 (nl) * 1972-07-17 1980-02-27
JPS4961595A (nl) * 1972-10-11 1974-06-14
NL7605820A (nl) * 1976-05-31 1977-12-02 Philips Nv Elektronenstraalbuis met veldemissieelektronen- bron, veldemissieelektronenbron voor een der- gelijke elektronenstraalbuis en werkwijze voor de vervaardiging van een dergelijke veldemis- sieelektronenbron.
KR970005769B1 (ko) * 1992-08-27 1997-04-19 가부시끼가이샤 도시바 자계 계침형 전자총
JPH06333525A (ja) * 1993-05-21 1994-12-02 Beam Tec:Kk 荷電粒子線照射装置
JPH0714503A (ja) * 1993-06-25 1995-01-17 Laser Gijutsu Sogo Kenkyusho レーザー熱陰極構造体

Also Published As

Publication number Publication date
NL1002246C2 (nl) 1998-07-13
JPH08212952A (ja) 1996-08-20
DE19604272A1 (de) 1996-08-08

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
PD2B A search report has been drawn up
VD1 Lapsed due to non-payment of the annual fee

Effective date: 20060901