MY197614A - Polishing composition for magnetic disk substrates - Google Patents
Polishing composition for magnetic disk substratesInfo
- Publication number
- MY197614A MY197614A MYPI2020000408A MYPI2020000408A MY197614A MY 197614 A MY197614 A MY 197614A MY PI2020000408 A MYPI2020000408 A MY PI2020000408A MY PI2020000408 A MYPI2020000408 A MY PI2020000408A MY 197614 A MY197614 A MY 197614A
- Authority
- MY
- Malaysia
- Prior art keywords
- particle size
- silica particles
- ratio
- polishing composition
- mass
- Prior art date
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The present invention provides a polishing composition capable of achieving a high polishing rate without using alumina abrasive grains, at the same time, achieving good surface smoothness by reducing shallow pit and waviness, and further reducing roll-off. The polishing composition for a magnetic disk substrate contains colloidal silica having an average primary particle size of 10 to 150nm, pulverized wet-process silica particles having an average particle size of 200 to 500nm, and water. The ratio of colloidal silica in the total silica particles is 20 to 80% by mass, and the ratio of pulverized wet-process silica particles in the total silica particles is 20 to 80% by mass. The ratio of particles having a particle size of 30 to 70nm in colloidal silica is 10 to 90% by volume. Further, the ratio of the average particle size of the pulverized wet-process silica particles to the average primary particle size of the colloidal silica is 2.0 to 15.0, and the concentration of the total silica particles is 2 to 40% by mass. [No suitable figure]
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019011481A JP7219101B2 (en) | 2019-01-25 | 2019-01-25 | Abrasive composition for magnetic disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
MY197614A true MY197614A (en) | 2023-06-28 |
Family
ID=71891382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2020000408A MY197614A (en) | 2019-01-25 | 2020-01-23 | Polishing composition for magnetic disk substrates |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7219101B2 (en) |
MY (1) | MY197614A (en) |
TW (1) | TWI820284B (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3997154B2 (en) * | 2002-12-26 | 2007-10-24 | 花王株式会社 | Polishing liquid composition |
JP6511039B2 (en) | 2014-03-28 | 2019-05-08 | 山口精研工業株式会社 | Abrasive composition and method of polishing magnetic disk substrate |
WO2015146942A1 (en) * | 2014-03-28 | 2015-10-01 | 山口精研工業株式会社 | Polishing agent composition and method for polishing magnetic disk substrate |
JP6940315B2 (en) | 2017-06-22 | 2021-09-22 | 山口精研工業株式会社 | Abrasive composition for magnetic disk substrates |
-
2019
- 2019-01-25 JP JP2019011481A patent/JP7219101B2/en active Active
-
2020
- 2020-01-15 TW TW109101406A patent/TWI820284B/en active
- 2020-01-23 MY MYPI2020000408A patent/MY197614A/en unknown
Also Published As
Publication number | Publication date |
---|---|
TWI820284B (en) | 2023-11-01 |
JP2020119620A (en) | 2020-08-06 |
TW202037691A (en) | 2020-10-16 |
JP7219101B2 (en) | 2023-02-07 |
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