MY197614A - Polishing composition for magnetic disk substrates - Google Patents
Polishing composition for magnetic disk substratesInfo
- Publication number
- MY197614A MY197614A MYPI2020000408A MYPI2020000408A MY197614A MY 197614 A MY197614 A MY 197614A MY PI2020000408 A MYPI2020000408 A MY PI2020000408A MY PI2020000408 A MYPI2020000408 A MY PI2020000408A MY 197614 A MY197614 A MY 197614A
- Authority
- MY
- Malaysia
- Prior art keywords
- particle size
- silica particles
- ratio
- polishing composition
- mass
- Prior art date
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The present invention provides a polishing composition capable of achieving a high polishing rate without using alumina abrasive grains, at the same time, achieving good surface smoothness by reducing shallow pit and waviness, and further reducing roll-off. The polishing composition for a magnetic disk substrate contains colloidal silica having an average primary particle size of 10 to 150nm, pulverized wet-process silica particles having an average particle size of 200 to 500nm, and water. The ratio of colloidal silica in the total silica particles is 20 to 80% by mass, and the ratio of pulverized wet-process silica particles in the total silica particles is 20 to 80% by mass. The ratio of particles having a particle size of 30 to 70nm in colloidal silica is 10 to 90% by volume. Further, the ratio of the average particle size of the pulverized wet-process silica particles to the average primary particle size of the colloidal silica is 2.0 to 15.0, and the concentration of the total silica particles is 2 to 40% by mass. [No suitable figure]
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019011481A JP7219101B2 (en) | 2019-01-25 | 2019-01-25 | Abrasive composition for magnetic disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
MY197614A true MY197614A (en) | 2023-06-28 |
Family
ID=71891382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2020000408A MY197614A (en) | 2019-01-25 | 2020-01-23 | Polishing composition for magnetic disk substrates |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7219101B2 (en) |
MY (1) | MY197614A (en) |
TW (1) | TWI820284B (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3997154B2 (en) * | 2002-12-26 | 2007-10-24 | 花王株式会社 | Polishing liquid composition |
JP6484894B2 (en) * | 2014-03-28 | 2019-03-20 | 山口精研工業株式会社 | Abrasive composition and method for polishing magnetic disk substrate |
JP6511039B2 (en) * | 2014-03-28 | 2019-05-08 | 山口精研工業株式会社 | Abrasive composition and method of polishing magnetic disk substrate |
JP6940315B2 (en) * | 2017-06-22 | 2021-09-22 | 山口精研工業株式会社 | Abrasive composition for magnetic disk substrates |
-
2019
- 2019-01-25 JP JP2019011481A patent/JP7219101B2/en active Active
-
2020
- 2020-01-15 TW TW109101406A patent/TWI820284B/en active
- 2020-01-23 MY MYPI2020000408A patent/MY197614A/en unknown
Also Published As
Publication number | Publication date |
---|---|
TW202037691A (en) | 2020-10-16 |
TWI820284B (en) | 2023-11-01 |
JP2020119620A (en) | 2020-08-06 |
JP7219101B2 (en) | 2023-02-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2857722B2 (en) | Activated polishing composition | |
RU2006104117A (en) | ABRASIVE PARTICLES FOR MECHANICAL POLISHING | |
TW200617150A (en) | Polishing composition | |
MY130609A (en) | Polishing composition | |
CN103937414B (en) | A kind of precise polishing solution of hard disc of computer disk substrate | |
MY139682A (en) | Substrate for magnetic disk | |
TW200729177A (en) | Polishing composition for hard disk substrate | |
EP0210001A1 (en) | Process for polishing non-electrolysis nickel plate, alumite or aluminium surface of a memory hard disc | |
DE60030444D1 (en) | CMP COMPOSITION CONTAINING SILANO MODIFIED GRINDING PARTICLES | |
WO2002028979A1 (en) | Cerium based abrasive material and method for producing cerium based abrasive material | |
TW200628406A (en) | Cerium oxide abrasive and slurry containing the same | |
TWI653324B (en) | Polishing composition and method for polishing magnetic disc substrates | |
TW200724633A (en) | Polishing slurries and methods for utilizing same | |
MY144783A (en) | Polishing composition | |
JP6730859B2 (en) | Polishing composition and method for manufacturing magnetic disk substrate | |
SG170807A1 (en) | Fine particles of oxide crystal and slurry for polishing which contains the fine particles | |
MY154723A (en) | Cerium-based abrasive, abrasive slurry, and production of cerium-based abrasive. | |
JP2018081733A (en) | Polishing liquid composition for magnetic disk substrate | |
TW200609336A (en) | Polishing composition and substrate polishing method | |
MY197614A (en) | Polishing composition for magnetic disk substrates | |
MY134679A (en) | Polishing composition | |
US9534147B2 (en) | Polishing composition and method for nickel-phosphorous coated memory disks | |
MY139129A (en) | Polishing composition | |
WO2001023485A1 (en) | Polishing composition and method | |
MY185458A (en) | Polishing composition for magnetic disk substrate |