MY145225A - Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp - Google Patents
Pattern transfer printing by kinetic control of adhesion to an elastomeric stampInfo
- Publication number
- MY145225A MY145225A MYPI20062536A MYPI20062536A MY145225A MY 145225 A MY145225 A MY 145225A MY PI20062536 A MYPI20062536 A MY PI20062536A MY PI20062536 A MYPI20062536 A MY PI20062536A MY 145225 A MY145225 A MY 145225A
- Authority
- MY
- Malaysia
- Prior art keywords
- features
- transfer
- present
- adhesion
- methods
- Prior art date
Links
- 238000010023 transfer printing Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 abstract 4
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 230000002153 concerted effect Effects 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Thin Film Transistor (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Weting (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/145,542 US7557367B2 (en) | 2004-06-04 | 2005-06-02 | Stretchable semiconductor elements and stretchable electrical circuits |
PCT/US2005/019354 WO2005122285A2 (en) | 2004-06-04 | 2005-06-02 | Methods and devices for fabricating and assembling printable semiconductor elements |
US11/145,574 US7622367B1 (en) | 2004-06-04 | 2005-06-02 | Methods and devices for fabricating and assembling printable semiconductor elements |
Publications (1)
Publication Number | Publication Date |
---|---|
MY145225A true MY145225A (en) | 2012-01-13 |
Family
ID=41576388
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI20062536A MY145225A (en) | 2005-06-02 | 2006-06-01 | Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp |
Country Status (3)
Country | Link |
---|---|
CN (2) | CN102176465B (zh) |
MY (1) | MY145225A (zh) |
TW (1) | TWI420237B (zh) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101615255B1 (ko) | 2006-09-20 | 2016-05-11 | 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈 | 전사가능한 반도체 구조들, 디바이스들 및 디바이스 컴포넌트들을 만들기 위한 릴리스 방안들 |
US7927976B2 (en) | 2008-07-23 | 2011-04-19 | Semprius, Inc. | Reinforced composite stamp for dry transfer printing of semiconductor elements |
WO2010059781A1 (en) | 2008-11-19 | 2010-05-27 | Semprius, Inc. | Printing semiconductor elements by shear-assisted elastomeric stamp transfer |
US8261660B2 (en) | 2009-07-22 | 2012-09-11 | Semprius, Inc. | Vacuum coupled tool apparatus for dry transfer printing semiconductor elements |
CN101924173A (zh) * | 2010-05-28 | 2010-12-22 | 孙文红 | 高光效图形衬底及其制造方法 |
TWI415284B (zh) * | 2011-03-10 | 2013-11-11 | Gintech Energy Corp | 太陽能電池電極製作設備及其方法 |
WO2012158709A1 (en) | 2011-05-16 | 2012-11-22 | The Board Of Trustees Of The University Of Illinois | Thermally managed led arrays assembled by printing |
US9824851B2 (en) * | 2013-01-20 | 2017-11-21 | William M. Tong | Charge drain coating for electron-optical MEMS |
CN103873011A (zh) * | 2014-03-05 | 2014-06-18 | 随州泰华电子科技有限公司 | 一种音叉晶片的自动折取装置 |
TWI677963B (zh) * | 2014-06-18 | 2019-11-21 | 愛爾蘭商艾克斯瑟樂普林特有限公司 | 微組裝高頻裝置及陣列 |
US9550353B2 (en) * | 2014-07-20 | 2017-01-24 | X-Celeprint Limited | Apparatus and methods for micro-transfer-printing |
US20160093600A1 (en) * | 2014-09-25 | 2016-03-31 | X-Celeprint Limited | Compound micro-assembly strategies and devices |
CN105049033B (zh) * | 2015-07-01 | 2017-11-24 | 东南大学 | 基于砷化镓基低漏电流双悬臂梁开关的或非门 |
CN105140227B (zh) * | 2015-07-01 | 2017-12-05 | 东南大学 | 氮化镓基低漏电流悬臂梁的与非门 |
CN105024688B (zh) * | 2015-07-01 | 2017-09-15 | 东南大学 | 氮化镓基低漏电流固支梁的与非门 |
CN104967410B (zh) * | 2015-07-01 | 2017-11-07 | 东南大学 | 硅基低漏电流固支梁栅场效应晶体管差分放大器 |
CN105161490B (zh) * | 2015-07-01 | 2018-02-06 | 东南大学 | 氮化镓基低漏电流悬臂梁场效应晶体管倒相器及制备方法 |
CN105304499A (zh) * | 2015-10-20 | 2016-02-03 | 上海集成电路研发中心有限公司 | 一种制备柔性碳纳米管场效应晶体管的方法 |
CN105355563A (zh) * | 2015-11-26 | 2016-02-24 | 上海集成电路研发中心有限公司 | 一种柔性半导体器件的制备方法 |
KR102510934B1 (ko) * | 2016-10-04 | 2023-03-16 | 뷰리얼 인크. | 도너 기판 내의 마이크로 디바이스 배열 |
CN106383403B (zh) * | 2016-12-08 | 2020-11-10 | 中国科学院光电技术研究所 | 一种可拉伸变形的超表面彩色显示器件 |
CN108231534A (zh) * | 2016-12-15 | 2018-06-29 | 上海新微技术研发中心有限公司 | 柔性薄膜的制造方法 |
FR3063854B1 (fr) * | 2017-03-13 | 2021-08-27 | Commissariat Energie Atomique | Resonateur saw a couches d'attenuation d'ondes parasites |
CN109103090B (zh) * | 2017-06-21 | 2020-12-04 | 清华大学 | 纳米带的制备方法 |
CN109103101B (zh) * | 2017-06-21 | 2020-09-29 | 清华大学 | 纳米微结构的制备方法 |
CN110890309B (zh) * | 2018-09-10 | 2023-09-08 | 桦榆国际有限公司 | 石墨盘修补方法 |
CN109342325B (zh) * | 2018-10-30 | 2023-12-19 | 南开大学 | 一种低维材料各向异性显微的成像方法和装置 |
CN111622996B (zh) * | 2020-04-27 | 2022-05-24 | 江苏科技大学 | 异构多阀并联驱动电液伺服系统及控制方法 |
CN111934071B (zh) * | 2020-06-19 | 2021-10-22 | 西安理工大学 | 一种基于tsv的脊状基片集成波导带通滤波器 |
CN111947794B (zh) * | 2020-07-31 | 2023-01-31 | 电子科技大学 | 一种超导纳米线单光子探测器的制备方法 |
CN112526660B (zh) * | 2020-11-11 | 2022-12-09 | 歌尔股份有限公司 | 在弯曲表面上制造纳米光栅的方法、光学器件及电子设备 |
US11747555B2 (en) | 2021-10-04 | 2023-09-05 | Eagle Technology, Llc | Optical assembly having commonly-shaped optical modules and associated methods |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4766670A (en) * | 1987-02-02 | 1988-08-30 | International Business Machines Corporation | Full panel electronic packaging structure and method of making same |
US6060723A (en) * | 1997-07-18 | 2000-05-09 | Hitachi, Ltd. | Controllable conduction device |
KR100275730B1 (ko) * | 1998-05-11 | 2000-12-15 | 윤종용 | 트렌치 소자분리 방법 |
US6373092B1 (en) * | 1998-09-29 | 2002-04-16 | Texas Instruments Incorporated | Staggered-edge capacitor electrode |
US6403397B1 (en) * | 2000-06-28 | 2002-06-11 | Agere Systems Guardian Corp. | Process for fabricating organic semiconductor device involving selective patterning |
JP4092914B2 (ja) * | 2001-01-26 | 2008-05-28 | セイコーエプソン株式会社 | マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法 |
KR100391984B1 (ko) * | 2001-08-08 | 2003-07-22 | 삼성전자주식회사 | 다층 터널접합층 패턴을 갖는 반도체 기억소자 및 그제조방법 |
US20060057469A1 (en) * | 2003-02-03 | 2006-03-16 | Mitsuhiro Kureishi | Photomask blank, photomask, and pattern transfer method using photomask |
TWI273019B (en) * | 2003-07-25 | 2007-02-11 | Hon Hai Prec Ind Co Ltd | A method of transfer pattern |
-
2006
- 2006-06-01 CN CN201110077508.8A patent/CN102176465B/zh active Active
- 2006-06-01 MY MYPI20062536A patent/MY145225A/en unknown
- 2006-06-01 CN CN2006800196400A patent/CN101632156B/zh active Active
- 2006-06-01 TW TW095119788A patent/TWI420237B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW200710562A (en) | 2007-03-16 |
CN101632156B (zh) | 2012-06-20 |
TWI420237B (zh) | 2013-12-21 |
CN101632156A (zh) | 2010-01-20 |
CN102176465A (zh) | 2011-09-07 |
CN102176465B (zh) | 2014-05-07 |
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