MY145225A - Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp - Google Patents

Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp

Info

Publication number
MY145225A
MY145225A MYPI20062536A MYPI20062536A MY145225A MY 145225 A MY145225 A MY 145225A MY PI20062536 A MYPI20062536 A MY PI20062536A MY PI20062536 A MYPI20062536 A MY PI20062536A MY 145225 A MY145225 A MY 145225A
Authority
MY
Malaysia
Prior art keywords
features
transfer
present
adhesion
methods
Prior art date
Application number
MYPI20062536A
Other languages
English (en)
Inventor
Ralph G Nuzzo
John A Rogers
Etienne Menard
Keon Jae Lee
Dahl-Young Khang
Yugang Sun
Matthew Meitl
Zhengtao Zhu
Original Assignee
Univ Illinois
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/145,542 external-priority patent/US7557367B2/en
Application filed by Univ Illinois filed Critical Univ Illinois
Publication of MY145225A publication Critical patent/MY145225A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Thin Film Transistor (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Weting (AREA)
MYPI20062536A 2005-06-02 2006-06-01 Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp MY145225A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/145,542 US7557367B2 (en) 2004-06-04 2005-06-02 Stretchable semiconductor elements and stretchable electrical circuits
PCT/US2005/019354 WO2005122285A2 (en) 2004-06-04 2005-06-02 Methods and devices for fabricating and assembling printable semiconductor elements
US11/145,574 US7622367B1 (en) 2004-06-04 2005-06-02 Methods and devices for fabricating and assembling printable semiconductor elements

Publications (1)

Publication Number Publication Date
MY145225A true MY145225A (en) 2012-01-13

Family

ID=41576388

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20062536A MY145225A (en) 2005-06-02 2006-06-01 Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp

Country Status (3)

Country Link
CN (2) CN102176465B (zh)
MY (1) MY145225A (zh)
TW (1) TWI420237B (zh)

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KR101615255B1 (ko) 2006-09-20 2016-05-11 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈 전사가능한 반도체 구조들, 디바이스들 및 디바이스 컴포넌트들을 만들기 위한 릴리스 방안들
US7927976B2 (en) 2008-07-23 2011-04-19 Semprius, Inc. Reinforced composite stamp for dry transfer printing of semiconductor elements
WO2010059781A1 (en) 2008-11-19 2010-05-27 Semprius, Inc. Printing semiconductor elements by shear-assisted elastomeric stamp transfer
US8261660B2 (en) 2009-07-22 2012-09-11 Semprius, Inc. Vacuum coupled tool apparatus for dry transfer printing semiconductor elements
CN101924173A (zh) * 2010-05-28 2010-12-22 孙文红 高光效图形衬底及其制造方法
TWI415284B (zh) * 2011-03-10 2013-11-11 Gintech Energy Corp 太陽能電池電極製作設備及其方法
WO2012158709A1 (en) 2011-05-16 2012-11-22 The Board Of Trustees Of The University Of Illinois Thermally managed led arrays assembled by printing
US9824851B2 (en) * 2013-01-20 2017-11-21 William M. Tong Charge drain coating for electron-optical MEMS
CN103873011A (zh) * 2014-03-05 2014-06-18 随州泰华电子科技有限公司 一种音叉晶片的自动折取装置
TWI677963B (zh) * 2014-06-18 2019-11-21 愛爾蘭商艾克斯瑟樂普林特有限公司 微組裝高頻裝置及陣列
US9550353B2 (en) * 2014-07-20 2017-01-24 X-Celeprint Limited Apparatus and methods for micro-transfer-printing
US20160093600A1 (en) * 2014-09-25 2016-03-31 X-Celeprint Limited Compound micro-assembly strategies and devices
CN105049033B (zh) * 2015-07-01 2017-11-24 东南大学 基于砷化镓基低漏电流双悬臂梁开关的或非门
CN105140227B (zh) * 2015-07-01 2017-12-05 东南大学 氮化镓基低漏电流悬臂梁的与非门
CN105024688B (zh) * 2015-07-01 2017-09-15 东南大学 氮化镓基低漏电流固支梁的与非门
CN104967410B (zh) * 2015-07-01 2017-11-07 东南大学 硅基低漏电流固支梁栅场效应晶体管差分放大器
CN105161490B (zh) * 2015-07-01 2018-02-06 东南大学 氮化镓基低漏电流悬臂梁场效应晶体管倒相器及制备方法
CN105304499A (zh) * 2015-10-20 2016-02-03 上海集成电路研发中心有限公司 一种制备柔性碳纳米管场效应晶体管的方法
CN105355563A (zh) * 2015-11-26 2016-02-24 上海集成电路研发中心有限公司 一种柔性半导体器件的制备方法
KR102510934B1 (ko) * 2016-10-04 2023-03-16 뷰리얼 인크. 도너 기판 내의 마이크로 디바이스 배열
CN106383403B (zh) * 2016-12-08 2020-11-10 中国科学院光电技术研究所 一种可拉伸变形的超表面彩色显示器件
CN108231534A (zh) * 2016-12-15 2018-06-29 上海新微技术研发中心有限公司 柔性薄膜的制造方法
FR3063854B1 (fr) * 2017-03-13 2021-08-27 Commissariat Energie Atomique Resonateur saw a couches d'attenuation d'ondes parasites
CN109103090B (zh) * 2017-06-21 2020-12-04 清华大学 纳米带的制备方法
CN109103101B (zh) * 2017-06-21 2020-09-29 清华大学 纳米微结构的制备方法
CN110890309B (zh) * 2018-09-10 2023-09-08 桦榆国际有限公司 石墨盘修补方法
CN109342325B (zh) * 2018-10-30 2023-12-19 南开大学 一种低维材料各向异性显微的成像方法和装置
CN111622996B (zh) * 2020-04-27 2022-05-24 江苏科技大学 异构多阀并联驱动电液伺服系统及控制方法
CN111934071B (zh) * 2020-06-19 2021-10-22 西安理工大学 一种基于tsv的脊状基片集成波导带通滤波器
CN111947794B (zh) * 2020-07-31 2023-01-31 电子科技大学 一种超导纳米线单光子探测器的制备方法
CN112526660B (zh) * 2020-11-11 2022-12-09 歌尔股份有限公司 在弯曲表面上制造纳米光栅的方法、光学器件及电子设备
US11747555B2 (en) 2021-10-04 2023-09-05 Eagle Technology, Llc Optical assembly having commonly-shaped optical modules and associated methods

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KR100275730B1 (ko) * 1998-05-11 2000-12-15 윤종용 트렌치 소자분리 방법
US6373092B1 (en) * 1998-09-29 2002-04-16 Texas Instruments Incorporated Staggered-edge capacitor electrode
US6403397B1 (en) * 2000-06-28 2002-06-11 Agere Systems Guardian Corp. Process for fabricating organic semiconductor device involving selective patterning
JP4092914B2 (ja) * 2001-01-26 2008-05-28 セイコーエプソン株式会社 マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法
KR100391984B1 (ko) * 2001-08-08 2003-07-22 삼성전자주식회사 다층 터널접합층 패턴을 갖는 반도체 기억소자 및 그제조방법
US20060057469A1 (en) * 2003-02-03 2006-03-16 Mitsuhiro Kureishi Photomask blank, photomask, and pattern transfer method using photomask
TWI273019B (en) * 2003-07-25 2007-02-11 Hon Hai Prec Ind Co Ltd A method of transfer pattern

Also Published As

Publication number Publication date
TW200710562A (en) 2007-03-16
CN101632156B (zh) 2012-06-20
TWI420237B (zh) 2013-12-21
CN101632156A (zh) 2010-01-20
CN102176465A (zh) 2011-09-07
CN102176465B (zh) 2014-05-07

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