MY139927A - Etching pastes for inorganic surfaces - Google Patents
Etching pastes for inorganic surfacesInfo
- Publication number
- MY139927A MY139927A MYPI20011927A MY139927A MY 139927 A MY139927 A MY 139927A MY PI20011927 A MYPI20011927 A MY PI20011927A MY 139927 A MY139927 A MY 139927A
- Authority
- MY
- Malaysia
- Prior art keywords
- etching
- inorganic surfaces
- etching pastes
- pastes
- media
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
Abstract
THE PRESENT INVENTION RELATES TO NOVEL ETCHING MEDIA IN THE FORM OF PRINTABLE, HOMOGENEOUS, PARTICLE-FREE ETCHING PASTES HAVING NON-NEWTONIAN FLOW BEHAVIOUR FOR ETCHING INORGANIC SURFACES, IN PARTICULAR OF GLASSES, PREFERABLY SILICON NITRIDE-BASED SYSTEMS AND LAYERS THEREOF, AND THE USE OF THESE ETCHING MEDIA.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10020817 | 2000-04-28 | ||
DE10101926A DE10101926A1 (en) | 2000-04-28 | 2001-01-16 | Etching pastes for inorganic surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
MY139927A true MY139927A (en) | 2009-11-30 |
Family
ID=7640190
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI20011927 MY139927A (en) | 2000-04-28 | 2001-04-25 | Etching pastes for inorganic surfaces |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5734259B2 (en) |
DE (1) | DE10101926A1 (en) |
ES (1) | ES2400933T3 (en) |
IL (1) | IL152497A (en) |
MY (1) | MY139927A (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10239656A1 (en) * | 2002-08-26 | 2004-03-11 | Merck Patent Gmbh | Etching pastes for titanium oxide surfaces |
DE10241300A1 (en) * | 2002-09-04 | 2004-03-18 | Merck Patent Gmbh | Etching for silicon surfaces and layers, used in photovoltaic, semiconductor and high power electronics technology, for producing photodiode, circuit, electronic device or solar cell, is thickened alkaline liquid |
DE102006019461A1 (en) * | 2006-04-26 | 2007-10-31 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Removing material from solids, especially semiconductor wafers, employs liquid jet containing e.g. halogen compound which is irradiated to produce highly-reactive free radicals |
DE102006035749A1 (en) * | 2006-07-28 | 2008-01-31 | Leonhard Kurz Gmbh & Co. Kg | Method for producing at least one component and component |
KR20100135276A (en) | 2008-03-26 | 2010-12-24 | 메르크 파텐트 게엠베하 | Composition for manufacturing sio2 resist layers and method of its use |
KR102078293B1 (en) | 2012-05-10 | 2020-02-17 | 코닝 인코포레이티드 | Glass Etching Media and Methods |
KR101366501B1 (en) * | 2012-09-28 | 2014-02-25 | 엘지디스플레이 주식회사 | Apparatus and method for manufacturing light guide plate |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5888143A (en) * | 1981-11-20 | 1983-05-26 | Nissha Printing Co Ltd | Preparation of colored glass product having uneven surface |
DE3601834A1 (en) * | 1986-01-20 | 1987-07-23 | Schering Ag | METHOD FOR ADHESIVE METALIZATION OF CERAMIC MATERIALS |
KR950002233B1 (en) * | 1992-08-14 | 1995-03-15 | 김태환 | Glass etching composition and method for etching glass surface therewith |
US6670281B2 (en) * | 1998-12-30 | 2003-12-30 | Honeywell International Inc. | HF etching and oxide scale removal |
US6807824B1 (en) * | 1999-04-27 | 2004-10-26 | Hiroshi Miwa | Glass etching composition and method for frosting using the same |
-
2001
- 2001-01-16 DE DE10101926A patent/DE10101926A1/en not_active Withdrawn
- 2001-03-23 ES ES01915409T patent/ES2400933T3/en not_active Expired - Lifetime
- 2001-04-25 MY MYPI20011927 patent/MY139927A/en unknown
-
2002
- 2002-10-27 IL IL152497A patent/IL152497A/en not_active IP Right Cessation
-
2012
- 2012-11-05 JP JP2012243337A patent/JP5734259B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2013063903A (en) | 2013-04-11 |
ES2400933T3 (en) | 2013-04-15 |
IL152497A (en) | 2008-11-03 |
JP5734259B2 (en) | 2015-06-17 |
DE10101926A1 (en) | 2001-10-31 |
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