AU2001266332A1 - Porous, fine inorganic particles - Google Patents
Porous, fine inorganic particlesInfo
- Publication number
- AU2001266332A1 AU2001266332A1 AU2001266332A AU6633201A AU2001266332A1 AU 2001266332 A1 AU2001266332 A1 AU 2001266332A1 AU 2001266332 A AU2001266332 A AU 2001266332A AU 6633201 A AU6633201 A AU 6633201A AU 2001266332 A1 AU2001266332 A1 AU 2001266332A1
- Authority
- AU
- Australia
- Prior art keywords
- porous
- inorganic particles
- fine inorganic
- fine
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5218—Macromolecular coatings characterised by inorganic additives, e.g. pigments, clays
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/126—Preparation of silica of undetermined type
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
- C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
- C01B33/1435—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates using ion exchangers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/01—Crystal-structural characteristics depicted by a TEM-image
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/02—Amorphous compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
- C01P2004/52—Particles with a specific particle size distribution highly monodisperse size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/16—Pore diameter
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/16—Pore diameter
- C01P2006/17—Pore diameter distribution
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
- Y10T428/257—Iron oxide or aluminum oxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/259—Silicic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Dispersion Chemistry (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Composite Materials (AREA)
- Physics & Mathematics (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Silicon Compounds (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-190805 | 2000-06-26 | ||
JP2000190805 | 2000-06-26 | ||
JP2001-127699 | 2001-04-25 | ||
JP2001127699 | 2001-04-25 | ||
PCT/JP2001/005465 WO2002000550A1 (en) | 2000-06-26 | 2001-06-26 | Porous, fine inorganic particles |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001266332A1 true AU2001266332A1 (en) | 2002-01-08 |
Family
ID=26594645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001266332A Abandoned AU2001266332A1 (en) | 2000-06-26 | 2001-06-26 | Porous, fine inorganic particles |
Country Status (8)
Country | Link |
---|---|
US (2) | US6808768B2 (en) |
KR (1) | KR100532833B1 (en) |
CN (1) | CN1307095C (en) |
AU (1) | AU2001266332A1 (en) |
DE (1) | DE10196393T1 (en) |
GB (1) | GB2382813B (en) |
TW (1) | TW583139B (en) |
WO (1) | WO2002000550A1 (en) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6808768B2 (en) * | 2000-06-26 | 2004-10-26 | Asani Kasei Kabushiki Kaisha | Porous, fine inorganic particles |
US20050020699A1 (en) * | 2001-12-25 | 2005-01-27 | Yasuhide Isobe | Inorganic porous fine particles |
JP4520088B2 (en) * | 2002-05-16 | 2010-08-04 | 独立行政法人科学技術振興機構 | Method for synthesizing mesoporous oxides with high three-dimensional regularity |
US20040076774A1 (en) * | 2002-10-15 | 2004-04-22 | Johan Loccufier | Ink jet recording material |
AU2003302247A1 (en) * | 2002-12-12 | 2004-07-09 | Mykrolis Corporation | Porous sintered composite materials |
DE102004015177B4 (en) * | 2004-03-27 | 2006-05-18 | Forschungszentrum Karlsruhe Gmbh | A method of patterning an element comprising a reflective substrate and an antireflective layer |
FR2872151B1 (en) * | 2004-06-24 | 2007-06-29 | Inst Francais Du Petrole | MATERIAL ALUMINOSILICATE MESOSTRUCTURE |
EP1743775A1 (en) * | 2005-07-13 | 2007-01-17 | SAPPI Netherlands Services B.V. | Coated paper for sheet fed offset printing |
US7485233B2 (en) * | 2005-02-09 | 2009-02-03 | U.S. Environmental Protection Agency | Hydrophilic mixed matrix material having reversible water absorbing properties |
EP1700824A1 (en) * | 2005-03-09 | 2006-09-13 | Degussa AG | Granules based on pyrogenically prepared silicon dioxide, method for their preparation and use thereof |
JP5189727B2 (en) * | 2005-05-24 | 2013-04-24 | 正彦 阿部 | Method for producing metal oxide nanocapsules |
WO2006135339A1 (en) * | 2005-06-16 | 2006-12-21 | Agency For Science, Technology And Research | Mesocellular foam particles |
DE102005062606A1 (en) * | 2005-12-23 | 2007-07-05 | Deutsche Institute Für Textil- Und Faserforschung Denkendorf | New nano-scale primary particle based on silicon oxide/mixed oxide of silicon oxide and other metal oxide, useful e.g. for hydrophilic coating of hydrophobic textile materials |
US20100272996A1 (en) * | 2007-07-13 | 2010-10-28 | Justin Holmes | method for synthesising microparticles |
US20090123655A1 (en) * | 2007-11-08 | 2009-05-14 | Shaw-Klein Lori J | Process for making inkjet recording element |
RU2522593C2 (en) * | 2008-10-15 | 2014-07-20 | Басф Се | Method of obtaining silicon dioxide-containing polyol dispersions and their application for obtaining polyurethane materials |
US8029752B2 (en) * | 2009-04-06 | 2011-10-04 | Nalco Company | Approach in controlling DSP scale in bayer process |
US8545776B2 (en) * | 2009-09-25 | 2013-10-01 | Nalco Company | Reducing aluminosilicate scale in the Bayer process |
US9487408B2 (en) | 2009-09-25 | 2016-11-08 | Nalco Company | Reducing aluminosilicate scale in the bayer process |
US9416020B2 (en) | 2009-09-25 | 2016-08-16 | Nalco Company | Surfactant based small molecules for reducing aluminosilicate scale in the bayer process |
US8282834B2 (en) | 2009-09-25 | 2012-10-09 | Nalco Company | Di- and mono-alkoxysilane functionalized polymers and their application in the Bayer process |
US9682383B2 (en) | 2010-04-08 | 2017-06-20 | Nalco Company | Gas stream treatment process |
US9555420B2 (en) | 2010-04-08 | 2017-01-31 | Nalco Company | Gas stream treatment process |
US8936772B2 (en) | 2010-04-08 | 2015-01-20 | Ecolab Usa Inc. | Silica containing particle |
US8333835B2 (en) | 2010-04-08 | 2012-12-18 | Nalco Company | Sulfur containing silica particle |
US8377194B2 (en) | 2010-04-08 | 2013-02-19 | Nalco Company | Sulfur containing silica particle |
CN102041718B (en) * | 2010-09-29 | 2012-05-30 | 上海东升新材料有限公司 | Ink absorption medium for color inkjet printing paper and preparation method thereof |
CN103328382A (en) * | 2011-01-21 | 2013-09-25 | Dic株式会社 | Process for producing porous silica particles, resin composition for antireflection coatings, article with antireflection coating, and antireflection film |
US8609046B2 (en) | 2011-10-07 | 2013-12-17 | Nalco Company | Gas stream treatment process |
SG11201404972QA (en) * | 2012-03-08 | 2014-09-26 | Univ Singapore | Catalytic hollow fibers |
FR3000408B1 (en) * | 2013-01-03 | 2015-02-27 | Commissariat Energie Atomique | METHOD FOR PRODUCING FILTER FOR FILTRATION OF NANOPARTICLES, FILTER OBTAINED AND METHOD FOR COLLECTING AND QUANTITATIVE ANALYSIS OF NANOPARTICLES THEREOF |
US9937709B2 (en) * | 2015-04-30 | 2018-04-10 | Riso Kagaku Corporation | Surface treatment liquid for porous sound-absorbing material, aqueous inkjet ink for porous sound-absorbing material, and uses therefor |
FR3043683B1 (en) * | 2015-11-12 | 2019-04-12 | Pylote | SPHERICAL PARTICLES CHARGED WITH COLORING AGENTS |
KR101973195B1 (en) * | 2016-03-11 | 2019-04-26 | 주식회사 엘지화학 | Anti-reflective film and preparation method of the same |
JP7356924B2 (en) * | 2020-01-31 | 2023-10-05 | 日揮触媒化成株式会社 | Polishing abrasive dispersion liquid |
CN111634917A (en) * | 2020-05-27 | 2020-09-08 | 云南省能源研究院有限公司 | Preparation method of porous active silica gel |
CN111592002B (en) * | 2020-06-04 | 2022-03-25 | 山东振兴化工有限公司 | Preparation method of high-reinforcement high-transparency easily-dispersible white carbon black |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01230421A (en) * | 1988-03-11 | 1989-09-13 | Nippon Shokubai Kagaku Kogyo Co Ltd | Porous spherical silica fine particle |
JP2803134B2 (en) * | 1988-03-16 | 1998-09-24 | 日産化学工業株式会社 | Elongated silica sol and method for producing the same |
CN1022099C (en) * | 1988-03-16 | 1993-09-15 | 日产化学工业株式会社 | Stable silica sol, and process for preparing it |
US5268101A (en) * | 1991-10-08 | 1993-12-07 | Anderson Marc A | Microprobes aluminosilicate ceramic membranes |
JP3362793B2 (en) * | 1992-04-14 | 2003-01-07 | 日本化学工業株式会社 | Method for producing silica sol |
US5935700A (en) * | 1994-06-06 | 1999-08-10 | Catalysts & Chemicals Industries Co., Ltd. | Thermoplastic resin film containing composite oxide particles |
US5622684A (en) * | 1995-06-06 | 1997-04-22 | Board Of Trustees Operating Michigan State University | Porous inorganic oxide materials prepared by non-ionic surfactant templating route |
CN1155514A (en) * | 1996-01-25 | 1997-07-30 | 天津市化学试剂一厂 | Manufacture of high purity, high concentration and high granularity large granular silicon dioxide gel |
EP1035073A1 (en) * | 1997-11-21 | 2000-09-13 | Asahi Kasei Kogyo Kabushiki Kaisha | Mesoporous silica, process for the preparation of the same, and use thereof |
US6025068A (en) * | 1998-02-13 | 2000-02-15 | Ppg Industries Ohio, Inc. | Inkjet printable coating for microporous materials |
US6177188B1 (en) * | 1998-03-31 | 2001-01-23 | Canon Kabushiki Kaisha | Recording medium and ink jet recording process using it |
KR100571624B1 (en) * | 1998-09-10 | 2006-04-17 | 닛산 가가쿠 고교 가부시키 가이샤 | Moniliform silica sol, process for producing the same, and ink-jet recording medium |
JP2000281331A (en) | 1999-03-26 | 2000-10-10 | Toyota Central Res & Dev Lab Inc | Mesoporous body and its production |
US6096469A (en) * | 1999-05-18 | 2000-08-01 | 3M Innovative Properties Company | Ink receptor media suitable for inkjet printing |
US6569908B2 (en) * | 2000-01-19 | 2003-05-27 | Oji Paper Co., Ltd. | Dispersion of silica particle agglomerates and process for producing the same |
US6808768B2 (en) * | 2000-06-26 | 2004-10-26 | Asani Kasei Kabushiki Kaisha | Porous, fine inorganic particles |
US6630212B2 (en) * | 2001-01-26 | 2003-10-07 | Eastman Kodak Company | Ink jet recording element |
US6689430B2 (en) * | 2001-08-31 | 2004-02-10 | Eastman Kodak Company | Ink jet recording element |
-
2001
- 2001-06-26 US US10/312,820 patent/US6808768B2/en not_active Expired - Fee Related
- 2001-06-26 WO PCT/JP2001/005465 patent/WO2002000550A1/en active IP Right Grant
- 2001-06-26 GB GB0230147A patent/GB2382813B/en not_active Expired - Fee Related
- 2001-06-26 DE DE2001196393 patent/DE10196393T1/en not_active Ceased
- 2001-06-26 KR KR10-2002-7017644A patent/KR100532833B1/en not_active IP Right Cessation
- 2001-06-26 AU AU2001266332A patent/AU2001266332A1/en not_active Abandoned
- 2001-06-26 CN CNB01811511XA patent/CN1307095C/en not_active Expired - Fee Related
- 2001-06-26 TW TW90115418A patent/TW583139B/en not_active IP Right Cessation
-
2004
- 2004-09-10 US US10/937,475 patent/US20050031896A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20030143345A1 (en) | 2003-07-31 |
US20050031896A1 (en) | 2005-02-10 |
KR20030036243A (en) | 2003-05-09 |
DE10196393T1 (en) | 2003-05-15 |
CN1437563A (en) | 2003-08-20 |
WO2002000550A1 (en) | 2002-01-03 |
KR100532833B1 (en) | 2005-12-01 |
GB0230147D0 (en) | 2003-02-05 |
US6808768B2 (en) | 2004-10-26 |
TW583139B (en) | 2004-04-11 |
GB2382813A (en) | 2003-06-11 |
GB2382813B (en) | 2004-07-14 |
CN1307095C (en) | 2007-03-28 |
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