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Application filed by Samsung Display Devices Co LtdfiledCriticalSamsung Display Devices Co Ltd
Publication of MY132992ApublicationCriticalpatent/MY132992A/en
A PHOTOLITHOGRAPHY METHOD INCLUDES THE STEPS OF (A) FORMING A FILM BY COATING A FILM FORMING COMPOSITION HAVING A BONDING RESIN AND A FILM FORMING MATERIAL ON A SUBSTRATE AND DRYING THE RESULTANT; (B) SELECTIVELY COATING A PHOTOSENSITIVE COMPOSITION COMPRISING A PHOTOSENSITIZER ONLY ON A PREDETERMINED PORTION OF THE FILM, ACCORDING TO A DESIRED FILM PATTERN; (C) EXPOSING THE RESULTANT OBTAINED IN STEP (B); AND (D) FORMING A DESIRED FILM PATTERN BY DEVELOPING THE EXPOSED RESULTANT. THEREFORE, A FILM PATTERN HAVING EXCELLENT FILM CHARACTERISTICS CAN BE MANUFACTURED EASILY AND EFFICIENTLY. THE PHOTOLITHOGRAPHY METHOD CAN BE APPLIED TO ANY PRODUCT WHICH REQUIRES THE FORMATION OF A FILM PATTERN, FOR EXAMPLE, A VFD, CRT, FED OR PDP.
Photosensitive element, photosensitive element roll, process for producing resist pattern with the same, resist pattern, substrate with overlying resist pattern, process for producing wiring pattern, and wiring pattern