MY129185A - Method of manufacturing cerium-based polishing agent - Google Patents

Method of manufacturing cerium-based polishing agent

Info

Publication number
MY129185A
MY129185A MYPI20021762A MYPI20021762A MY129185A MY 129185 A MY129185 A MY 129185A MY PI20021762 A MYPI20021762 A MY PI20021762A MY PI20021762 A MYPI20021762 A MY PI20021762A MY 129185 A MY129185 A MY 129185A
Authority
MY
Malaysia
Prior art keywords
cerium
raw material
rare earth
manufacturing
polishing agent
Prior art date
Application number
MYPI20021762A
Other languages
English (en)
Inventor
Terunori Ito
Hiroyuki Watanabe
Kazuya Ushiyama
Shigeru Kuwabara
Yoshitsugu Uchino
Original Assignee
Mitsui Mining & Smelting Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining & Smelting Co filed Critical Mitsui Mining & Smelting Co
Publication of MY129185A publication Critical patent/MY129185A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/235—Cerium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C09K3/1418—Abrasive particles per se obtained by division of a mass agglomerated by sintering
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
MYPI20021762A 2001-05-29 2002-05-15 Method of manufacturing cerium-based polishing agent MY129185A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001160644A JP4002740B2 (ja) 2001-05-29 2001-05-29 セリウム系研摩材の製造方法

Publications (1)

Publication Number Publication Date
MY129185A true MY129185A (en) 2007-03-30

Family

ID=19004023

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20021762A MY129185A (en) 2001-05-29 2002-05-15 Method of manufacturing cerium-based polishing agent

Country Status (8)

Country Link
US (1) US6905527B2 (OSRAM)
EP (1) EP1391494A1 (OSRAM)
JP (1) JP4002740B2 (OSRAM)
KR (1) KR100509267B1 (OSRAM)
CN (1) CN1239666C (OSRAM)
MY (1) MY129185A (OSRAM)
TW (1) TWI293981B (OSRAM)
WO (1) WO2002097004A1 (OSRAM)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6863825B2 (en) 2003-01-29 2005-03-08 Union Oil Company Of California Process for removing arsenic from aqueous streams
WO2006025614A1 (en) * 2004-09-03 2006-03-09 Showa Denko K.K. Mixed rare earth oxide, mixed rare earth fluoride, cerium-based abrasive using the materials and production processes thereof
JP2006206870A (ja) * 2004-12-28 2006-08-10 Mitsui Mining & Smelting Co Ltd セリウム系研摩材用原料及びセリウム系研摩材用原料の製造方法、並びに、セリウム系研摩材及びセリウム系研摩材の製造方法
US8361419B2 (en) 2005-09-20 2013-01-29 Lg Chem, Ltd. Cerium carbonate powder, method for preparing the same, cerium oxide powder made therefrom, method for preparing the same, and CMP slurry comprising the same
CN101268017A (zh) 2005-09-20 2008-09-17 Lg化学株式会社 碳酸铈粉末及其制备方法、由该碳酸铈粉末制备的氧化铈粉末及其制备方法以及含该氧化铈粉末的cmp浆料
KR101450865B1 (ko) * 2006-10-24 2014-10-14 동우 화인켐 주식회사 디스플레이용 유리패널의 연마를 위한 폐연마재의 재생방법
US8066874B2 (en) 2006-12-28 2011-11-29 Molycorp Minerals, Llc Apparatus for treating a flow of an aqueous solution containing arsenic
WO2008114965A1 (en) 2007-03-16 2008-09-25 Lg Chem, Ltd. Method for preparing cerium carbonate powder using urea
WO2008114972A1 (en) * 2007-03-16 2008-09-25 Lg Chem, Ltd. Method for preparing cerium carbonate powder
US8252087B2 (en) 2007-10-31 2012-08-28 Molycorp Minerals, Llc Process and apparatus for treating a gas containing a contaminant
US8349764B2 (en) 2007-10-31 2013-01-08 Molycorp Minerals, Llc Composition for treating a fluid
US9233863B2 (en) 2011-04-13 2016-01-12 Molycorp Minerals, Llc Rare earth removal of hydrated and hydroxyl species
CN103923602A (zh) * 2013-01-15 2014-07-16 安阳市岷山有色金属有限责任公司 一种铈系研磨材料的制造方法
KR20160132076A (ko) 2014-03-07 2016-11-16 몰리코프 미네랄스, 엘엘씨 비소 제거 특성이 뛰어난 세륨(iv) 산화물
CN104387989B (zh) * 2014-11-04 2016-08-24 南昌大学 高密度碳酸稀土高温爆裂法制备超细高铈稀土抛光粉的方法
JP6839767B2 (ja) * 2017-09-11 2021-03-10 昭和電工株式会社 セリウム系研磨材用原料の製造方法、及びセリウム系研磨材の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08267355A (ja) 1995-04-03 1996-10-15 Fujimi Inkooporeetetsudo:Kk 研磨剤微粉末の製造方法
JP2991952B2 (ja) 1995-07-31 1999-12-20 多木化学株式会社 酸化第二セリウム及びその製造方法
KR100775228B1 (ko) * 1996-09-30 2007-11-12 히다치 가세고교 가부시끼가이샤 산화세륨 연마제 및 기판의 연마법
US5759917A (en) * 1996-12-30 1998-06-02 Cabot Corporation Composition for oxide CMP
JPH11181404A (ja) 1997-12-18 1999-07-06 Hitachi Chem Co Ltd 酸化セリウム研磨剤および基板の研磨法
WO2000039843A1 (en) * 1998-12-25 2000-07-06 Hitachi Chemical Company, Ltd. Cmp abrasive, liquid additive for cmp abrasive and method for polishing substrate
US6428392B1 (en) * 1999-03-23 2002-08-06 Seimi Chemical Co., Ltd. Abrasive
JP2001035818A (ja) 1999-07-16 2001-02-09 Seimi Chem Co Ltd 半導体用研磨剤
JP3960914B2 (ja) * 2000-10-02 2007-08-15 三井金属鉱業株式会社 セリウム系研摩材及びセリウム系研摩材の製造方法
WO2002044300A2 (en) * 2000-11-30 2002-06-06 Showa Denko K.K. Cerium-based abrasive and production process thereof

Also Published As

Publication number Publication date
KR20030093193A (ko) 2003-12-06
KR100509267B1 (ko) 2005-08-18
EP1391494A1 (en) 2004-02-25
JP4002740B2 (ja) 2007-11-07
WO2002097004A1 (fr) 2002-12-05
US6905527B2 (en) 2005-06-14
CN1489625A (zh) 2004-04-14
US20040219791A1 (en) 2004-11-04
CN1239666C (zh) 2006-02-01
TWI293981B (OSRAM) 2008-03-01
JP2002348563A (ja) 2002-12-04

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