MXPA98007932A - Process to manufacture a disc stamp for the storage of opti data - Google Patents

Abstract

A process for making a disk stacker for the storage of optical data is disclosed, which includes the steps of providing an anelectrolyte amorphous nickel substrate that includes phosphorus in an amount within the range of 15 weight percent, which has a tenacity of about 100 Mpa / m, a roughness in the range of about 1 to 50 nm flatness of about 6 pm, and depositing a negative photoresist (photoresist) polymer on the surface of the substrate. The substrate has a diameter greater than 120mm and a thickness greater than approximately 300μm. The negative photocurable polymer is then exposed to a laser to form a negative pattern of the data therein. The photocurable polymer is developed and the ceramic substrate is ionically machined to form the data pattern on the substrate, so as to form a spiral track of reliefs and plateau, where each relief has a width of less than about 150 nm. After the data pattern has been machined ionically into the substrate, the developed photocurable polymer is removed from the substrate.

Description

PROCESS TO MANUFACTURE A DISC PRINTER FOR THE STORAGE OF OPTICAL DATA FIELD OF THE INVENTION The present invention relates to processes for manufacturing a disc stamper for storing optical data from an amorphous and ionically machinable metal substrate, and more particularly, to processes for copying or replicating discs for storing data opticians using said stampers. The invention also relates to stampers manufactured by these processes and to the replicated discs using these stampers.

TECHNICAL BACKGROUND Discs for the storage of optical data are widely used, for example, as audio and video discs, for example, compact disks, and in computer systems, as part of compact disc memory devices only. reading for storage and data recovery. A disc for the storage of optical data may contain digital data in a spiral track of binary codes. These binary codes are formed on the disk as data patterns of small pits and plateaus.

P16 0 / 98MX Figure 1 depicts an enlarged portion of a spiral track 1 of a compact disc (not shown) showing a sequence of trenches and plateaus Ib. On an audio disc, for example, the pits and plateaus on track 1 represent various types of binary codes, such as the right and left stereo sound codes and codes that control the speed of the disk reader's motor and provide the synchrony. Disc readers are well known for decoding tracks. For example, an optical data storage disc reader can rotate a disk with a diameter of approximately 125 mm at a reproduction speed of approximately 500 revolutions per minute at the center of the disk, at which the track begins, and approximately at 200 revolutions per minute at the end of the track near the outer edge of the disc. However, the linear velocity of the disc remains substantially constant, as it passes over an optical reading device that decodes the track. These optical reading devices may include a configuration of mirrors and lenses, which direct a beam of light, such as a laser beam, towards the spiral track. As the disk rotates, the directed beam can move outward from the center of the disk towards the edge of the disk through the rotating track. When the beam is directed to a portion of P1620 / 98MX track plateau, is reflected, creating a light signal, and a photosensitive switch, such as a photosensitive diode can be used to convert this reflected light signal into an electrical signal. However, when the beam enters, a pit or pit on the track, it is not reflected and the electrical signal is not produced. A conventional process for manufacturing a disc stamper for optical data storage is described in U.S. Patent No. 5,096,563 to Yoshiza et al., Which is incorporated herein by reference. Figures 2a-g are a schematic of the cross-sectional illustrations showing the steps of a conventional process for manufacturing a disc stamper for optical data storage. In this conventional process, a photocurable polymer master disk includes a layer 3 of photocurable polymer deposited on the main surface of a glass substrate 2, such as a glass plate of soda and lime, as shown in the Figure 2a. Soda and lime glass is made by melting sand with sodium carbonate or sodium sulfate and lime or limestone. A laser beam La, which flashes in accordance with a "digital signal, exposes a layer 3 of photocurable polymer to helically or concentrically form a data pattern 6 consisting of a latent image of P1620 / 98MX a track of zones, for example, places of trenches. Either a positive or a negative photoresist polymer can be used. When a positive photocurable polymer is used, the areas exposed to light are removed by the development process. Conversely, when a negative photocurable polymer is used, areas not exposed to light are removed by the development process. The exposed photocurable polymer master disc is then developed to create a track of small pits 3a corresponding to a digital signal that will be recorded on the master photocurable polymer disk, thus producing a developed master disk, having a layer 3 of photocurable polymer bite carrier and a glass substrate 2, as shown in Figure 2b. The layer 3 of the photocurable polymer of the developed master disk is then dried and fixed on the glass substrate 2 to produce a dry master disk, as shown in Figure 2c. A conductive metal, such as silver or nickel, can be deposited by sputtering or applied by wet metallization to the layer 3 of photo-hardenable polymer to form a conductive film 4, which makes the surface of the developed master disc conductive and that creates a 4a teacher-training disc, which has a structure of P1S20 / 98MX multilayer or multilayer, as shown in Figure 2d. The conductive film 4 can have a thickness of only a few molecules. The master forming disk 4a can then be immersed in a nickel electroforming tank to electrodeposite a conductive nickel film 4. As a result, a nickel layer 5 is formed, i.e., a nickel stamper, as shown in Figure 2e. The nickel stamper 5 has a series of reliefs 5a, each of which may be continuous or discrete and may correspond to one of the pits 3a created in the layer 3 of photocurable polymer. The nickel layer or stamp 5 is separated from the glass substrate 2, as shown in Figure 2f, to create a negative or negative matrix of the spiral track matrix that will be duplicated on the optical data storage disk. Because the nickel stamper 5 is extremely delicate, the stamper 5 can be removed from the glass substrate 2 by hand. The layer 3 of photocurable polymer (and the conductive film 4) can then be removed from the stamper 5, producing a nickel stamper 5 with a mold surface 6 'which bears a negative image of the data pattern 6, as shown in the Figure 2 g. However, if the conductive film 4 is formed of nickel, it can be left in place and can simply become part of the P1620 / 98MX stamper 5. After layer 3 of photocurable polymer (and conductive film 4) has been removed from stamper 5, stamper 5 is rinsed and a coating of protective lacquer (not shown) can be applied to the surface of the negative matrix. ). The lacquer coating can then be cured and the surface of the stamper 5 opposite the negative matrix can be polished to remove any imperfections caused during nickel electrodeposition. After the stamper 5 has been lacquered and polished, a hole can be punched in the center of the stamper 5, in order to fix it to an injection molding apparatus. The punching of the hole in the stamper 5 can, however, create tensions in the nickel and cause imperfections in the spiral track. These stresses are unavoidable and the nickel stamping 5 is then fixed in a mold of the injection molding apparatus. After the injection mold is closed, a thermoplastic resin, such as fluid polymethyl methacrylate, polycarbonate, acrylic resin, epoxy resin, unsaturated polyester resin or the like, is injected into the mold, filling with resin the track formed in the stamper 5. After the resin has hardened, it is separated from the stamper 5 by providing a replica of the optical data storage disk, which has a P1620 / 98MX face on which the binary code described by the data pattern is recorded. A reflective material, such as aluminum or gold, including aluminum and gold alloys, can be applied to the face of the data pattern of the replicas produced in this manner. Additionally, a protective lacquer film covers the reflecting material, forming an optical disc. Two replicas of the optical data storage disk can be formed in this way, joined and subjected to a finishing process to produce a double-sided optical data storage disk. The electroforming of a nickel stamper in conventional processes is a relatively time-consuming process. In addition, due to the delicate procedures associated with the passage of electroforming, the current processes have not been fully automated. The manufacture of a conventional nickel stamper may require as much as approximately 180 minutes. The additional time required to manufacture a stamper 5 through conventional processes makes these processes inefficient for replicating newly disclosed optical data storage discs, which may involve the production quantities of a variety of audio / visual software types be small In addition, P1620 / 98MX current electroforming processes employ toxic chemical compounds and require the disposal of hazardous materials, including solutions containing heavy metals, for example, nickel. The lacquering process used as part of the finishing process can also produce significant quantities of toxic fumes and hazardous materials. As mentioned above, conventional stampers manufactured from an electroformed nickel layer are delicate and have a limited life. Repeated handling of conventional stampers can result in deformation or other damage. In addition, disc finishing procedures, for example, lacquering, polishing and punching the hole, may result in uneven or non-uniform application of the lacquer and imperfection or damage to the spiral tracks, due to hole punching or polishing. . Stampers that suffer from these manufacturing imperfections or damages are discarded, and the manufacturing process is repeated to create new stampers. Finally, because electroformed nickel is susceptible to oxidation or pitting, due, for example, to the presence of alkali in the glass substrate, when stored, nickel stampers are monitored very closely to detect these signs of deterioration. . These stampers P1620 / 98 X deteriorated may be unusable. Therefore, stampers that exhibit oxidation or pitting or other physical damage are also discarded and new stampers are manufactured to replace them. In addition, nickel stampers can cause macules on disc replicas. The discs that exhibit these macules have little or no commercial value and are discarded, and therefore, these macules reduce the performance of the replication processes.

SUMMARY OF THE INVENTION Thus, the need arises for a process for manufacturing a disc stamper for optical data storage that does not require electroforming, for example, nickel electroforming of the step or lacquering process and eliminates the associated chemical waste. with the step of electroforming and with the lacquering process. Furthermore, a need has arisen for a process for manufacturing a disc stamper for optical data storage, which achieves a reduction in manufacturing time and, in particular, that achieves a reduction in the machining time of the stamper. In addition, a need has arisen for a process to manufacture these disc stampers, which can be completely automated. In addition, the P1620 / 98MX need a process to manufacture such disc stampers, which produces a durable stamper, which has a lower tendency to deformation or to other damages during use or deterioration during storage than stampers produced by conventional processes. One embodiment of this invention is a process for manufacturing a disc stamper for storing optical data for use in the replication or reproduction of compact discs. The process comprises the steps of providing an ionically machinable ceramic substrate, such as, chemically deposited silicon carbide with steam (CVDSiC), having a toughness of at least about 1 MPaV m and depositing a layer of photocurable polymer on a surface of the substrate. The photocurable polymer is exposed to a source of electromagnetic energy, such as a laser, to form a data pattern in the photocurable polymer. After exposure, the photocurable polymer is developed to form a data pattern mask. The data pattern is then machined in such a way that a spiral track of at least one relief and at least one plateau is formed in the substrate. Suitable substrates that can be ionically machined can be machined without increasing P1620 / 98MX the surface roughness (Ra). After the substrate has been ionically machined, the developed photocurable polymer can be removed from the substrate. In another embodiment of this invention, a process for manufacturing a disc stamper for storing optical data comprises the steps of providing an ionically machinable ionic substrate having a tenacity of at least about 1 MPa m, depositing a first layer of glass on a surface of the substrate and depositing a second layer of photocurable polymer on the first glass layer. The photocurable polymer is then exposed to a source of electromagnetic energy to form a data pattern in the photocurable polymer. After exposure, the photocurable polymer is developed to form a mask of the data pattern in the first layer. The data pattern is etched or etched, for example, it is etched using an acid, such as hydrofluoric acid, in the first layer to form a glass mask on the substrate. The data pattern is then machined in such a way that a spiral track of at least one relief and at least one plateau is formed in the substrate. After the substrate has been ionically machined, the photocurable polymer developed and the glass mask can be P1S20 / 98MX removed from the substrate. The present invention provides various technical advantages over known optical data storage disk stampers. A technical advantage of this invention is that the disc stamper is manufactured from a ceramic substrate. This allows the stamper to withstand high injection molding temperatures without undergoing deformation. In addition, the ceramic presents a smooth surface that can be easily polished. The ceramic is also tenacious and, unlike the fragile soda and lime glass substrates, such as those currently used as templates on which the electroformed stampers are formed, the ceramic substrates do not break, crack or crack easily, with a slight flexion or deformation. Finally, ceramic materials can be easily machined using an ion beam, for example, recorded by exposure to a neutral ion bombardment. It is an additional technical advantage of this process that the substrates can be fixed directly to an injection molding apparatus as stampers. These ceramic substrates are durable and can withstand the stresses and shocks of the discs for optical data storage replicators with less deformation and damage and with lower failure rates than conventional stampers.

P1620 / 98MX Another technical advantage of this invention is that due to the passage of the electroforming and to the manual procedures, for example, the elimination of the nickel stamp from the substrate and the lacquering of the stamp, associated with the finishing of an electroformed stamp, are eliminated; The time and cost associated with the manufacture of stampers are reduced by the process of this invention. For example, the manufacture of stampers, in accordance with a process of this invention, may require no more than 90 minutes. This allows greater flexibility during the manufacture of discs for optical data storage and, consequently, shorter production cycle times to prepare new discs for the market. In addition, because the stampers produced in accordance with the process of this invention have longer lives, fewer stampers may be required to manufacture the disks, and the data may be stored economically and safely for longer periods. In addition, these improved embossers increase the efficiency of the injection molding apparatus by decreasing the time spent replacing damaged, deformed or damaged embossers. Finally, another additional technical advantage of these processes is that, because the data pattern is ionically machined P1620 / 98MX directly into the ceramic substrate to create the stamper, the fixing hole can be formed, for example, by punching through the substrate, before it is machined ionically. In this way, the formation of the fixing hole does not create tensions in the spiral track. Despite the disadvantages of CD stamping manufacturing processes using electroformed metals, which were described above, metals such as nickel, are generally tough enough to withstand approximately 30 tons of force. that stampers are subjected in the processes of injection molding; Metallic substrates are economical for mass production with respect to many suitable ceramic substrates; and, metal substrates have desirable thermal properties for use in injection molding processes. For example, relatively brittle metals have a tenacity of at least about 10 MPaV m, and the electroformed nickel can have a toughness of about 50 MPa m. However, metals are generally polycrystalline and are not ionically machinable. In their natural solid forms, metals have different grain orientations, which erode at different rates or speeds in P1620 / 98MX response to a uniform ion beam. These variable rates of erosion result in the formation of a rough surface during the ion machining. However, certain metals, such as nickel by sputtering or anelectrolytic nickel containing a sufficient amount of an additive to promote the formation of a smooth, amorphous structure, for example, phosphorus in an amount of about 5 to 15 percent in weight, they are amorphous. If metals, such as anelectrolytic nickel, are amorphous, they can be machined ionically without increasing surface roughness. Amorphous nickel can be an especially desirable substrate material, because the electroformed polycrystalline nickel is a common stamping material used in the manufacturing processes of disc stampers for optical data storage and, nickel is a material with which the Stamper manufacturers are familiar in general. However, amorphous metal substrates are used in new stamping manufacturing processes, for example, a process that uses ionic machining. Amorphous nickel has a different microstructure from, for example, the electroformed nickel used in the previous manufacturing processes. One embodiment of this invention is a process P1620 / 98MX for manufacturing a disc stamper for optical data storage for use in the replication or copying of compact discs. The process comprises the steps of providing an ionically machinable amorphous metal substrate, such as, anelectrolytic nickel including phosphorus in a range of about 5 to 10% by weight, having a tenacity of at least about 10 MPav m, for example, approximately 100 MPaV m, for amorphous anelectrolytic nickel; and, deposit a layer of photocurable polymer on the surface of the substrate. The photocurable polymer is exposed to a source of electromagnetic energy, such as a laser, to form a data pattern in a photocurable polymer. After exposure, the photocurable polymer is developed to form a data pattern mask. The data pattern is then ionically machined, such that a spiral track of at least one ledge and at least one plateau is formed in the substrate. Suitable ionically machinable substrates can be machined without increasing the surface roughness (Ra). After the substrate has been ionically machined, the developed photocurable polymer can be removed from the substrate. The amorphous metal can be selected from the group consisting of gold, nickel and copper or the like. In P1620 / 98MX in particular, the substrate may be anelectrolytic nickel that includes phosphorus in a range of about 5 to 15 weight percent or ionically bombarded nickel. In addition, the substrate can include a base substrate with a catalytically active surface and an amorphous metal film. The base substrate does not need to have an amorphous structure and can be manufactured from a metal selected from aluminum, nickel and copper or the like; and, the amorphous metal film can also be made of gold, nickel and copper or the like. As noted above with respect to anelectrolyte nickel, the material of the amorphous film may also include an element or a compound that promotes the formation of a smooth, amorphous film. In addition, the amorphous metal film can have a thickness in the range of about 200 to 1000 nm. The photocurable polymer can be a photocurable polymer of ionically bombarded oxide or a photocurable polymer of negative tone or the like. In addition, the electromagnetic energy source used to expose the photocurable polymer may be a laser, and the step of exposing the photocurable polymer may include the use of a computer to direct the source of electromagnetic energy. In another embodiment of the invention, a process for manufacturing a disk for data storage Optical P1620 / 98MX comprises the step of manufacturing a negative disc stamper for storing optical data from an amorphous metal substrate by the process described above. In addition, the process may comprise the steps of, fixing the disk stamper for storing optical data in a mold; injecting a thermoplastic resin into the mold to form a positive disc replica of the stamper; and, remove the replica from the mold. The replica can then be coated with a reflective material to obtain a reflective surface on the disc. The reflector material may be a metal selected from the group consisting of aluminum and gold. In another embodiment of this invention, a process for manufacturing a disc stamper for optical data storage comprises the steps of providing an ionically machinable amorphous substrate having a tenacity of at least about 10.

MPa m, for example, approximately 100 MPa \ m for amorphous anelectrolytic nickel, depositing a first glass layer on a surface of the substrate, and depositing a second layer of photocurable polymer on the first glass layer. The photocurable polymer is then exposed to a source of electromagnetic energy to form a data pattern in the photocurable polymer. After exposure, the photocurable polymer is P1620 / 98MX reveals to form a mask of the data pattern on the first layer. The data pattern is etched or etched, using, for example, an acid, such as hydrofluoric acid, in the first layer to form a glass mask on the substrate. The data pattern is then machined in such a way that a spiral track of at least one relief and at least one plateau is formed in the substrate. After the substrate has been ionically machined, the developed photocurable polymer and the glass mask can be removed from the substrate. In a further embodiment of the invention, a process for manufacturing a disc for storing optical data may comprise the steps of manufacturing a negative stamping disc for optical data storage from an amorphous metal substrate by the process described above, in a first layer of glass is deposited on a surface of the substrate and a second layer of photocurable polymer is deposited on the first layer. The process further comprises the steps of fixing the stamper for optical data storage discs in a mold; injecting a thermoplastic resin into the mold to form a positive replica of the stamper; and, remove the replica from the mold. The amorphous metallic substrate can already comprise P1620 / 98MX is a monolithic structure or, either an amorphous metal film on a base substrate. A substrate that includes an amorphous metal film on a base substrate may be less expensive to manufacture than a monolithic structure. The substrate may have an outer diameter greater than about 120 mm, and preferably, an outer diameter in a range of about 120 to 160 mm. This diameter can be obtained by punching the amorphous metal substrate from a larger substrate diameter either before or after the ion machining. Similarly, the substrate may have an internal diameter in a range of about 15 to 36 mm. This diameter can be obtained by punching a center of a larger diameter of substrate before or after the ionic machining. The surface roughness on the face of the substrate subjected to the ionic machining may be in the range of about 1 to 50 mm Ra, and the substrate may have a thickness greater than or equal to 300 μm. A photocurable polymer can mask portions of the substrate that will be stings or plateaus on the mirrored optical data storage disks. Those areas that will be masked may be approximately 0.6 μm wide and, in a range of approximately 0.8 to 3.5 μm long for regular optical data storage disks, and these P1620 / 98MX dimensions can be smaller by up to half for high-density optical data storage disks. As indicated above, the photocurable polymer may be a photocurable polymer of ionically bombarded oxide or a negative or similar toned photoresist polymer. The masked substrate can then be placed in a vacuum chamber, below an ion beam gun with a larger diameter than the substrate. Alternatively, a smaller ion source can be cross-linked through the surface of the substrate. The substrate can be machined for a period determined by the size and intensity of the ion beam, for example, about 10 minutes, to obtain the desired characteristic depth in the stamper, for example, less than about 150 nm. In addition, for the high density optical data storage disks, the desired characteristic depth in the stamper may be less than about 100 nm. Other objectives, advantages and particularities will be evident when considering the detailed description of the invention and the drawings.

BRIEF DESCRIPTION OF THE DRAWINGS For a more complete understanding of the present invention and the technical advantages thereof, it will be P1620 / 98MX reference to the following description taken in conjunction with the accompanying drawings, in which: Figure 1 depicts an enlarged portion of a spiral track of a compact disk showing the pattern of data from pits or trenches and plateaus. Figures 2a-g constitute a schematic of cross-sectional illustrations showing the steps of a conventional process for manufacturing a disc stamper for optical data storage. Figures 3a-f are a diagram of cross-sectional illustrations showing the steps of one embodiment of the process of the present invention. Figure 4 is a flow chart depicting the steps of the embodiment of Figures 3a-f. Figures 5a-i are a schematic of the cross-sectional illustrations showing the steps of another embodiment of the process of the present invention. Figure 6 is a flow chart depicting the steps of the embodiment of Figures 5a-i. Figure 7 is a flowchart representing the steps of a process of the invention using a stamp produced in accordance with a process described in Figure 4 or 6, to replicate a disk for storage of optical data. Figures 8a-f are a schematic of the P1620 / 98MX illustrations in cross section showing the steps of one embodiment of the process of the present invention. Figure 9 is a flowchart representing the steps of the process including those of a process in accordance with the embodiment of Figures 8a-f.

DETAILED DESCRIPTION OF THE INVENTION Figures 3a-f are diagrams of the cross-sectional illustrations showing the steps of one embodiment of the process of the present invention. Figure 3a depicts a ceramic substrate 32 with a substrate surface 32a. These substrates may have a diameter greater than about 120 mm and a thickness greater than about 1 mm. A ceramic material is one of a diverse group of non-metallic inorganic solids. Although traditional ceramic materials may be crystalline or vitreous, ie, amorphous, only ionically machinable ceramic substrates with a tenacity of at least about 1 MPav m are suitable for the processes of this invention. In general, crystalline ceramic materials with a tenacity greater than about 2 MPav m, have a high resistance to bending and are resistant to impact, which makes them especially well suited for use P1620 / 98MX as part of an injection molding machine. Suitable ceramic substrates 32 are characterized by the ability to repeatedly withstand the high temperatures associated with the injection molding of thermoplastic resins.; by a smooth polishable surface; by a sufficient tenacity to withstand the pressures of the injection molding and the concentration of stresses created between the tiny reliefs during the cooling of the thermoplastic resin; and, for the ability to be ionically machined or ionic machinability. For example, ceramic substrates 32 are capable of withstanding temperatures in a range of about 250 to 340 ° C, which are associated with polycarbonate injection molding. In addition, the ceramic substrates 32 are able to repeatedly withstand the pronounced temperature gradients caused by injection molding. The surface of the ceramic substrates 32 have a surface roughness or can be polished to a surface roughness (Ra) of about 1 nm and a flatness of about 6 μm. In addition, when fixed in the injection molding apparatus, these smooth surfaces form smooth and reflecting plateaus (not shown). These plateaus easily reflect electromagnetic energy, for example, light beams or laser beams.

P1620 / 98MX Glass and some ceramics are characterized by their fragility, which causes them to break, crack or break when flexed or slightly deformed. Suitable ceramic substrates 32, however, are tough, for example, have a tenacity of at least about 1 MPaV m and have sufficient stiffness to maintain a pattern of ionically machined data without deformation under injection molding pressures. At the same time, they have enough flexibility to avoid faults at pressures of injection molding. These ceramic substrates can be repeatedly subjected to pressures in a range of about 70 to 140 MPa in an injection molding apparatus. Suitable ceramic substrates are also characterized by their ability to be ionically machined. The ionic machining is effected by bombarding the substrate surface 32a with a neutral ion beam, whereby the substantially vertical walls can be cut into the ceramic substrate 32. Ceramic materials with suitable ionic machining properties include silicon, canasite, carbide silicon, including CVDSiC, vitreous or amorphous carbon and the like. Although glass, such as for example soda and lime glass, is ionically machinable, as can be seen from P1620 / 98MX the representative tenacity values in the following table, this glass is not sufficiently tenacious to withstand injection molding pressures.

TABLE I Glass Carbide Nickel of Sosa Carbon of Amorphous and Cal Vitreo Silici Canasita Silicon Anelectro or lithic Tenacity 0.7-0.8 1 MPaV 1.8 4 MPaV m 4.5 -100 (MPaV m) MPaV m m MPaV m MPaV m MPaV m Referring to Figure 3b, a layer of photocurable polymer 33 is deposited on the surface 32a of the ceramic substrate 32. The layer 33 of photocurable polymer is applied to a uniform depth through the surface 32a. For example, the layer 33 of photocurable polymer can have a thickness in the range of about 0.1 to 2 μm. This can be applied as a dry laminated film or as a liquid that is applied by twisting or spraying to the surface 32a. A positive or negative photocurable polymer can be used. As discussed above, when a positive photocurable polymer is used, the areas exposed to light are removed by the developing process. Inversely, P1620 / 98MX When a negative photoresist polymer is used, areas not exposed to light are removed by the development process. Alternatively, the substrate 32 can be an amorphous, ionically machinable metal substrate, such that it can be prepared from amorphous anelectrolytic nickel, which includes phosphorus in a range of about 5 to 15 weight percent, and preferably in a range of about 9 to 15 percent by weight. Generally, suitable amorphous metals have tenacities of at least about 10 MPaV m. For example, amorphous anelectrolytic nickel has a toughness of about 100 MPaV m, which makes it well adapted for use in an injection molding apparatus. In this way, suitable amorphous metal substrates also have the ability to repeatedly withstand the high temperatures associated with the injection molding of thermoplastic resins; a smooth polishable surface; and a sufficient tenacity to withstand injection molding pressures and the concentration of stresses created between the tiny reliefs during the cooling of the thermoplastic resin; and ease of ionic machining or ionic machinability. In addition, like the ceramic substrates described above, amorphous metal substrates can withstand high temperatures and P1620 / 98MX pronounced temperature gradients associated with injection molding. As illustrated in Figure 3c, an electromagnetic energy source can be used, such as a laser or other source of intense and coherent light, to expose the photocurable polymer 33 to form a data pattern 34. As the laser sweeps or traverses the photocurable polymer 33, the substrate 32 can be rotated to exposing the data pattern 34 spirally on the photocurable polymer 33. In addition, the size of the area produced by the laser The on the surface of the photocurable polymer 33, the speed of the revolutions of the substrate 32 and the speed of scanning or scanning The laser can also be varied to match the data pattern 34. The laser can also be modulated in intensity to produce a series of reliefs (not shown). In general, the data pattern 34 forms a spiral track of at least one relief and at least one plateau in the photocurable polymer 33. Alternatively, if the intensity of the laser La is maintained at a constant level, the data pattern 34 It can produce a single relief. A recordable optical data storage disc may have a single continuous spiral groove produced from a P1620 / 98MX stamper that has a data pattern 34 that includes a single continuous spiral relief. The groove of this disc is at least partially filled with a recording medium, such as a photocurable resin or ink. If a photocurable resin or ink is used, a light source, such as a laser beam, can be used to produce a data pattern in the resin or ink. Referring to Figure 3d, the photocurable polymer 33 is then revealed to reveal the data pattern 34 on its surface. Regardless of whether the photocurable polymer 33 is a positive or negative photocurable polymer, the photocurable polymer 33 'developed remains on the surface 32a of the substrate 32 identifying the locations of the at least one relief (not shown). In this way, the laser control is governed by the type of photocurable polymer 33 deposited on the substrate 32. As shown in Figure 3e, the substrate 32 is ionically machined to form at least one relief 32b. The upper surface of the relief 32b is the surface 32a of the substrate. The ionic machining cuts the substrate 32 at a vertical depth, i.e. the height of the relief, in a range of about 20 to 200 nm, for example, in a range of about 100.

P1620 / 98MX at 150 nm. As discussed above, when ionically machined, the substrate 32 can be bombarded with a neutral ion beam and / or. The photocurable polymer 33 'developed, forms a mask by which the machining of the reliefs 32b is controlled. Once the desired height for each of the shoulders 32b is obtained, the remainder of the developed photocurable polymer 33 'is removed to produce a stamper 35, as shown in Figure 3f. Figure 4 is a flow diagram showing the steps of a mode of conformity with Figures 3a-f. In step 40, a single-phase crystalline ceramic substrate is provided. A suitable single-phase ceramic substrate is the CVDSiC, which has a polycrystalline / single-phase structure. Most amorphous and single-crystal / single-phase ceramics are ionically machinable without increasing surface roughness. However, only selected polycrystalline ceramic materials are ionically machinable in a suitable manner. However, a single-phase substrate has superior ion-machining characteristics. These substrates can be easily machined to form substantially vertical wall surfaces. Alternatively, the substrate provided in step P1620 / 98MX 40 can be an ionically machinable amorphous metal substrate, such as can be manufactured from amorphous anelectrolytic nickel which includes phosphorus in a range of about 5 to 15 weight percent, and preferably, in a range of about 9 to 15 percent by weight. Suitable amorphous metals have tenacities of at least about 10 MPaV m. For example, amorphous anelectrolytic nickel has a toughness of about 100 MPaV m, which makes it well adapted for use in an injection molding apparatus. In this way, suitable amorphous metal substrates also have the ability to repeatedly withstand the high temperatures associated with the injection molding of thermoplastic resins; a smooth polishable surface; and, sufficient tenacity to withstand the pressures of injection molding and the stress concentration created between the tiny reliefs during the cooling of the thermoplastic resin; and ionic machinability. In addition, like the ceramic substrates described above, amorphous metal substrates can withstand the high temperatures and pronounced temperature gradients associated with injection molding. In step 41, a negative photocurable polymer is deposited on the surface of the substrate. When P1620 / 98MX is exposed to a laser, as indicated in step 42, the negative photocurable polymer reveals a series of zones corresponding to the reliefs of the spiral track. When disclosed in accordance with step 43, the uncured photocurable polymer dissolves, leaving only areas of the photocurable polymer developed by marking the reliefs. As indicated in step 44, by using the exposed photocurable polymer as a mask, the substrate is ionically machined to form a pattern of enhanced data including a spiral track of at least one relief and at least one plateau. The ionic machining can be achieved by bombarding the substrate with a stream of neutral ions, such as those of an inert gas, for example, argon. The depth of the ionic machining depends on the duration and intensity of the bombardment and the characteristics of the substrate. In addition, if the size of the ion beam is smaller than the surface of the substrate, the ion beam can be crosslinked in order to obtain a uniform machining. The ionic machining can be used as a precision process for the removal of material in the shaping of glass, ceramics and amorphous metal substrates. Ionic machining, which is different from the Reactive Ion Etching (RIE) process, employs a P1620 / 98MX plasma generating source or "gun" that ionizes the argon gas in an evacuated chamber. For example, while still in the gun, the ionized argon atoms can be accelerated in a direct current (DC) electric field through a grid-shaped opening. As the ions exit the gun at high speed, the collimated ion beam can be neutralized by an oblique beam of ions emerging from an adjacent source. This stream of argon atoms, now chemically and electrically neutral, impacts a target surface and bombards the surface molecules in an erosion process with fine control. The current densities of the beam can be in a range of about 1 to 2 mA / cm2, it can be accelerated by a potential of about 1000 volts. For many solids, this results in a bombardment rate of several tens of nanometers per minute. The process of the present invention allows the production of billions of lateral features with micrometric size with a high uniform quality on a single substrate by the wide beam ion machining through a photocurable polymer mask. Although both ceramic materials and amorphous metals can be ionically machined, the use of amorphous nickel as a substrate for the manufacture of P1620 / 98MX stampers have certain advantages over ceramic materials during a disc manufacturing process for optical data storage. Amorphous nickel substrates can be less expensive, both in material and manufacturing costs, than ceramic substrates. The amorphous nickel is more tenacious, for example, K. equal to about 100 MPaV m, even than the most tenacious ceramic materials, for example, Kc in a range of about 2 to 5 MPaV m. Therefore, although an amorphous nickel substrate can yield plastically before a ceramic substrate, amorphous nickel substrates can better withstand injection molding without a catastrophic fracture. In addition, metals, and especially nickel, are materials whose thermal, mechanical and handling properties are included in the stapler manufacturing industry. Although, as used in the present invention, the microstructure of the amorphous nickel substrate, its macroscopic properties are similar to those of the electroformed polycrystalline nickel. In addition, the ionic machining must be executed inside a vacuum chamber. In a vacuum chamber, the interference between the ion beam and the air molecules is eliminated. However, because the heat generated in the substrate by the ionic machining is not P1620 / 98MX easily dissipates within a vacuum chamber, the photoprurable polymer mask developed preferably is able to withstand temperatures in a range of about 30 to 80 ° C, so that the data pattern can be ionically machined into the substrate without cause simultaneous deterioration of the photocurable polymer mask. Referring to step 45, the developed photocurable polymer is then removed from the substrate to produce a stamper for optical data storage disks. Figures 5a-i are diagrams of the cross-sectional illustrations showing the steps of another embodiment of the process of the present invention. Figure 5a depicts a ceramic material or an amorphous metal substrate 52 with a substrate surface 52a. Referring to Figure 5b, a first glass layer 54, eg, fused silica, is deposited on the surface 52a of the ceramic substrate 52. The first glass layer 54 is uniformly deposited on the surface 52a of the substrate 52 to a thickness of the range of approximately 0.1 to 1 μm. As shown in Figure 5c, a second layer of photocurable polymer, e.g., negative photocurable polymer, is deposited on the first glass layer 54. A second layer of photocurable polymer 53 is also deposited P1620 / 98MX uniformly on the first glass layer 54. The thickness of the second layer of photocurable polymer 53 may be in a range of about 0.1 to 2 μm. As indicated in Figure 5d, a source of electromagnetic energy, such as a laser, or another source of intense and coherent light, can be used to expose the photocurable polymer 53 to form a data pattern 56. According to the laser It scavenges or traverses the photocurable polymer 53, the substrate 52 can be rotated to expose a spiral pattern 56 of the photocurable polymer 53. As discussed above, the size of the laser zone on the surface of the photocurable polymer 53, the speed of revolution of the substrate 52 and the speed of scanning or scanning of the laser can be varied to alter the data pattern 56. The laser can also be modulated in intensity to create the desired data pattern 56 to produce a series. of reliefs (not shown). In general, the data pattern 56 forms a track of the at least one relief in the photocurable polymer 56. Alternatively, if the intensity of the laser La is maintained at a constant level, the data pattern 56 can produce a single relief as desired. discussed earlier. Referring to Figure 5e, the polymer P1620 / 98MX photocurable 53 is then revealed to reveal the data pattern 56 on the first glass layer 54. Regardless of whether the photocurable polymer 53 is a positive or negative photocurable polymer, the developed photocurable polymer 53 'remains in the first layer of glass 54 identifying the locations of the at least one relief (not shown). In this way, the data pattern 56 and the laser control La are governed by the type of the photocurable polymer 53 applied to the first glass layer 54. FIG. 5f represents the etching, for example etching or acid etching, such such as hydrofluoric acid from the first glass layer 54 to produce the glass mask 54 '. As shown in Figure 5g, any portion of the developing photocurable polymer layer 53 ', which was not etched during the creation of the glass mask 54', is removed from the glass mask 54 '. Referring to Figure 5h, the substrate 52 is then ionically machined to form the at least one relief 52b on the substrate 52. As discussed above, when ionically machining, the amorphous metal substrate is bombarded with a neutral ion beam, so cutting the substrate 52 at a vertical depth, i.e. a relief height, in a range of about 20 to 200 nm, for example, P1620 / 98MX approximately 100 nm. The upper surface of each of the reliefs 52b is the surface 52a of the substrate. The glass mask 54 'controls the machining of the reliefs 52b. Once the desired height of the reliefs 52b is obtained, the glass mask 54 'that remains in the substrate can be removed to produce a stamper 55, as shown in Figure 5i. Figure 6 is a flow chart depicting the steps of the embodiment of Figures 5a-i. In step 60, a single phase crystalline ceramic substrate, such as a CVDSiC substrate or an amorphous metal substrate, such as an amorphous anelectrolytic nickel substrate that includes phosphorus in a range of about 5 to 15 percent in weight, it is provided again. As indicated in step 61, a first glass layer is deposited on the surface of the ceramic or amorphous metal substrate. In step 62, a second layer of negative photocurable polymer is applied to the substrate of the first glass layer. When exposed to a laser, as indicated in step 63, the negative photocurable polymer creates a series of zones corresponding to the at least one relief of the spiral track. When it is revealed in accordance with step 64, the un-exposed photocurable polymer dissolves, leaving only the areas of photocurable polymer P1S20 / 98MX revealed marking at least one relief. As indicated in step 65, by using the exposed photocurable polymer as a mask, the first glass layer is etched to form a glass mask. This etching can remove the photocurable polymer layer of the first glass layer. However, after the first layer is etched, the remainder of the photoresistured polymer developed is removed, as indicated in step 66. In step 67, the amorphous metal or ceramic substrate is ionically machined through the face mask. glass to form a negative matrix of the data pattern that includes a spiral track of at least one relief and at least one plateau. Finally, in accordance with step 68, the glass mask is also removed from the substrate. As discussed previously, the ionic machining can be achieved by bombarding the substrate with a stream of neutral ions, such as those of an inert gas, for example, argon. The depth of the ionic machining depends on the duration and intensity of the bombardment and the characteristics of the substrate. Furthermore, if the size of the ion beam is smaller than the surface of the substrate, again, the ion beam can be crosslinked in order to obtain a uniform machining. However, as discussed above, ceramic materials P1620 / 98 X are ionically machinable without increasing the artificial roughness (Ra). . Figure 7 is a flow chart depicting the steps of a process of the invention employing a stamper, such as the one described in Figure 4 or 6, for replicating discs for optical data storage. See step 70. In step 71, the disk stamper, such as stamper 35 or 55, is fixed in the mold of the disk stamper of an injection molding apparatus. This injection molding apparatus and its use are well known. As indicated in step 72, a thermoplastic resin, such as an acrylic resin, an epoxy resin, a polycarbonate resin, an unsaturated polyester resin, or the like, can be injected into the mold to form a replica of the disk. After the mold is cooled as indicated in step 73, the replica of the disc can be removed from the mold in step 74. Each disc replica can then be trimmed to remove excess thermoplastic resin. Because the stamper is made of a tough ceramic substrate, the stamper is designed to repeatedly withstand variations in pressure and temperature within the injection molding apparatus, without deforming or physically damaging the stamper. In step 75, the replica of the disk is coated, for example, by P1S20 / 98MX ionic bombardment, with a reflector material, such as aluminum or gold, including alloys containing these metals. This reflector material ensures that light beams from an optical reading device with reflected when they strike or collide with the at least one plateau of the spiral track data pattern on the disk replica. The production of metallic substrates, either by electroforming or by amorphous anelectrolytic formation, is a source of hazardous chemical waste. In addition, as noted above, nickel can transfer unacceptable visible macules to replication discs for optical data storage. This can decrease the performance of the process. Finally, unlike premaquined ceramic substrates, the amorphous anelectrolytic nickel substrate can be punched at the end of the machining process of the substrate but, before injection molding. There are several methods to produce an amorphous metal substrate. Amorphous metal can be formed as a film either by the use of an anelectrolytic chemical bath or by sputtering. Any of these processes can be used to adhere an amorphous metal film to a catalytically active surface of a base substrate, for example, the surface of P1620 / 98MX an electroformed, laminated or forged base substrate of aluminum, or nickel, or copper or the like. The amorphous film can only be as thick as the depth of the desired ion machining. Although thicker films are not undesirable, it can be more expensive production. The amorphous film can also be deposited over the entire thickness on a non-metallic stamping substrate platform. The amorphous film can be made smooth by grinding and polishing or by growing on it a smooth surface, such as a polished glass substrate platform, from which it can subsequently be removed. In each of these methods, the amorphous metal substrate can be manufactured using large-scale batch processes, stored indefinitely and stacked for subsequent ionic machining by the stamper manufacturers. For example, a method for preparing an anelectrolyte nickel film will be described below. First, a glass plate is polished, on which a film of anelectrolyte nickel will grow. Because the glass plate is polished, the anelectrolyte nickel deposited on the glass plate forms a smooth surface at the nickel / glass interface. Second, the glass surface can be activated, for example, by nucleation in a P1620 / 98 X colloidal palladium suspension or similar. An amorphous nickel film with a depth in the range of about 200 to 1000 nm is deposited by a chemical process of anelectrolyte nickel. To induce the growth of a smooth and amorphous anelectrolytic nickel film, sufficient phosphorus is added, for example, in a range of about 5 to 15 weight percent. Third, a base substrate of electroformed nickel or other metal can grow on the amorphous film to a cumulative thickness greater than or equal to about 300μm. The base substrate and the amorphous film are atomically bonded permanently and can be removed from the glass. Finally, the amorphous metal substrate can be punched to a diameter with a larger size, such as for example about 138 mm. Figures 8a-f are diagrams of the cross-sectional illustrations showing the steps of one embodiment of the process of the present invention. Figure 8a depicts an amorphous metal substrate 80 comprising a base substrate 81 and an amorphous metal film 82 with a substrate surface 82a. These substrates may have a diameter greater than about 120 mm and a thickness of or equal to about 300 μm, and these amorphous metal films may have a thickness in a range of about P1620 / 98MX 200 to 1000 nm. Suitable amorphous metal substrates are characterized by their susceptibility to be ionically machined. The ionic machining is effected by bombarding the substrate surface 82a with a neutral ion beam, whereby in the amorphous metallic film 82 substantially vertical walls can be cut. Referring to Figure 8b on the surface 82a of the amorphous metal film 82, a layer of photocurable polymer 83 is deposited. The photocurable polymer 83 is applied to a uniform depth through the surface 82a. For example, the photocurable polymer layer 83 may have a thickness in the range of about 0.1 to 2 μm. It can be applied as a dry laminated film or as a liquid that is applied by twist or spray to the surface 82a. A positive or negative photocurable polymer can be used. As discussed above when a positive photocurable polymer is used, areas exposed to light are removed by the development process. Conversely, when a negative photocurable polymer is used, areas not exposed to light are removed by the development process. As shown in Figure 8c, a source of electromagnetic energy, such as a laser can be P1620 / 98MX an intense and coherent light source, can be used to expose the photocurable polymer 83 to form a data pattern 84. As the laser sweeps or traverses the photocurable polymer 83, the substrate 80 can be rotated to expose the pattern of data 84 in a spiral shape on the photocurable polymer 83. In addition, the size of the area produced by the laser is on the surface of the photocurable polymer 83, the rate of revolution of the substrate 80 and the speed of scanning or scanning of the laser. they can be varied to conform to the data pattern 84. The laser La can also be modulated in intensity to produce a series of series of reliefs (not shown). In general, the data pattern 84 forms a spiral track of at least one relief and at least one plateau in the photocurable polymer 83. Alternatively, if the intensity of the laser La is maintained at a constant level, the data pattern 84 It can produce a single relief. A recordable optical data storage disc may have a single continuous spiral groove produced from a stamper having a data pattern 84 that includes a single continuous spiral relief. The groove of this disc is at least partially filled with an etching medium, such as a resin or ink P1620 / 98MX photocurable. If a photocurable resin or ink is used, a light source, such as a laser beam, can be used to produce a data pattern in the resin or ink. Referring to Figure 8d, the photocurable polymer 83 is then revealed to reveal the data pattern 84 on its surface. Regardless of whether the photocurable polymer 83 is a positive or negative photocurable polymer, the developed photocurable polymer 83 'remains on the surface 82a of the amorphous metallic film 82, identifying the locations of the at least one relief (not shown). Thus, laser control is governed by the type of photocurable polymer 83 deposited on the film 82. As shown in Figure 8e, the amorphous metal film 82 of the substrate 80 is ionically machined to form at least one relief 82b. The upper surface of the relief 82b is the surface 82a of the substrate. The ionic machining cuts the substrate 82 at a vertical depth, that is, a relief height, less than about 150 nm. As discussed above, when machined ionically, the substrate 80 can be bombarded with a zero ion beam. The developed photoresist polymer 83 'forms a mask by means of P1620 / 98MX from which the machining of the reliefs 82b is controlled. Once the desired height of each of the reliefs 82b is obtained, the remainder of the developed photoresist polymer 83 'is removed to produce a stamper 85, as shown in Figure 8f. Figure 9 is a flow chart depicting the steps of the embodiments of the process of the invention, including a mode of conformity with Figures 8a-f. In step 90a, an amorphous metal film, such as an amorphous anelectrolytic nickel film that includes phosphorus in a range of about 5 to 15 weight percent, is formed in an anelectrolyte chemical bath on a base substrate, e.g. , of electroformed metal, forged or laminated, to provide a substrate. In step 91a, the substrate can then be roughened and polished. Alternatively, in step 90b, a monolithic amorphous metal substrate can be provided by creating a substrate comprised of a single layer of amorphous metal formed in an anelectrolytic chemical bath on a non-metallic substrate platform, such as glass. In step 91b, the monolithic substrate is removed from the substrate platform. However, because the substrate platform can have a smooth surface, the amorphous metal substrate may not require roughing or polishing P1S20 / 98MX additional. In step 92, a negative photocurable polymer is deposited on the surface of the substrate. When exposed to a laser, as indicated in step 93, the negative photocurable polymer reveals a series of zones corresponding to the reliefs of the spiral track. When developed in accordance with step 94, the undissolved photoresist polymer dissolves, leaving only the areas of the photocurable polymer disclosed to mark the reliefs. As indicated in step 95, by using the exposed photocurable polymer as a mask, the substrate is ionically machined to form an enhanced data pattern that includes a spiral track of at least one relief and at least one plateau. The ionic machining can be achieved by bombarding the substrate with a stream of neutral ions, such as those of an inert gas, for example, argon. The depth of the ionic machining depends on the duration and intensity of the bombardment and the characteristics of the substrate. In addition, if the size of the ion beam is smaller than the surface of the substrate, the ion beam can be crosslinked in order to obtain a uniform machining. Referring to step 96, the developed photocurable polymer is then removed from the substrate to produce a stamping machine for discs.

P1S20 / 98MX optical data storage. Although a detailed description of the invention has been provided above, it will be understood that the scope of the invention is not thus limited but will be determined by the following claims.

P1620 / 98MX

Claims (36)

1. NOVELTY OF THE INVENTION Having described the present invention, it is considered as a novelty and, therefore, the content of the following CLAIMS is claimed as property: 1. A process for the manufacture of a disc stamper for storage of optical data, comprising the steps of: providing an ionically machinable amorphous metal substrate having a tenacity of about 10 MPaV m; depositing a layer of photocurable polymer on a surface of the substrate; . exposing the photocurable polymer to a source of electromagnetic energy to form a data pattern in the photocurable polymer; reveal the photocurable polymer; and ionically machining the data pattern, such that a spiral track of at least one relief and at least one plateau 2 is formed in the substrate. The process according to claim 1, wherein the photocurable polymer is a photoresist polymer. of oxide bombarded ionically. 3. The process according to claim 1, wherein the photocurable polymer is a polymer P1620 / 98MX photo-hardening negative tone. 4. The process according to claim 1, wherein the substrate has a surface roughness (Ra) in a range of between about 1 to 50 nm and a flatness of about 6 μm. The process according to claim 1, wherein the substrate has an outer diameter greater than about 120 mm, an internal diameter in a range of about 15 to 36 mm. The process according to claim 1, wherein the substrate has a thickness greater than or equal to about 300 μm. The process according to claim 1, wherein the at least one relief has a height of less than about 150 nm. The process according to claim 1, wherein the source of electromagnetic energy is a laser. The process according to claim 1, wherein the step of exposing the photocurable polymer includes using a computer to direct the source of electromagnetic energy. The process according to claim 9, wherein the step of the ionic machining comprises using a cross-linked ion beam. 11. The process according to claim 1, in P1620 / 98MX where the substrate is amorphous anelectrolytic nickel that includes phosphorus in a range of about 5 to 15 weight percent. The process according to claim 1, wherein the amorphous metal is selected from the group consisting of gold, nickel and copper. The process according to claim 1, wherein the substrate comprises a substrate base with a catalytically active surface and an amorphous metal film. The process according to claim 13, wherein the substrate base is fabricated from a metal selected from the group consisting of aluminum, nickel and copper. 15. The process according to claim 13, wherein the amorphous metal film is made from a metal selected from the group consisting of gold, nickel and copper. 16. The process according to claim 13, wherein the amorphous metal film has a thickness in the range of about 200 to 1000 nm. The process according to claim 1, wherein the at least one relief is a single continuous spiral relief, such that a single continuous groove is stamped on a disk for the storage of optical data. P1620 / 98MX recordable. 18. A disc stamper for storing optical data, produced by the process of claim 1. 19. A process for manufacturing a disk for storing optical data, comprising the steps of: manufacturing a disk stamper for data storage optical devices by the process of claim 1; fix the disc stamper for storage of optical data in a mold; injecting a thermoplastic resin in the mold to form a positive replica of the stamper disk; and remove the mold replica. The process according to claim 18, further comprising the step of coating the positive disk with a reflective material to obtain a reflective surface on the disk. The process according to claim 20, wherein the reflective material is a metal selected from the group consisting of aluminum and gold. 22. A process for manufacturing a disc stamper for optical data storage, which P1620 / 98 X comprises the steps of: providing an anelectrolyte nickel substrate that includes phosphorus in a range of about 5 to 15 weight percent; depositing a negative photocurable polymer having a thickness in the range of about 0.1 to 2 μm, on a surface of the substrate; exposing the photocurable polymer to a laser to form a negative data pattern in the photocurable polymer; revealing the photocurable polymer;, ionically machining the substrate, such that a spiral track of at least one relief and at least one plateau is formed in the substrate, wherein each of the at least one relief has a lower height about 150 nm; and removing the photocurable polymer developed. 23. The process according to claim 22, wherein the substrate has a diameter greater than about 120 mm. 24. The process according to claim 22, wherein the substrate has a thickness greater than or equal to about 300 μm. 25. A process for manufacturing a disc stamper for optical data storage, which P1620 / 98MX comprises the steps of: providing an ionically machinable amorphous metal substrate having a tenacity of at least about 10 MPaV m; depositing a first glass layer on a surface of the substrate, depositing a second layer of photocurable polymer on the first layer; exposing the photocurable polymer to a source of electromagnetic energy to form a data pattern in the photocurable polymer; reveal the photocurable polymer; record the data pattern in the first layer to form a glass mask; and ionically machining the data pattern through the glass mask, such that a spiral track of at least one relief and at least one plateau is formed in the substrate. 26. The process according to claim 25, wherein the substrate comprises a substrate base with a catalytically active surface and an amorphous metal film. 27. The process according to claim 26, wherein the substrate base is fabricated from a metal selected from the group consisting of aluminum, nickel and copper. P1620 / 98MX 28. The process according to claim 26, wherein the amorphous metal film is made from a metal selected from the group consisting of gold, nickel and copper. 29. The process according to claim 26, wherein the amorphous metal film has a thickness in the range of about 200 to 1000 nm. 30. The process according to claim 25, further comprising the steps of: removing the photo-hardenable polymer developed; and eliminate the glass mask. 31. The process according to claim 25, wherein the first layer has a thickness in the range of about 0.1 to 1 μm. 32. The process according to claim 25, wherein the second layer has a thickness in the range of about 0.1 to 2 μm. 33. The process according to claim 25, wherein the step of recording to the data pattern in the first layer comprises applying an acid to the first layer. 34. The process according to claim 25, wherein the at least one relief has a height of less than about 150 nm. 35. A disc stamper for optical data storage produced through the process of P1S20 / 98MX claim 25. 36. A process for manufacturing a disc for storage of optical data, comprising the steps of: manufacturing a disc stamper for negative optical data storage by the process of claim 25; fix in a mold to the disk stacker for optical data storage; injecting a thermoplastic resin into the mold to form a positive replica of the stamper; Remove the replica of the mold. P1620 / 98MX