MX369532B - Sistemas y metodos para formar y mantener una configuracion de campo invertido (frc) de alto rendimiento. - Google Patents

Sistemas y metodos para formar y mantener una configuracion de campo invertido (frc) de alto rendimiento.

Info

Publication number
MX369532B
MX369532B MX2017005519A MX2017005519A MX369532B MX 369532 B MX369532 B MX 369532B MX 2017005519 A MX2017005519 A MX 2017005519A MX 2017005519 A MX2017005519 A MX 2017005519A MX 369532 B MX369532 B MX 369532B
Authority
MX
Mexico
Prior art keywords
frc
formation
formation sections
systems
injectors
Prior art date
Application number
MX2017005519A
Other languages
English (en)
Other versions
MX2017005519A (es
Inventor
Michl Binderbauer
Eusebio Garate
Sergei Putvinski
Gota Hiroshi
Original Assignee
Tae Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tae Tech Inc filed Critical Tae Tech Inc
Publication of MX2017005519A publication Critical patent/MX2017005519A/es
Publication of MX369532B publication Critical patent/MX369532B/es

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/05—Thermonuclear fusion reactors with magnetic or electric plasma confinement
    • G21B1/052—Thermonuclear fusion reactors with magnetic or electric plasma confinement reversed field configuration
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H05H1/08—Theta pinch devices, e.g. SCYLLA
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/10—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball
    • H05H1/14—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball wherein the containment vessel is straight and has magnetic mirrors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma Technology (AREA)
  • Reinforced Plastic Materials (AREA)
  • Moulding By Coating Moulds (AREA)
  • Prostheses (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Pens And Brushes (AREA)

Abstract

Un sistema de configuración de campo invertido de alto rendimiento (FRC) incluye un recipiente de confinamiento central, dos secciones de formación de estricción theta de campo invertido diametralmente opuestas acopladas al recipiente, y dos cámaras de desviador acopladas con las secciones de formación; un sistema magnético incluye bobinas cuasi-dc posicionadas axialmente a lo largo de los componentes del sistema de FRC, bobinas especulares cuasi-dc entre la cámara de confinamiento y las secciones de formación, y conectores especulares entre las secciones de formación y los desviadores; las secciones de formación incluyen sistemas de formación de energía pulsada modulares que habilitan la formación estática y dinámica y la aceleración de las FRC; el sistema de FRC además incluye inyectores de haces de átomos neutrales, inyectores de pellas o CT, sistemas de eliminación de residuos gaseosos, pistolas de plasma axiales y electrodos de polarización de superficie de flujo; los inyectores de haces están preferiblemente angulados hacia el plano medio de la cámara; en operación, los parámetros de plasma de FRC que incluyen energía térmica de plasma, número total de partículas, radio y flujo magnético atrapado, son sostenibles en o aproximadamente un valor constante sin decaimiento durante la inyección de haces neutrales.
MX2017005519A 2014-10-30 2015-10-30 Sistemas y metodos para formar y mantener una configuracion de campo invertido (frc) de alto rendimiento. MX369532B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462072611P 2014-10-30 2014-10-30
PCT/US2015/058473 WO2016070126A1 (en) 2014-10-30 2015-10-30 Systems and methods for forming and maintaining a high performance frc

Publications (2)

Publication Number Publication Date
MX2017005519A MX2017005519A (es) 2017-09-01
MX369532B true MX369532B (es) 2019-11-11

Family

ID=55858430

Family Applications (2)

Application Number Title Priority Date Filing Date
MX2017005519A MX369532B (es) 2014-10-30 2015-10-30 Sistemas y metodos para formar y mantener una configuracion de campo invertido (frc) de alto rendimiento.
MX2019013295A MX2019013295A (es) 2014-10-30 2017-04-27 Sistemas y metodos para formar y mantener una configuracion de campo invertido (frc) de alto rendimiento.

Family Applications After (1)

Application Number Title Priority Date Filing Date
MX2019013295A MX2019013295A (es) 2014-10-30 2017-04-27 Sistemas y metodos para formar y mantener una configuracion de campo invertido (frc) de alto rendimiento.

Country Status (33)

Country Link
US (3) US10440806B2 (es)
EP (2) EP3589083B1 (es)
JP (2) JP6855374B2 (es)
KR (1) KR102590200B1 (es)
CN (2) CN111511087B (es)
AR (1) AR102474A1 (es)
AU (2) AU2015338965B2 (es)
BR (1) BR112017008768B1 (es)
CA (1) CA2965682C (es)
CL (1) CL2017001075A1 (es)
CY (1) CY1122049T1 (es)
DK (2) DK3213608T3 (es)
EA (2) EA202191743A1 (es)
ES (2) ES2746302T3 (es)
HR (2) HRP20221278T1 (es)
HU (2) HUE046413T2 (es)
IL (1) IL251583B2 (es)
LT (2) LT3589083T (es)
MX (2) MX369532B (es)
MY (1) MY181502A (es)
NZ (2) NZ730979A (es)
PE (1) PE20170743A1 (es)
PH (2) PH12017500726B1 (es)
PL (2) PL3589083T3 (es)
PT (2) PT3213608T (es)
RS (2) RS63672B1 (es)
SA (1) SA517381392B1 (es)
SG (2) SG11201703167UA (es)
SI (2) SI3213608T1 (es)
TW (2) TWI654908B (es)
UA (1) UA126267C2 (es)
WO (1) WO2016070126A1 (es)
ZA (1) ZA201702384B (es)

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