MX2015007587A - Dispositivo fotonico magneticamente polarizado. - Google Patents

Dispositivo fotonico magneticamente polarizado.

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Publication number
MX2015007587A
MX2015007587A MX2015007587A MX2015007587A MX2015007587A MX 2015007587 A MX2015007587 A MX 2015007587A MX 2015007587 A MX2015007587 A MX 2015007587A MX 2015007587 A MX2015007587 A MX 2015007587A MX 2015007587 A MX2015007587 A MX 2015007587A
Authority
MX
Mexico
Prior art keywords
photonic device
magnetically polarized
layer
polarized photonic
annihilation
Prior art date
Application number
MX2015007587A
Other languages
English (en)
Other versions
MX356512B (es
Inventor
Daniel Scott Marshall
Original Assignee
Daniel Scott Marshall
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daniel Scott Marshall filed Critical Daniel Scott Marshall
Publication of MX2015007587A publication Critical patent/MX2015007587A/es
Publication of MX356512B publication Critical patent/MX356512B/es

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/065Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the graded gap type
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    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
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    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
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    • H01L31/0264Inorganic materials
    • H01L31/0296Inorganic materials including, apart from doping material or other impurities, only AIIBVI compounds, e.g. CdS, ZnS, HgCdTe
    • H01L31/02966Inorganic materials including, apart from doping material or other impurities, only AIIBVI compounds, e.g. CdS, ZnS, HgCdTe including ternary compounds, e.g. HgCdTe
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    • H01L21/02263Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H01L21/02274Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H01L21/02277Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition the reactions being activated by other means than plasma or thermal, e.g. photo-CVD
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    • H01L21/0226Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H01L21/0228Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
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    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02494Structure
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    • H01L21/0251Graded layers
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    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/82Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of the magnetic field applied to the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
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    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1828Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
    • H01L31/1832Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe comprising ternary compounds, e.g. Hg Cd Te
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    • H01L33/0004Devices characterised by their operation
    • H01L33/002Devices characterised by their operation having heterojunctions or graded gap
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    • H10N59/00Integrated devices, or assemblies of multiple devices, comprising at least one galvanomagnetic or Hall-effect element covered by groups H10N50/00 - H10N52/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Optical Integrated Circuits (AREA)
  • Polarising Elements (AREA)
  • Optical Filters (AREA)

Abstract

Se proporciona un dispositivo fotónico magnéticamente polarizado; el dispositivo fotónico magnéticamente polarizado (100) incluye un sustrato (102), una capa de aniquilación (106) y una capa de vacío de banda graduada (142); la capa de aniquilación (106) se depone sobre una superficie (104) de sustrato (102) con la capa de vacío de banda graduada (142) dispuesta sobre la capa de aniquilación (106); los contactos (116, 128) están dispuestos sobre los extremos (146, 150) del dispositivo fotónico magnéticamente polarizado (100); un campo magnético (159) se aplica a la capa de vacío de banda graduada (142) y a la capa de aniquilación (106) para impulsar cargas a los contactos (116, 128).
MX2015007587A 2012-12-13 2013-12-13 Dispositivo fotonico magneticamente polarizado. MX356512B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261737073P 2012-12-13 2012-12-13
PCT/US2013/075003 WO2014093816A2 (en) 2012-12-13 2013-12-13 Magnetically polarized photonic device

Publications (2)

Publication Number Publication Date
MX2015007587A true MX2015007587A (es) 2016-04-13
MX356512B MX356512B (es) 2018-05-30

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MX2015007587A MX356512B (es) 2012-12-13 2013-12-13 Dispositivo fotonico magneticamente polarizado.

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US (1) US10665745B2 (es)
EP (1) EP2932533A4 (es)
JP (2) JP6556056B2 (es)
KR (1) KR102341969B1 (es)
CN (1) CN105144393B (es)
AU (2) AU2013359049A1 (es)
BR (1) BR112015014071B1 (es)
CA (1) CA2894882C (es)
EA (1) EA201591120A1 (es)
HK (1) HK1218590A1 (es)
IL (1) IL239378A0 (es)
MX (1) MX356512B (es)
WO (1) WO2014093816A2 (es)

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CN104810424A (zh) * 2015-04-17 2015-07-29 四川大学 具有CdxTe插入层的CdTe薄膜太阳电池
WO2019126463A1 (en) * 2017-12-22 2019-06-27 First Solar, Inc. Absorber layers with mercury for photovoltaic devices and methods for forming the same

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Publication number Publication date
WO2014093816A3 (en) 2014-09-12
KR20150097616A (ko) 2015-08-26
EP2932533A2 (en) 2015-10-21
CA2894882A1 (en) 2014-06-19
JP2019110324A (ja) 2019-07-04
US10665745B2 (en) 2020-05-26
AU2017268617A1 (en) 2017-12-21
US20140166086A1 (en) 2014-06-19
MX356512B (es) 2018-05-30
JP2016501450A (ja) 2016-01-18
BR112015014071B1 (pt) 2022-05-31
EP2932533A4 (en) 2016-08-10
HK1218590A1 (zh) 2017-02-24
CN105144393A (zh) 2015-12-09
CN105144393B (zh) 2018-06-29
AU2013359049A1 (en) 2015-07-30
BR112015014071A2 (pt) 2017-07-11
EA201591120A1 (ru) 2015-11-30
WO2014093816A2 (en) 2014-06-19
KR102341969B1 (ko) 2021-12-24
JP6556056B2 (ja) 2019-08-07
CA2894882C (en) 2021-02-09
IL239378A0 (en) 2015-07-30

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