MX2007014609A - De reflectores, metodos de fabricacion del mismo y filtro de rayos x de banda estrecha y sistema que incluye el mismo. - Google Patents

De reflectores, metodos de fabricacion del mismo y filtro de rayos x de banda estrecha y sistema que incluye el mismo.

Info

Publication number
MX2007014609A
MX2007014609A MX2007014609A MX2007014609A MX2007014609A MX 2007014609 A MX2007014609 A MX 2007014609A MX 2007014609 A MX2007014609 A MX 2007014609A MX 2007014609 A MX2007014609 A MX 2007014609A MX 2007014609 A MX2007014609 A MX 2007014609A
Authority
MX
Mexico
Prior art keywords
narrow band
ray
rack
system including
fabrication method
Prior art date
Application number
MX2007014609A
Other languages
English (en)
Inventor
Yong Min Cho
Original Assignee
Monochromatic X Ray Filter Tec
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Monochromatic X Ray Filter Tec filed Critical Monochromatic X Ray Filter Tec
Publication of MX2007014609A publication Critical patent/MX2007014609A/es

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Measurement Of Radiation (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Connection Of Plates (AREA)

Abstract

Un bastidor apilable puede comprender: al menos dos rieles, una seccion transversal de cada riel tiene una forma que se asemeja a una escalera, cuya primera porcion de escalon representa una primera superficie sobre la cual se puede disponer un reflector; y cuya segunda porcion de escalon representa una segunda superficie que puede soportar otro riel; un metodo para hacer un filtro de rayos X de banda estrecha puede comprender: proporcionar un sustrato; y apilar una o mas unidades de reflexion en sucesion sobre el sustrato, cada unidad de reflexion incluye un bastidor (como el mencionado anteriormente) y un reflector sostenido por el bastidor; un aparato para producir un haz de rayos X de banda sustancialmente estrecha puede incluir dicho filtro; un aparato para formar una imagen de rayos X de un sujeto puede incluir: el aparato para producir un haz de rayos X de banda sustancialmente estrecha, por ejemplo, como se establecio arriba, y un detector de rayos X dispuesto para recibir los rayos X de banda estrecha.
MX2007014609A 2005-05-19 2006-05-19 De reflectores, metodos de fabricacion del mismo y filtro de rayos x de banda estrecha y sistema que incluye el mismo. MX2007014609A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/132,305 US7257197B2 (en) 2003-06-03 2005-05-19 Reflector rack, fabrication method thereof, and narrow brand x-ray filter and system including same
PCT/US2006/019602 WO2007005130A2 (en) 2005-05-19 2006-05-19 Reflector rack, fabrication method thereof, and narrow band x-ray filter and system including same

Publications (1)

Publication Number Publication Date
MX2007014609A true MX2007014609A (es) 2008-04-22

Family

ID=37604922

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2007014609A MX2007014609A (es) 2005-05-19 2006-05-19 De reflectores, metodos de fabricacion del mismo y filtro de rayos x de banda estrecha y sistema que incluye el mismo.

Country Status (11)

Country Link
US (1) US7257197B2 (es)
EP (1) EP1882258A2 (es)
KR (1) KR20080037617A (es)
CN (1) CN101341552A (es)
AU (1) AU2006266432A1 (es)
CA (1) CA2609265A1 (es)
IL (1) IL187523A0 (es)
MX (1) MX2007014609A (es)
NO (1) NO20076570L (es)
RU (1) RU2007144627A (es)
WO (1) WO2007005130A2 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7321654B2 (en) * 2003-06-03 2008-01-22 Mentor Technologies, Inc. Narrow band x-ray system and fabrication method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519503A (en) * 1983-08-15 1985-05-28 Wilson James D Nestable/stackable basket/tray combination for use in bakery goods distribution systems
ATE89097T1 (de) 1986-08-15 1993-05-15 Commw Scient Ind Res Org Instrumente zur konditionierung von roentgenoder neutronenstrahlen.
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
US7321654B2 (en) * 2003-06-03 2008-01-22 Mentor Technologies, Inc. Narrow band x-ray system and fabrication method thereof

Also Published As

Publication number Publication date
WO2007005130A3 (en) 2007-04-05
CN101341552A (zh) 2009-01-07
US20050220271A1 (en) 2005-10-06
IL187523A0 (en) 2008-03-20
EP1882258A2 (en) 2008-01-30
WO2007005130A2 (en) 2007-01-11
RU2007144627A (ru) 2009-06-27
KR20080037617A (ko) 2008-04-30
AU2006266432A1 (en) 2007-01-11
US7257197B2 (en) 2007-08-14
CA2609265A1 (en) 2007-01-11
NO20076570L (no) 2008-02-19

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