MD4570C1 - Strat fotosensibil pe bază de copolimer carbazolic - Google Patents
Strat fotosensibil pe bază de copolimer carbazolicInfo
- Publication number
- MD4570C1 MD4570C1 MDA20160050A MD20160050A MD4570C1 MD 4570 C1 MD4570 C1 MD 4570C1 MD A20160050 A MDA20160050 A MD A20160050A MD 20160050 A MD20160050 A MD 20160050A MD 4570 C1 MD4570 C1 MD 4570C1
- Authority
- MD
- Moldova
- Prior art keywords
- photosensitive layer
- copolymer
- based photosensitive
- carbazole
- carbazole copolymer
- Prior art date
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photovoltaic Devices (AREA)
Abstract
Invenţia se referă la domeniul nanomaterialelor polimerice şi a structurilor fotosensibile pe baza lor, care pot fi utilizate în optoelectronică pentru realizarea dispozitivelor fotovoltaice şi a purtătorilor de informaţie electrofotografică.Stratul fotosensibil pe bază de copolimer carbazolic conţine copolimer de N-vinilcarbazol cu 1-octenă sensibilizat cu 15% mas. de 2,4,7-trinitrofluorenonă şi 10...50% mas. de ftalocianină de cupru, grosimea stratului fotosensibil fiind de 1...10 µm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20160050A MD4570C1 (ro) | 2016-05-10 | 2016-05-10 | Strat fotosensibil pe bază de copolimer carbazolic |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20160050A MD4570C1 (ro) | 2016-05-10 | 2016-05-10 | Strat fotosensibil pe bază de copolimer carbazolic |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| MD20160050A2 MD20160050A2 (ro) | 2017-11-30 |
| MD4570B1 MD4570B1 (ro) | 2018-05-31 |
| MD4570C1 true MD4570C1 (ro) | 2018-12-31 |
Family
ID=60514888
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MDA20160050A MD4570C1 (ro) | 2016-05-10 | 2016-05-10 | Strat fotosensibil pe bază de copolimer carbazolic |
Country Status (1)
| Country | Link |
|---|---|
| MD (1) | MD4570C1 (ro) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2054118A1 (en) * | 1970-11-04 | 1972-05-10 | Hauffe K | Bipolar charge-/discharge-able coating - for xerography with zinc oxide and photoconductive organic pigment in resin |
| GB1343671A (en) * | 1971-02-26 | 1974-01-16 | Xerox Corp | Photoconductive imaging member |
| JPS5389434A (en) * | 1977-01-17 | 1978-08-07 | Mita Industrial Co Ltd | Stacked photosensitive body for electrophotography |
| MD3690G2 (ro) * | 2007-11-07 | 2009-03-31 | Государственный Университет Молд0 | Purtător de informaţie electrofotografic |
| JP6141029B2 (ja) * | 2012-08-31 | 2017-06-07 | キヤノン株式会社 | 電子写真感光体、プロセスカートリッジおよび電子写真装置 |
| MD4306C1 (ro) * | 2013-02-01 | 2015-04-30 | Государственный Университет Молд0 | Purtător de informaţie electrofotografic |
-
2016
- 2016-05-10 MD MDA20160050A patent/MD4570C1/ro not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| MD20160050A2 (ro) | 2017-11-30 |
| MD4570B1 (ro) | 2018-05-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG4A | Patent for invention issued | ||
| KA4A | Patent for invention lapsed due to non-payment of fees (with right of restoration) | ||
| MM4A | Patent for invention definitely lapsed due to non-payment of fees |