MD2610G2 - Process semiconductor porous surface obtaining - Google Patents

Process semiconductor porous surface obtaining

Info

Publication number
MD2610G2
MD2610G2 MDA20040097A MD20040097A MD2610G2 MD 2610 G2 MD2610 G2 MD 2610G2 MD A20040097 A MDA20040097 A MD A20040097A MD 20040097 A MD20040097 A MD 20040097A MD 2610 G2 MD2610 G2 MD 2610G2
Authority
MD
Moldova
Prior art keywords
porous surface
semiconductor porous
process semiconductor
surface obtaining
mask
Prior art date
Application number
MDA20040097A
Other languages
Romanian (ro)
Russian (ru)
Other versions
MD2610F1 (en
Inventor
Эдуард МОНАЙКО
Ион ТИГИНЯНУ
Вячеслав ПОПА
Олеся ВОЛЧУК
Original Assignee
Ион ТИГИНЯНУ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ион ТИГИНЯНУ filed Critical Ион ТИГИНЯНУ
Priority to MDA20040097A priority Critical patent/MD2610G2/en
Publication of MD2610F1 publication Critical patent/MD2610F1/en
Publication of MD2610G2 publication Critical patent/MD2610G2/en

Links

Landscapes

  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

The invention relates to the semiconductor technology, in particular to process es for obtaining porous surfaces of the semiconductors.Summary of the invention consists in that onto the semiconductor surface it is deposited a mask, selectively covering it, and it is carried out the electrochemical pickling. Novelty of the invention consists in that the mask is made of photoresist.
MDA20040097A 2004-04-28 2004-04-28 Process semiconductor porous surface obtaining MD2610G2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MDA20040097A MD2610G2 (en) 2004-04-28 2004-04-28 Process semiconductor porous surface obtaining

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MDA20040097A MD2610G2 (en) 2004-04-28 2004-04-28 Process semiconductor porous surface obtaining

Publications (2)

Publication Number Publication Date
MD2610F1 MD2610F1 (en) 2004-11-30
MD2610G2 true MD2610G2 (en) 2005-06-30

Family

ID=34132349

Family Applications (1)

Application Number Title Priority Date Filing Date
MDA20040097A MD2610G2 (en) 2004-04-28 2004-04-28 Process semiconductor porous surface obtaining

Country Status (1)

Country Link
MD (1) MD2610G2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD2982G2 (en) * 2005-08-10 2006-10-31 Институт Прикладной Физики Академии Наук Молдовы Process for obtaining semiconductor nanostructures
MD3811G2 (en) * 2007-11-06 2009-08-31 Институт Прикладной Физики Академии Наук Молдовы Process for obtaining semiconductor nanostructural zones
MD193Z (en) * 2009-06-04 2010-11-30 Институт Прикладной Физики Академии Наук Молдовы Process for the obtaining of polysulphide film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2254275A1 (en) * 1998-11-20 2000-05-20 Patrik Schmuki Selective electrochemical process for creating semiconductor nano- and micro-patterns

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2254275A1 (en) * 1998-11-20 2000-05-20 Patrik Schmuki Selective electrochemical process for creating semiconductor nano- and micro-patterns

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD2982G2 (en) * 2005-08-10 2006-10-31 Институт Прикладной Физики Академии Наук Молдовы Process for obtaining semiconductor nanostructures
MD3811G2 (en) * 2007-11-06 2009-08-31 Институт Прикладной Физики Академии Наук Молдовы Process for obtaining semiconductor nanostructural zones
MD193Z (en) * 2009-06-04 2010-11-30 Институт Прикладной Физики Академии Наук Молдовы Process for the obtaining of polysulphide film

Also Published As

Publication number Publication date
MD2610F1 (en) 2004-11-30

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Legal Events

Date Code Title Description
KA4A Patent for invention lapsed due to non-payment of fees (with right of restoration)
MM4A Patent for invention definitely lapsed due to non-payment of fees