MD2610F1 - Procedeu de obtinere a suprafetei poroase a semiconductorului - Google Patents

Procedeu de obtinere a suprafetei poroase a semiconductorului Download PDF

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Publication number
MD2610F1
MD2610F1 MDA20040097A MD20040097A MD2610F1 MD 2610 F1 MD2610 F1 MD 2610F1 MD A20040097 A MDA20040097 A MD A20040097A MD 20040097 A MD20040097 A MD 20040097A MD 2610 F1 MD2610 F1 MD 2610F1
Authority
MD
Moldova
Prior art keywords
porous surface
semiconductor porous
process semiconductor
surface obtaining
mask
Prior art date
Application number
MDA20040097A
Other languages
English (en)
Other versions
MD2610G2 (ro
Inventor
MONAICOÁEduardÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁ
TIGHINEANUÁIonÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁ
POPAÁVeaceslavÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁ
VOLCIUCÁOleseaÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁ
Original Assignee
TIGHINEANUÁIonÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TIGHINEANUÁIonÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁ filed Critical TIGHINEANUÁIonÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁÁ
Priority to MDA20040097A priority Critical patent/MD2610G2/ro
Publication of MD2610F1 publication Critical patent/MD2610F1/ro
Publication of MD2610G2 publication Critical patent/MD2610G2/ro

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  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

Inventia se refera la tehnologia semiconductoarelorŹ in particular la procedee de obtinere a suprafetelor poroase ale semiconductoarelor. Esenta inventiei consta in faptul ca pe suprafata semiconductorului se depune o masca ce o acopera selectiv si se efectueaza corodarea ei electrochimica. Noutatea inventiei consta in faptul ca masca este executata din fotorezist. ŕ
MDA20040097A 2004-04-28 2004-04-28 Procedeu de obţinere a suprafeţei poroase a semiconductorului MD2610G2 (ro)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MDA20040097A MD2610G2 (ro) 2004-04-28 2004-04-28 Procedeu de obţinere a suprafeţei poroase a semiconductorului

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MDA20040097A MD2610G2 (ro) 2004-04-28 2004-04-28 Procedeu de obţinere a suprafeţei poroase a semiconductorului

Publications (2)

Publication Number Publication Date
MD2610F1 true MD2610F1 (ro) 2004-11-30
MD2610G2 MD2610G2 (ro) 2005-06-30

Family

ID=34132349

Family Applications (1)

Application Number Title Priority Date Filing Date
MDA20040097A MD2610G2 (ro) 2004-04-28 2004-04-28 Procedeu de obţinere a suprafeţei poroase a semiconductorului

Country Status (1)

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MD (1) MD2610G2 (ro)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD2982G2 (ro) * 2005-08-10 2006-10-31 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a nanostructurilor semiconductoare
MD3811G2 (ro) * 2007-11-06 2009-08-31 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a zonelor nanostructurale semiconductoare
MD193Z (ro) * 2009-06-04 2010-11-30 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a peliculei polisulfidice

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2254275C (en) * 1998-11-20 2007-06-26 Patrik Schmuki Selective electrochemical process for creating semiconductor nano- and micro-patterns

Also Published As

Publication number Publication date
MD2610G2 (ro) 2005-06-30

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Legal Events

Date Code Title Description
KA4A Patent for invention lapsed due to non-payment of fees (with right of restoration)
MM4A Patent for invention definitely lapsed due to non-payment of fees