MD1740Y - Method for producing epitaxial TiO2 thin layers - Google Patents
Method for producing epitaxial TiO2 thin layers Download PDFInfo
- Publication number
- MD1740Y MD1740Y MDS20230010A MDS20230010A MD1740Y MD 1740 Y MD1740 Y MD 1740Y MD S20230010 A MDS20230010 A MD S20230010A MD S20230010 A MDS20230010 A MD S20230010A MD 1740 Y MD1740 Y MD 1740Y
- Authority
- MD
- Moldova
- Prior art keywords
- vapors
- thin layers
- epitaxial
- tio2
- speed
- Prior art date
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 abstract 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 abstract 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 3
- 229910052786 argon Inorganic materials 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 230000005587 bubbling Effects 0.000 abstract 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
- 238000005238 degreasing Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000005693 optoelectronics Effects 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
The invention relates to the semiconductor manufacturing technology, and can be used for manufacturing optoelectronic devices.The method for producing epitaxial TiO2 thin layers comprises degreasing a glass substrate in toluene, drying it in isopropyl alcohol vapors and placing it in a chemical vapor deposition reactor, which is purged with argon for 20 min at a flow rate of 100 cm3/min, after which the temperature of the substrate is increased up to 400°C. The method also includes the formation of titanium isopropoxide vapors by bubbling at a temperature of 90°C. The deposition of epitaxial TiO2 layers is carried out by separately feeding into the reactor titanium isopropoxide vapors, carried by an argon flow at a speed of 40 cm3/min, and an oxygen flow at a speed of 40 cm3/min, for 30 min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDS20230010A MD1740Z (en) | 2023-02-02 | 2023-02-02 | Method for producing epitaxial TiO2 thin layers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDS20230010A MD1740Z (en) | 2023-02-02 | 2023-02-02 | Method for producing epitaxial TiO2 thin layers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| MD1740Y true MD1740Y (en) | 2024-01-31 |
| MD1740Z MD1740Z (en) | 2024-08-31 |
Family
ID=89843888
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MDS20230010A MD1740Z (en) | 2023-02-02 | 2023-02-02 | Method for producing epitaxial TiO2 thin layers |
Country Status (1)
| Country | Link |
|---|---|
| MD (1) | MD1740Z (en) |
-
2023
- 2023-02-02 MD MDS20230010A patent/MD1740Z/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| MD1740Z (en) | 2024-08-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG9Y | Short term patent issued |