MD1000G2 - The process of magnesium oxide treatment - Google Patents

The process of magnesium oxide treatment

Info

Publication number
MD1000G2
MD1000G2 MD97-0090A MD970090A MD1000G2 MD 1000 G2 MD1000 G2 MD 1000G2 MD 970090 A MD970090 A MD 970090A MD 1000 G2 MD1000 G2 MD 1000G2
Authority
MD
Moldova
Prior art keywords
magnesium oxide
treatment
oxide treatment
thermal treatment
materials
Prior art date
Application number
MD97-0090A
Other languages
Romanian (ro)
Russian (ru)
Inventor
Константин СУШКЕВИЧ
Михай НАЗАРОВ
Original Assignee
Государственный Университет Молд0
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Государственный Университет Молд0 filed Critical Государственный Университет Молд0
Priority to MD97-0090A priority Critical patent/MD1000G2/en
Publication of MD1000G2 publication Critical patent/MD1000G2/en

Links

Landscapes

  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)

Abstract

The invention relates to the process for materials thermic treatment and may be used in the semi-conductors engineering and microelectronics at manufacturing the apparatus and devices, optical lenses, thermal insulation materials.The process includes the thermal treatment with further air cooling, the thermal treatment is carried out at 1100-1300°C in the antimony melt having aluminium concentration from 0,1 up to 20% of aluminium atoms.The technical result consists in the magnesium oxide crystal lattice changing.
MD97-0090A 1997-02-26 1997-02-26 The process of magnesium oxide treatment MD1000G2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MD97-0090A MD1000G2 (en) 1997-02-26 1997-02-26 The process of magnesium oxide treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MD97-0090A MD1000G2 (en) 1997-02-26 1997-02-26 The process of magnesium oxide treatment

Publications (1)

Publication Number Publication Date
MD1000G2 true MD1000G2 (en) 1999-03-31

Family

ID=62129504

Family Applications (1)

Application Number Title Priority Date Filing Date
MD97-0090A MD1000G2 (en) 1997-02-26 1997-02-26 The process of magnesium oxide treatment

Country Status (1)

Country Link
MD (1) MD1000G2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD3541G2 (en) * 2007-07-06 2008-10-31 Институт Прикладной Физики Академии Наук Молдовы Process for modifying the near-surface layers of zinc selenide monocrystals

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE300850C (en) * 1916-03-18 1917-09-24
SU1055785A1 (en) * 1982-04-12 1983-11-23 Ордена Трудового Красного Знамени Институт Кристаллографии Им.А.В.Шубникова Method of heat treatment of single crystals

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE300850C (en) * 1916-03-18 1917-09-24
SU1055785A1 (en) * 1982-04-12 1983-11-23 Ордена Трудового Красного Знамени Институт Кристаллографии Им.А.В.Шубникова Method of heat treatment of single crystals

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD3541G2 (en) * 2007-07-06 2008-10-31 Институт Прикладной Физики Академии Наук Молдовы Process for modifying the near-surface layers of zinc selenide monocrystals

Similar Documents

Publication Publication Date Title
MY115099A (en) Process for producing silicon semiconductor wafers with low defect density
ATE136872T1 (en) METHOD FOR CONVERTING WASTE MATERIALS INTO CRYSTALIZED GLASS
DE69434773D1 (en) Apparatus for rapid thermal treatment for the production of semiconductor wafers
MY132868A (en) Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
ATE67775T1 (en) PROCESS FOR THE HEAT TREATMENT OF POLYSILAZATES CONTAINING SINH, SIH AND UNSATURATED GROUPS.
Chaney et al. The dissolution of fused silica in molten silicon
DE3872332D1 (en) METHOD FOR CONTINUOUSLY REFINING SILICON.
WO2004094704A3 (en) Crucible for a device used for the production of a block of crystalline material, and production method
ATE203228T1 (en) METHOD FOR PRECOMPASSING FLAT GLASS
Wittman et al. Surface nucleation and growth in anorthite glass
DE59502387D1 (en) Process and plant for cooling white cement clinker
MD1000G2 (en) The process of magnesium oxide treatment
TW355820B (en) Heat treatment method for a silicon wafer and a silicon wafer heat-treated by the method
YU74795A (en) PROCEDURE FOR THE PRODUCTION OF CRYSTAL SILICATE FIRE-RESISTANT MASS
DE3673626D1 (en) SURFACE MELTING WITH THERMAL PROTECTION.
JPS5659694A (en) Manufacture of thin film
BR8006072A (en) CLINICAL MANUFACTURING PROCESS BASED ON SILICATES AND / OR CALCUM ALUMINATES
DE3681190D1 (en) CRYSTALLIZED SOLID ALUMINUM SILICATE WITH AN EXPANDED STRUCTURE AND METHOD FOR PRODUCING THE SAME.
HUP0003124A2 (en) Melting furnace, in particular for glass, and use thereof
NO953464L (en) Process for preparing a solar cell substrate
WO2002057518A3 (en) Apparatus and process for the preparation of low-iron_contamination single crystal silicon
FR2841370B1 (en) METHOD FOR IMMOBILIZING METAL SODIUM IN THE FORM OF GLASS
WO2002061808A3 (en) Heat treatment apparatus and wafer support ring
DK0866508T3 (en) Process for producing superconductors of rare-earth barium cuprates
KR940016469A (en) Molten Quartz Diffusion Tube for Semiconductor Manufacturing